Abstract: This invention relates to a UV-curable coating material comprising an organosilica compound such as POSS or octahedral oligomeric silsesquioxane which is functionalized with a UV-curable functional group. The material further comprises at least one UV-curable cross-linker. The coating material comprises surface structures in the nano-sized range and can be used in a nanoimprint coating process where the material is coated on a substrate such as glass and a mold is pressed against the material to form an imprint before curing by UV radiation.

Abstract: This invention relates to a UV-curable coating material comprising an organosilica compound such as POSS or octahedral oligomeric silsesquioxane which is functionalized with a UV-curable functional group. The material further comprises at least one UV-curable cross-linker. The coating material comprises surface structures in the nano-sized range and can be used in a nanoimprint coating process where the material is coated on a substrate such as glass and a mold is pressed against the material to form an imprint before curing by UV radiation.

Abstract: A hard disk drive (HDD) case having a cavity configured to locate a HDD assembly therein, the cavity being coated with a coating characterized in that the center line average roughness (Ra) of the coated surface is 100 nm or less.

Abstract: An arc deposition apparatus comprises an evacuatable chamber and means for positioning at least two targets in the chamber, wherein a first one of the at least two targets is positionable in an operative position and another of the at least two targets is positionable in a standby position. An electrical power supply is provided for supplying electrical power to the target held in the operative position to form an arc on an emission surface of the operative target. Means are provided for preparing an emission surface of the target positioned in the standby position to have a predetermined morphology. Alternatively, or in conjunction with the surface preparing means, means are provided for inspecting whether the emission surface of the target positioned in the standby position has a predetermined morphology. Preferably, the positioning means is configured to interchange the at least two targets at a predetermined time.

Abstract: A cutting tool comprising a body, a cutting edge on at least one part of said body and a plasma deposited carbon coating layer provided on said cutting edge that is substantially free of macro-particles.

Abstract: A method for forming a conductive region on a first portion of a substrate, the method being constituted by exposing the first portion to a filtered beam of substantially fully ionised metallic ions under a pulsed, modulated electrical bias. The method uses FCVA (Filtered Cathodic Vacuum Arc) techniques to generate the filtered ion beam and permits the formation of a conformal metal coating, even in high aspect ratio visa and trenches. The method also permits the in-filling of vias and trenches to form conductive interconnects. Particular examples concern the deposition of copper ions. An adapted FCVA apparatus deposits metals on substrates. A control apparatus controls ion beams impacting upon substrates, the control apparatus being suitable for incorporation within existing filtered ion beam sources.

Abstract: A method for forming a conductive region on a first portion of a substrate, the method comprising exposing the first portion to a filtered beam of substantially fully ionised metallic ions under a pulsed, modulated electrical bias. The method uses FCVA (Filtered Cathodic Vacuum Arc) techniques to generate the filtered ion beam and permits the formation of a conformal metal coating, even in high aspect ratio vias and trenches. The method also permits the in-filling of vias and trenches to form conductive interconnects. Particular examples concern the deposition of copper ions.