Patents by Inventor Li Shiuan Tsai

Li Shiuan Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8664648
    Abstract: An N-type organic thin film transistor, an ambipolar field-effect transistor, and methods of fabricating the same are disclosed. The N-type organic thin film transistor of the present invention comprises: a substrate; a gate electrode locating on the substrate; a gate-insulating layer covering the gate electrode, and the gate-insulating layer is made of silk protein; a buffering layer locating on the gate-insulating layer, and the buffering layer is made of pentacene; an N-type organic semiconductor layer locating on the buffering layer; and a source and a drain electrode, wherein the N-type organic semiconductor layer, the buffering layer, the source and the drain electrode are disposed over the gate dielectric layer.
    Type: Grant
    Filed: March 20, 2012
    Date of Patent: March 4, 2014
    Assignee: National Tsing Hua University
    Inventors: Jenn-Chang Hwang, Li-Shiuan Tsai, Chun-Yi Lee, Cheng-Lun Tsai
  • Publication number: 20130181192
    Abstract: An organic floating gate memory device having protein and a method of fabricating the same are disclosed.
    Type: Application
    Filed: August 13, 2012
    Publication date: July 18, 2013
    Inventors: Jenn-Chang HWANG, Li Shiuan TSAI, Jon-Yiew GAN
  • Publication number: 20130181191
    Abstract: An electronic device including a bio-polymer material and a method for manufacturing the same are disclosed. The electronic device of the present invention comprises: a substrate; a first electrode disposed on the substrate; a bio-polymer layer disposed on the first electrode, wherein the bio-polymeric material is selected from a group consisting of wool keratin, collagen hydrolysate, gelatin, whey protein and hydroxypropyl methylcellulose; and a second electrode disposed on the biopolymer material layer. The present invention is suitable for various electronic devices such as an organic thin film transistor, an organic floating gate memory, or a metal-insulator-metal capacitor.
    Type: Application
    Filed: June 1, 2012
    Publication date: July 18, 2013
    Inventors: Jenn-Chang Hwang, Chao-Ying Hsieh, Lung-Kai Mao, Chun-Yi Lee, Li-Shiuan Tsai, Cheng-Lung Tsai, Wei-Cheng Chung, Ping-Chiang Lyu
  • Publication number: 20130105204
    Abstract: A circuit board and a method for manufacturing the same are disclosed. The circuit board of the present invention comprises: a carrier board, wherein a first circuit layer is disposed on at least one surface of the carrier board, and the first circuit layer comprises plural conductive pads; a protein dielectric layer disposed on the surface of the carrier board and the first circuit layer, wherein the protein dielectric layer has plural openings to expose the conductive pads; and a second circuit layer disposed on a surface of the protein dielectric layer, wherein the second circuit layer comprises plural first conductive vias, and each first conductive via is correspondingly formed in the opening and electrically connects to the conductive pad.
    Type: Application
    Filed: March 12, 2012
    Publication date: May 2, 2013
    Applicant: National Tsing Hua University
    Inventors: Jenn-Chang HWANG, Chao-Ying HSIEH, Chwung-Shan KOU, Chung-Hwa WANG, Li-Shiuan TSAI, Lung-Kai MAO, Shih-Jie JIAN, Jian-You LIN, Chun-Yi LEE
  • Publication number: 20120175602
    Abstract: An N-type organic thin film transistor, an ambipolar field-effect transistor, and methods of fabricating the same are disclosed. The N-type organic thin film transistor of the present invention comprises: a substrate; a gate electrode locating on the substrate; a gate-insulating layer covering the gate electrode, and the gate-insulating layer is made of silk protein; a buffering layer locating on the gate-insulating layer, and the buffering layer is made of pentacene; an N-type organic semiconductor layer locating on the buffering layer; and a source and a drain electrode, wherein the N-type organic semiconductor layer, the buffering layer, the source and the drain electrode are disposed over the gate dielectric layer.
    Type: Application
    Filed: March 20, 2012
    Publication date: July 12, 2012
    Applicant: National Tsing Hua University
    Inventors: Jenn-Chang HWANG, Li-Shiuan TSAI, Chun-Yi LEE, Cheng-Lun TSAI
  • Patent number: 8110433
    Abstract: A method of fabricating an organic thin film transistor is disclosed, which comprises steps of (S1) forming a gate electrode on a substrate; (S2) forming a gate insulating layer on the gate electrode; (S3) providing a gas on the surface of the gate insulating layer to form hydrophobic molecules on the surface of the gate insulating layer; (S4) forming an organic semiconductor layer, a source electrode, and a drain electrode over the gate insulating layer having hydrophobic molecules thereon, wherein the gas of step (S3) is at least one selected from the group consisting of halogen-substituted hydrocarbon, un-substituted hydrocarbon, and the mixtures thereof. The method of the present invention utilizes gases comprising carbon or fluorine atom to perform surface treatment on the surface of the gate insulating layer, therefore the hydrophobic character of the surface of the gate insulating layer can be enhanced and the electrical properties of the OTFT can be improved.
    Type: Grant
    Filed: January 26, 2010
    Date of Patent: February 7, 2012
    Assignee: National Tsing Hua University
    Inventors: Cheng Wei Chou, Hsiao Wen Zan, Jenn-Chang Hwang, Chung Hwa Wang, Li Shiuan Tsai, Wen Chieh Wang
  • Publication number: 20110086467
    Abstract: A method of fabricating an organic thin film transistor is disclosed, which comprises steps of (S1) forming a gate electrode on a substrate; (S2) forming a gate insulating layer on the gate electrode; (S3) providing a gas on the surface of the gate insulating layer to form hydrophobic molecules on the surface of the gate insulating layer; (S4) forming an organic semiconductor layer, a source electrode, and a drain electrode over the gate insulating layer having hydrophobic molecules thereon, wherein the gas of step (S3) is at least one selected from the group consisting of halogen-substituted hydrocarbon, un-substituted hydrocarbon, and the mixtures thereof. The method of the present invention utilizes gases comprising carbon or fluorine atom to perform surface treatment on the surface of the gate insulating layer, therefore the hydrophobic character of the surface of the gate insulating layer can be enhanced and the electrical properties of the OTFT can be improved.
    Type: Application
    Filed: January 26, 2010
    Publication date: April 14, 2011
    Applicant: National Tsing Hua University
    Inventors: Cheng Wei Chou, Hsiano Wen Zan, Jenn-Chang Hwang, Chung Hwa Wang, Li Shiuan Tsai, Wen Chieh Wang