Patents by Inventor Li (Sherry) Xu

Li (Sherry) Xu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of cleaning and forming a negatively charged passivation layer over a doped region
    Patent number: 8268728
    Abstract: The present invention generally provides a method of forming a high efficiency solar cell device by preparing a surface and/or forming at least a part of a high quality passivation layer on a silicon containing substrate. Embodiments of the present invention may be especially useful for preparing a surface of a p-type doped region formed on a silicon substrate so that a high quality passivation layer can be formed thereon. In one embodiment, the methods include exposing a surface of the solar cell substrate to a plasma to clean and modify the physical, chemical and/or electrical characteristics of the surface.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: September 18, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Michael P. Stewart, Lisong Zhou, Jen Shu, Li (Sherry) Xu
  • METHOD OF CLEANING AND FORMING A NEGATIVELY CHARGED PASSIVATION LAYER OVER A DOPED REGION
    Publication number: 20110287577
    Abstract: The present invention generally provides a method of forming a high efficiency solar cell device by preparing a surface and/or forming at least a part of a high quality passivation layer on a silicon containing substrate. Embodiments of the present invention may be especially useful for preparing a surface of a p-type doped region formed on a silicon substrate so that a high quality passivation layer can be formed thereon. In one embodiment, the methods include exposing a surface of the solar cell substrate to a plasma to clean and modify the physical, chemical and/or electrical characteristics of the surface.
    Type: Application
    Filed: August 2, 2011
    Publication date: November 24, 2011
    Applicant: Applied Materials, Inc.
    Inventors: Michael P. STEWART, Lisong Zhou, Jen Shu, Li (Sherry) Xu
  • Method of cleaning and forming a negatively charged passivation layer over a doped region
    Patent number: 8008208
    Abstract: The present invention generally provides a method of forming a high efficiency solar cell device by preparing a surface and/or forming at least a part of a high quality passivation layer on a silicon containing substrate. Embodiments of the present invention may be especially useful for preparing a surface of a p-type doped region formed on a silicon substrate so that a high quality passivation layer can be formed thereon. In one embodiment, the methods include exposing a surface of the solar cell substrate to a plasma to clean and modify the physical, chemical and/or electrical characteristics of the surface.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: August 30, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Michael P. Stewart, Lisong Zhou, Jen Shu, Li (Sherry) Xu
  • METHOD OF CLEANING AND FORMING A NEGATIVELY CHARGED PASSIVATION LAYER OVER A DOPED REGION
    Publication number: 20110136286
    Abstract: The present invention generally provides a method of forming a high efficiency solar cell device by preparing a surface and/or forming at least a part of a high quality passivation layer on a silicon containing substrate. Embodiments of the present invention may be especially useful for preparing a surface of a p-type doped region formed on a silicon substrate so that a high quality passivation layer can be formed thereon. In one embodiment, the methods include exposing a surface of the solar cell substrate to a plasma to clean and modify the physical, chemical and/or electrical characteristics of the surface.
    Type: Application
    Filed: December 7, 2010
    Publication date: June 9, 2011
    Applicant: Applied Materials, Inc.
    Inventors: Michael P. Stewart, Lisong Zhou, Jen Shu, Li (Sherry) Xu