Patents by Inventor Li-Wen Hung
Li-Wen Hung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11797851Abstract: A Static Random Access Memory (SRAM) device in a binary neural network is provided. The SRAM device includes an SRAM inference engine having an SRAM computation architecture with a forward path that include multiple SRAM cells forming a chain of SRAM cells such that an output of a given one of the multiple SRAM cells is an input to a following one of the multiple SRAM cells. The SRAM computation architecture is configured to compute a prediction from an input. The SRAM computation architecture is configured to store ternary data and perform local computations on the ternary data.Type: GrantFiled: December 20, 2022Date of Patent: October 24, 2023Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Chia-Yu Chen, Jui-Hsin Lai, Ko-Tao Lee, Li-Wen Hung
-
Publication number: 20230210024Abstract: One or more systems, devices, methods of use and/or methods of fabrication provided herein relate to a superconducting device that can be operated with minimal electric field energy coupling at surface layers of the superconducting device and/or that can have a small footprint. According to one embodiment, a device can comprise a Josephson junction located between a first capacitor portion and a second capacitor portion of a capacitor, wherein at least a trenched section of the first capacitor portion is located beneath a surface of a substrate, and wherein at least a trenched section of the second capacitor portion is located beneath the surface of the substrate. According to another embodiment, a device can comprise a capacitor disposed within a substrate layer and the capacitor comprising a pair of material-filled trenches in the substrate layer, and a Josephson junction coupled to the capacitor.Type: ApplicationFiled: December 28, 2021Publication date: June 29, 2023Inventors: Li-Wen Hung, Elbert Emin Huang, Harry Jonathon Mamin, Daniel Rugar, Martin O. Sandberg, Joseph Finley
-
Publication number: 20230121677Abstract: A Static Random Access Memory (SRAM) device in a binary neural network is provided. The SRAM device includes an SRAM inference engine having an SRAM computation architecture with a forward path that include multiple SRAM cells forming a chain of SRAM cells such that an output of a given one of the multiple SRAM cells is an input to a following one of the multiple SRAM cells. The SRAM computation architecture is configured to compute a prediction from an input. The SRAM computation architecture is configured to store ternary data and perform local computations on the ternary data.Type: ApplicationFiled: December 20, 2022Publication date: April 20, 2023Inventors: Chia-Yu Chen, Jui-Hsin Lai, Ko-Tao Lee, Li-Wen Hung
-
Patent number: 11599785Abstract: A Static Random Access Memory (SRAM) device in a binary neural network is provided. The SRAM device includes an SRAM inference engine having an SRAM computation architecture with a forward path that include multiple SRAM cells. The multiple SRAM cells are configured to form a chain of SRAM cells such that an output of a given one of the multiple SRAM cells is an input to a following one of the multiple SRAM cells. The SRAM computation architecture is configured to compute a prediction from an input.Type: GrantFiled: November 13, 2018Date of Patent: March 7, 2023Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Chia-Yu Chen, Jui-Hsin Lai, Ko-Tao Lee, Li-Wen Hung
-
Patent number: 11424152Abstract: Various embodiments process semiconductor devices. In one embodiment, a release layer is applied to a handler. The release layer comprises at least one additive that adjusts a frequency of electro-magnetic radiation absorption property of the release layer. The additive comprises, for example, a 355 nm chemical absorber and/or chemical absorber for one of more wavelengths in a range comprising 600 nm to 740 nm. The at least one singulated semiconductor device is bonded to the handler. The at least one singulated semiconductor device is packaged while it is bonded to the handler. The release layer is ablated by irradiating the release layer through the handler with a laser. The at least one singulated semiconductor device is removed from the transparent handler after the release layer has been ablated.Type: GrantFiled: February 3, 2020Date of Patent: August 23, 2022Assignee: International Business Machines CorporationInventors: Paul S. Andry, Bing Dang, Jeffrey Donald Gelorme, Li-Wen Hung, John U. Knickerbocker, Cornelia Kang-I Tsang
-
