Patents by Inventor Li-Ju J. Lin

Li-Ju J. Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5631081
    Abstract: The present invention is a method for bonding a lubricant onto the surface of rotating storage media. In particular, the method bonds reactive and non-reactive lubricants onto the carbon based protective coating of a magnetic storage disk. The lubricant is first applied onto the disk surface through conventional coating techniques, such as dipping, spinning, spraying, or vapor deposition. The thickness of the applied coating is thicker than the final bonded thickness of the lubricant. Typically, the applied thickness of the film is approximately 30 Angstroms. The lubricant coated disk surface is then exposed to low energy electron irradiation. The energy level of the accelerated electrons is below 100 eV. The lubricated film is exposed to a dosage level of approximately 1000 microcoulombs per square centimeter. This dosage level bonds approximately 15 Angstroms of lubricant to the disk surface. The non-bonded or excess lubricant is then rinsed off in a liquid freon or other suitable rinse.
    Type: Grant
    Filed: November 18, 1994
    Date of Patent: May 20, 1997
    Assignee: International Business Machines Corporation
    Inventors: Li-Ju J. Lin, John S. Foster, Christopher S. Gudeman, Gerard H. Vurens
  • Patent number: 5545478
    Abstract: The present invention is a method for bonding a lubricant onto the surface of rotating storage media. In particular, the method bonds reactive and non-reactive lubricants onto the carbon based protective coating of a magnetic storage disk. The lubricant is first applied onto the disk surface through conventional coating techniques, such as dipping, spinning, spraying, or vapor deposition. The thickness of the applied coating is thicker than the final bonded thickness of the lubricant. Typically, the applied thickness of the film is approximately 30 Angstroms. The lubricant coated disk surface is then exposed to low energy electron irradiation. The energy level of the accelerated electrons is below 100 eV. The lubricated film is exposed to a dosage level of approximately 1000 microcoulombs per square centimeter. This dosage level bonds approximately 15 Angstroms of lubricant to the disk surface. The non-bonded or excess lubricant is then rinsed off in a liquid freon or other suitable rinse.
    Type: Grant
    Filed: June 6, 1994
    Date of Patent: August 13, 1996
    Assignee: International Business Machine Corporation
    Inventors: Li-Ju J. Lin, John S. Foster, Christopher S. Gudeman, Gerard H. Vurens
  • Patent number: 5030478
    Abstract: Thin film recording media are protected and lubricated by overcoating them with a carbon overcoat applying a lubricant to said overcoat and bonding the lubricant to the carbon overcoat by irradiating it by UV radiation.
    Type: Grant
    Filed: February 15, 1991
    Date of Patent: July 9, 1991
    Assignee: International Business Machines Corporation
    Inventors: Li-Ju J. Lin, David D. Saperstein
  • Patent number: 4960609
    Abstract: In the manufacture of a thin film metal alloy or metal oxide magnetic recording disk, a fluoroether lubricant is bonded to the carbon or hydrogenated carbon overcoat of the disk. The lubricant is applied to the carbon overcoat by dipping the disk in a solution of the lubricant. The lubricated disk is then exposed to the plasma of an inert gas, such as nitrogen. The resulting disk contains a layer of lubricant which is bonded to the disk surface so as to be resistant to spin-off and which has a relatively uniform thickness so as to substantially eliminate the problems of stiction during the operation of the disk file.
    Type: Grant
    Filed: November 13, 1989
    Date of Patent: October 2, 1990
    Assignee: International Business Machines Corporation
    Inventors: Andrew M. Homola, Li-Ju J. Lin, David D. Saperstein