Patents by Inventor Li Ko Yeh

Li Ko Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240363364
    Abstract: A semiconductor structure includes a first die; a plurality of first conductive vias adjacent to the first die. The semiconductor structure further includes a plurality of second conductive vias disposed over the first conductive vias, each of the second conductive vias corresponding to one of the first conductive vias; a plurality of third conductive vias disposed over the first die; and a molding material encapsulating the first die, the first conductive vias, the second conductive vias and the third conductive vias. A first width of each of the plurality of first conductive vias, a second width of each of the plurality of second conductive vias and a third width of the plurality of third conductive vias are different from each other.
    Type: Application
    Filed: July 11, 2024
    Publication date: October 31, 2024
    Inventors: JEN-FU LIU, MING HUNG TSENG, YEN-LIANG LIN, LI-KO YEH, HUI-CHUN CHIANG, CHENG-CHIEH WU
  • Patent number: 12087597
    Abstract: A semiconductor structure includes a first die; a second die disposed over the first die; a plurality of first conductive vias adjacent to the first die. The semiconductor structure further includes a plurality of second conductive vias disposed over the first conductive vias, each of the second conductive vias corresponding to one of the first conductive vias; a plurality of third conductive vias disposed over the first die and adjacent to the second die; and a molding material encapsulating the first die, the second die, the first conductive vias, the second conductive vias and the third conductive vias. A stepped shape is formed around an interface between each of the first conductive vias and the corresponding one of the second conductive vias.
    Type: Grant
    Filed: June 9, 2023
    Date of Patent: September 10, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Jen-Fu Liu, Ming Hung Tseng, Yen-Liang Lin, Li-Ko Yeh, Hui-Chun Chiang, Cheng-Chieh Wu
  • Publication number: 20230326766
    Abstract: A semiconductor structure includes a first die; a second die disposed over the first die; a plurality of first conductive vias adjacent to the first die. The semiconductor structure further includes a plurality of second conductive vias disposed over the first conductive vias, each of the second conductive vias corresponding to one of the first conductive vias; a plurality of third conductive vias disposed over the first die and adjacent to the second die; and a molding material encapsulating the first die, the second die, the first conductive vias, the second conductive vias and the third conductive vias. A stepped shape is formed around an interface between each of the first conductive vias and the corresponding one of the second conductive vias.
    Type: Application
    Filed: June 9, 2023
    Publication date: October 12, 2023
    Inventors: JEN-FU LIU, MING HUNG TSENG, YEN-LIANG LIN, LI-KO YEH, HUI-CHUN CHIANG, CHENG-CHIEH WU
  • Patent number: 11715646
    Abstract: A method includes forming a plurality of first conductive vias over a redistribution layer (RDL); disposing a first die over the RDL and adjacent to the first vias; and forming a plurality of second conductive vias over and electrically connected to the first conductive vias, each of the second conductive vias corresponding to one of the first conductive vias. The method further includes forming a plurality of third conductive vias over the first die; disposing a second die over the first die and adjacent to the third conductive vias; and encapsulating the first die, the second die, the first conductive vias, the second conductive vias and the third conductive vias with a molding material.
    Type: Grant
    Filed: July 16, 2021
    Date of Patent: August 1, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Jen-Fu Liu, Ming Hung Tseng, Yen-Liang Lin, Li-Ko Yeh, Hui-Chun Chiang, Cheng-Chieh Wu
  • Publication number: 20230015970
    Abstract: A method includes forming a plurality of first conductive vias over a redistribution layer (RDL); disposing a first die over the RDL and adjacent to the first vias; and forming a plurality of second conductive vias over and electrically connected to the first conductive vias, each of the second conductive vias corresponding to one of the first conductive vias. The method further includes forming a plurality of third conductive vias over the first die; disposing a second die over the first die and adjacent to the third conductive vias; and encapsulating the first die, the second die, the first conductive vias, the second conductive vias and the third conductive vias with a molding material.
    Type: Application
    Filed: July 16, 2021
    Publication date: January 19, 2023
    Inventors: JEN-FU LIU, MING HUNG TSENG, YEN-LIANG LIN, LI-KO YEH, HUI-CHUN CHIANG, CHENG-CHIEH WU
  • Patent number: 9261627
    Abstract: The disclosure provides a zinc oxide anti-reflection layer having a syringe-like structure and method for fabricating the same. The zinc oxide anti-reflection layer includes: a zinc oxide lower portion, wherein the zinc oxide lower portion has a nanorod array structure; and a zinc oxide upper portion connected to the zinc oxide lower portion, wherein the zinc oxide anti-reflection layer has a syringe-like structure.
    Type: Grant
    Filed: May 10, 2012
    Date of Patent: February 16, 2016
    Assignee: Industrial Technology Research Institute
    Inventors: Kun-Ping Huang, Jr-Hau He, Li-Ko Yeh, Kun-Yu Lai
  • Publication number: 20130129974
    Abstract: The disclosure provides a zinc oxide anti-reflection layer having a syringe-like structure and method for fabricating the same. The zinc oxide anti-reflection layer includes: a zinc oxide lower portion, wherein the zinc oxide lower portion has a nanorod array structure; and a zinc oxide upper portion connected to the zinc oxide lower portion, wherein the zinc oxide anti-reflection layer has a syringe-like structure.
    Type: Application
    Filed: May 10, 2012
    Publication date: May 23, 2013
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kun-Ping Huang, Jr-Hau He, Li Ko Yeh, Kun-Yu Lai