Patent number: 11222862Abstract: Techniques for high speed handling of ultra-small chips (e.g., micro-chips) by selective laser bonding and/or debonding are provided. In one aspect, a method includes: providing a first wafer including chips bonded to a surface thereof; contacting the first wafer with a second wafer, the second wafer including a substrate bonded to a surface thereof, wherein the contacting aligns individual chips with bonding sites on the substrate; and debonding the individual chips from the first wafer using a debonding laser having a small spot size of about 0.5 ?m to about 100 ?m, and ranges therebetween. A system is also provided that has digital cameras, a motorized XYZ-axis stage, and a computer control system configured to i) control a spot size of the at least one laser source and ii) adjust a positioning of the sample to align individual chips with a target area of the laser.Type: GrantFiled: October 21, 2019Date of Patent: January 11, 2022Assignee: International Business Machines CorporationInventors: Qianwen Chen, Bing Dang, Russell Budd, Bo Wen, Li-Wen Hung, Jae-Woong Nah, John Knickerbocker
-
Patent number: 11201138Abstract: A method of manufacturing a multi-layer wafer is provided. Under bump metallization (UMB) pads are created on each of two heterogeneous wafers. A conductive means is applied above the UMB pads on at least one of the two heterogeneous wafers. The two heterogeneous wafers are low temperature bonded to adhere the UMB pads together via the conductive means. At least one stress compensating polymer layer may be applied to at least one of two heterogeneous wafers. The stress compensating polymer layer has a polymer composition of a molecular weight polymethylmethacrylate polymer at a level of 10-50% with added liquid multifunctional acrylates forming the remaining 50-90% of the polymer composition.Type: GrantFiled: December 17, 2019Date of Patent: December 14, 2021Assignee: International Business Machines CorporationInventors: Bing Dang, Li-Wen Hung, John U. Knickerbocker, Jae-Woong Nah
-
Patent number: 11158781Abstract: A quantum device includes a qubit chip having a plurality of qubits and an interposer attached to and electrically connected to the qubit chip. The device also includes a substrate handler attached to one side of the qubit chip or to one side of the interposer, or both so as to be thermally in contact with the qubit chip or the interposer, or both. The substrate handler includes a plurality of vias, at least a portion of plurality of vias being filled with a non-superconducting material, the non-superconducting material being selected to dissipate heat generated in the qubit chip, the interposer or both.Type: GrantFiled: November 27, 2019Date of Patent: October 26, 2021Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Jae-Woong Nah, Li-Wen Hung, Eric P. Lewandowski, Adinath S. Narasgond
-
Patent number: 11121005Abstract: Various embodiments process semiconductor devices. In one embodiment, a release layer is applied to a handler. The at least one singulated semiconductor device is bonded to the handler. The at least one singulated semiconductor device is packaged while it is bonded to the handler. The release layer is ablated by irradiating the release layer through the handler with a laser. The at least one singulated semiconductor device is removed from the transparent handler after the release layer has been ablated.Type: GrantFiled: January 31, 2020Date of Patent: September 14, 2021Assignee: International Business Machines CorporationInventors: Paul S. Andry, Bing Dang, Jeffrey Donald Gelorme, Li-Wen Hung, John U. Knickerbocker, Cornelia Tsang Yang
-
Patent number: 11094407Abstract: A drug delivery form includes a drug and electronics. The electronics includes memory(ies) having drug delivery form information, including information about the drug and about at least part of a supply chain from manufacture of the drug delivery form to a current location in the supply chain. The electronics includes communication circuitry configured to read data from and write data to the drug delivery form information. An apparatus includes memory(ies) having computer readable code, and processor(s). The processor(s) cause the apparatus to perform operations including communicating with a drug delivery form including a drug and drug delivery form information, including information about the drug and about at least part of a supply chain from manufacture of the drug delivery form to a current location in the supply chain. The processor(s) cause the apparatus to perform reading data from or writing data into the drug and drug delivery form information.Type: GrantFiled: June 13, 2019Date of Patent: August 17, 2021Assignee: International Business Machines CorporationInventors: John Knickerbocker, Li-Wen Hung, Bing Dang, Katsuyuki Sakuma, Jeffrey Donald Gelorme, Rajeev Narayanan, Qianwen Chen
