Patents by Inventor Li Nien Chen

Li Nien Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7845374
    Abstract: A gas filling apparatus used to fill a photomask box with gas such as nitrogen or other inert gas. The gas filling apparatus of the present invention has a gas filling chamber provided with a plurality of first pillared elements, a plurality of second pillared elements, at least one gas inlet, at least one gas outlet, and a plurality of clamping elements; wherein the first pillared elements are used to couple with the recesses on a cover member of the photomask box, the second pillared elements are used to prop against the peripheral of a cover member of the photomask box, and the clamping elements respectively prop against two opposite sides of the cover member of photomask box, whereby the gas inlets and the gas outlets are respectively coupled with the through holes formed on the lower cover member of the photomask box and the gas can be filled into and exhausted from the photomask box.
    Type: Grant
    Filed: October 3, 2006
    Date of Patent: December 7, 2010
    Assignee: Gudeng Precision Industrial Co., Ltd.
    Inventors: Pan Yung Shuen, Li Nien Chen
  • Publication number: 20070298331
    Abstract: A gas filling apparatus used to fill a photomask box with gas such as nitrogen or other inert gas. The gas filing apparatus of the present invention has a gas filling chamber provided with a plurality of first pillared elements, a plurality of second pillared elements, at least one gas inlet, at least one gas outlet, and a plurality of clamping elements; wherein the first pillared elements are used to couple with the recesses on a cover member of the photomask box, the second pillared elements are used to prop against the peripheral of a cover member of the photomask box, and the clamping elements respectively prop against two opposite sides of the cover member of photomask box, whereby the gas inlets and the gas outlets are respectively coupled with the through holes formed on the lower cover member of the photomask box and the gas can be filled into and exhausted from the photomask box.
    Type: Application
    Filed: October 3, 2006
    Publication date: December 27, 2007
    Inventors: Pan Yung Shuen, Li Nien Chen