Patents by Inventor Liang-Chun Wang

Liang-Chun Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230377847
    Abstract: A spot type atmospheric pressure plasma device includes a metal casing, a metal electrode, a dielectric layer, and a gas channel. The metal electrode is disposed in an inner space of the metal casing. The dielectric layer is disposed in the inner space and surrounds an outer side surface of the metal electrode. A central area of a bottom of the dielectric layer has a plasma jet, and a bottom of the metal electrode is adjacent to the plasma jet. The gas channel includes a first section, a second section, and a third section. The first section passes through the metal casing and the dielectric layer. The second section is connected to the first section and extends between the dielectric layer and the outer side surface. The third section is connected to the second section, and is configured to direct a working gas to the plasma jet.
    Type: Application
    Filed: May 20, 2022
    Publication date: November 23, 2023
    Inventors: Yi-Ming HSU, Liang-Chun WANG, Yung-Hao CHEN, Po-Hsuan CHEN, Wen-Chieh TAN, Huang-Wei CHEN
  • Publication number: 20230377846
    Abstract: A wide area atmospheric pressure plasma device includes a metal casing, a metal electrode, and a dielectric layer. The metal casing includes a chamber, at least one gas channel, and a plasma jet channel, in which the plasma jet channel is located under the chamber. The metal electrode is disposed within the chamber, is adjacent to the plasma jet channel, and extends along a length direction of the plasma jet channel. An outlet of the gas channel is adjacent to a bottom of the metal electrode, such that a working gas in the gas channel is sprayed towards the bottom of the metal electrode. The dielectric layer wraps the metal electrode.
    Type: Application
    Filed: May 19, 2022
    Publication date: November 23, 2023
    Inventors: Yi-Ming HSU, Liang-Chun WANG, Yung-Hao CHEN, Po-Hsuan CHEN, Shih-Chang WANG, Huang-Wei CHEN
  • Patent number: 6730364
    Abstract: A method for preparing carbon molecular sieve membrane is invented. A thin carbon-containing film is first deposited on a porous substrate. The thin film is then bombarded by high energy ions for surface modification. The surface modified film is then baked or calcined at a high temperature. The carbon molecular sieve membrane prepared according to the present invention can be used for gas separation as well as liquid separation, ions or solvents, etc., exhibiting improved permeance and improved selectivity simultaneously in gas separation. The ion bombardment includes generating plasma and ions in a gas phase, and applying a negative bias voltage to the substrate.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: May 4, 2004
    Assignee: National Science Council
    Inventors: Franklin Chau-Nan Hong, Liang-Chun Wang, Yoou-Bin Guo
  • Publication number: 20030185998
    Abstract: A method for preparing carbon molecular sieve membrane is invented. A thin carbon-containing film is first deposited on a porous substrate. The thin film is then bombarded by high energy ions for surface modification. The surface modified film is then baked or calcined at a high temperature. The carbon molecular sieve membrane prepared according to the present invention can be used for gas separation as well as liquid separation, ions or solvents, etc., exhibiting improved permeance and improved selectivity simultaneously in gas separation. The ion bombardment includes generating plasma and ions in a gas phase, and applying a negative bias voltage to the substrate.
    Type: Application
    Filed: March 28, 2002
    Publication date: October 2, 2003
    Applicant: NATIONAL SCIENCE COUNCIL
    Inventors: Franklin Chau-Nan Hong, Liang-Chun Wang, Yoou-Bin Guo