-
Patent number: 11055459Abstract: A method of forming an electrical device is provided that includes forming microprocessor devices on a microprocessor die; forming memory devices on an memory device die; forming component devices on a component die; and forming a plurality of packing devices on a packaging die. Transferring a plurality of each of said microprocessor devices, memory devices, component devices and packaging components to a supporting substrate, wherein the packaging components electrically interconnect the memory devices, component devices and microprocessor devices in individualized groups. Sectioning the supporting substrate to provide said individualized groups of memory devices, component devices and microprocessor devices that are interconnected by a packaging component.Type: GrantFiled: June 6, 2019Date of Patent: July 6, 2021Assignee: International Business Machines CorporationInventors: Qianwen Chen, Li-Wen Hung, Wanki Kim, John U. Knickerbocker, Kenneth P. Rodbell, Robert L. Wisnieff
-
Patent number: 11043301Abstract: Methods and systems for activity monitoring include capturing an infrared image of an environment that comprises at least one patient being monitored and at least one infrared-emitting tag. A relationship between the patient being monitored and the at least one infrared-emitting tag is determined. An activity conducted by the patient being monitored is determined based on the relationship between the patient being monitored and the at least one infrared-emitting tag. A course of treatment for the patient being monitored is adjusted based on the determined activity.Type: GrantFiled: October 23, 2019Date of Patent: June 22, 2021Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Li-Wen Hung, Jui-Hsin Lai
-
Publication number: 20210159382Abstract: A quantum device includes a qubit chip having a plurality of qubits and an interposer attached to and electrically connected to the qubit chip. The device also includes a substrate handler attached to one side of the qubit chip or to one side of the interposer, or both so as to be thermally in contact with the qubit chip or the interposer, or both. The substrate handler includes a plurality of vias, at least a portion of plurality of vias being filled with a non-superconducting material, the non-superconducting material being selected to dissipate heat generated in the qubit chip, the interposer or both.Type: ApplicationFiled: November 27, 2019Publication date: May 27, 2021Inventors: Jae-Woong Nah, Li-Wen Hung, Eric P. Lewandowski, Adinath S. Narasgond
-
Patent number: 10940554Abstract: Methods of fabricating a probe are described. In an example, a structure may be formed on a surface of a substrate. The structure may include the probe, a hinge, and an anchor arranged linearly, where an angle is formed between the probe and the hinge. The hinge may be positioned between the probe and the anchor, and the structure may be parallel to the substrate. An amount of solder may be deposited on an area of the structure that spans from a portion of the probe to a portion of the anchor, and across the hinge. The deposited solder may be reshaped by an execution of a solder reflow process. The reshape of the deposited solder may cause the probe to rotate about the hinge in order to reduce the angle between the probe and the hinge.Type: GrantFiled: November 30, 2018Date of Patent: March 9, 2021Assignee: International Business Machines CorporationInventors: Li-Wen Hung, Jui-Hsin Lai, Chia-Yu Chen, Ko-Tao Lee
-
Publication number: 20200395115Abstract: A drug delivery form includes a drug and electronics. The electronics includes memory(ies) having drug delivery form information, including information about the drug and about at least part of a supply chain from manufacture of the drug delivery form to a current location in the supply chain. The electronics includes communication circuitry configured to read data from and write data to the drug delivery form information. An apparatus includes memory(ies) having computer readable code, and processor(s). The processor(s) cause the apparatus to perform operations including communicating with a drug delivery form including a drug and drug delivery form information, including information about the drug and about at least part of a supply chain from manufacture of the drug delivery form to a current location in the supply chain. The processor(s) cause the apparatus to perform reading data from or writing data into the drug and drug delivery form information.Type: ApplicationFiled: June 13, 2019Publication date: December 17, 2020Inventors: John Knickerbocker, Li-Wen Hung, Bing Dang, Katsuyuki Sakuma, Jeffrey Donald Gelorme, Rajeev Narayanan, Qianwen Chen
-
Patent number: 10835156Abstract: A thermal tag for activity monitoring. The thermal tag includes a base layer having a plurality of metal lines to provide a conductive path, and a pattern layer having one or more infrared emitting features positioned over portions of the conductive path, wherein at least one infrared emitting feature couples to the conductive path to emit a predetermined infrared pattern in accordance with nearby activity.Type: GrantFiled: May 29, 2019Date of Patent: November 17, 2020Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Li-Wen Hung, Jui-Hsin Lai
-
Patent number: 10833048Abstract: A technique relates to a semiconductor device. First nanowires are formed on a first substrate, the first nanowires being electrically coupled to one or more first electrical sites on the first substrate. Second nanowires are formed on a second substrate, the second nanowires being electrically coupled to one or more second electrical sites on the second substrate. The first nanowires and the second nanowires are electrically coupled such that the one or more first electrical sites are electrically coupled to the one or more second electrical sites.Type: GrantFiled: April 11, 2018Date of Patent: November 10, 2020Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Li-Wen Hung, Reinaldo Vega, Hari Mallela
-
Patent number: 10811413Abstract: Multi-voltage threshold vertical transport transistors and methods of fabrication generally include forming the transistors with vertically oriented silicon fin channels for both the n-type doped field effect transistors (nFET) and the p-type doped field effect transistors (pFET). A silicon oxynitride interfacial layer is provided on sidewalls of the fins in the nFET and a silicon dioxide interfacial with aluminum is provided on sidewalls of the fins in the pFET to provide an aluminum induced dipole. A high k dielectric overlays the interfacial layers and a common work function metal overlays the high k dielectric layer to define a gate structure.Type: GrantFiled: August 13, 2018Date of Patent: October 20, 2020Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Takashi Ando, Reinaldo Vega, Choonghyun Lee, Hari Mallela, Li-Wen Hung
-
Patent number: 10811305Abstract: A multi-layer wafer and method of manufacturing such wafer are provided. The method comprises applying a stress compensating oxide layer to each of two heterogeneous wafers, applying at least one bonding oxide layer to at least one of the two heterogeneous wafers, chemical-mechanical polishing the at least one bonding oxide layer, and low temperature bonding the two heterogeneous wafers to form a multi-layer wafer pair. The multi-layer wafer comprises two heterogeneous wafers, each of the heterogeneous wafers having a stress compensating oxide layer and at least one bonding oxide layer applied to at least one of the two heterogeneous wafers. The two heterogeneous wafers are low temperature bonded together to form the multi-layer wafer.Type: GrantFiled: September 22, 2016Date of Patent: October 20, 2020Assignee: International Business Machines CorporationInventors: Li-Wen Hung, John U. Knickerbocker, Leathen Shi, Cornelia Tsang Yang, Bucknell C. Webb
-
Publication number: 20200312912Abstract: A stacked resistive random access memory (ReRAM) structure is provided. The stacked ReRAM structure includes a channel, a ReRAM cell sub-structure and a contact via sub-structure. The ReRAM cell structure includes ReRAM cell, drain, gate and source layers, which are insulated from one another and respectively disposed in operative contact with the channel. The contact via sub-structures includes first, second, third and fourth contact vias, which are separate from one another. The first contact via is disposed in exclusive operative contact with the ReRAM cell layer. The second contact via is disposed in exclusive operative contact with the drain layer. The third contact via is disposed in exclusive operative contact with the gate layer. The fourth contact via is disposed in exclusive operative contact with the source layer.Type: ApplicationFiled: March 28, 2019Publication date: October 1, 2020Inventors: REINALDO VEGA, TAKASHI ANDO, HARI MALLELA, Li-Wen Hung