Patents by Inventor Liang Huo

Liang Huo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11933928
    Abstract: An irregular seismic data collection method is based on forward modeling. The method includes: fully collecting geological information of a work area to build a geological model, determining arrangement parameters of receiver points and shot points for regular high-density collection and irregular sparse collection, performing irregular optimization design on positions of the shot points based on forward modeling, performing irregular optimization design on positions of the receiver points based on forward modeling, and outputting a preferred irregular sparse observation system.
    Type: Grant
    Filed: March 23, 2023
    Date of Patent: March 19, 2024
    Assignee: Institute of Geology and Geophysics, Chinese Academy of Sciences
    Inventors: Shengqiang Mu, Shoudong Huo, Guoxu Shu, Xuhui Zhou, Jiaru Zou, Liang Huang
  • Patent number: 11921099
    Abstract: A method for quantitatively analyzing the reservoir formation of an ultra-deep evaporite-dolomite paragenesis system is performed as follows. A typical drilling core containing the evaporite-dolomite paragenesis system and a field section are observed. The logging data is subjected to single-factor analysis to determine the planar distribution regularity of the ultra-deep evaporite and the dolomite, and the analysis of sedimentary combination pattern and development evolution regularity is performed. The diagenetic system is determined, and the reservoir formation of the evaporite-dolomite paragenesis system is analyzed. Based on the above technical solutions, the property, the evolution path and the reservoir formation of sedimentation-diagenesis fluids in the evaporite-dolomite paragenesis system can be clarified.
    Type: Grant
    Filed: July 31, 2023
    Date of Patent: March 5, 2024
    Assignee: SOUTHWEST PETROLEUM UNIVERSITY
    Inventors: Fei Huo, Xingzhi Wang, Huaguo Wen, Huiwen Huang, Yunbo Ruan, Liang Li
  • Publication number: 20220399379
    Abstract: A driving backplane includes: a base; a first conductive layer disposed on the base, the first conductive layer including at least one first signal line; a first insulating layer disposed on a side of the first conductive layer away from the base; a second conductive layer disposed on a side of the first insulating layer away from the first conductive layer, the second conductive layer including at least one second signal line. Each first signal line and a second signal line constitute a signal line pair. In the signal line pair, extending directions of the first signal line and the second signal line are the same, an orthogonal projection of the first signal line on the base and an orthogonal projection of the second signal line on the base have a first overlapping region, and the second signal line is coupled to the first signal line.
    Type: Application
    Filed: December 18, 2020
    Publication date: December 15, 2022
    Applicants: Chongqing BOE Display Technology Co.,Ltd., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Wentao WANG, Dawei SHI, Pei WANG, Dongsheng ZHAO, Lu YANG, Liang HUO, Cenhong DUAN, Can HUANG, Xiaosong WEN
  • Patent number: 10203875
    Abstract: A method to initiate Command Address (CA) training on High Memory Bandwidth is provided to optimize CA bus setup and hold times relative to the memory clock. HBM protocol does not define any way to support CA training, but defines a very high working frequency. The high frequency makes it very difficult to ensure the timing on CA Bus-Row/Column command bus and CKE. As such, executing CA training before any normal operation is necessary to ensure the best setup/hold timings. The CA training takes advantage of protocol based instructions to initialize and implement CA training.
    Type: Grant
    Filed: June 30, 2016
    Date of Patent: February 12, 2019
    Assignee: Cadence Design Systems, Inc.
    Inventors: Guangxi Ying, Zhehong Qian, Liang Huo, Yanjuan Zhan
  • Patent number: 8405137
    Abstract: Single transistor floating-body DRAM devices have a vertical channel transistor structure. The DRAM devices include a substrate, and first and second floating bodies disposed on the substrate and isolated from each other. A source region and a drain region are disposed under and above each of the first and second floating bodies. A gate electrode is disposed between the first and second floating bodies. Methods of fabricating the single transistor floating-body DRAM devices are also provided.
    Type: Grant
    Filed: November 21, 2011
    Date of Patent: March 26, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Zong-Liang Huo, Seung-Jae Baik, In-Seok Yeo, Hong-Sik Yoon, Shi-Eun Kim
  • Publication number: 20120259480
    Abstract: The present invention provides a vehicle-mounted device, a method for activating the vehicle-mounted device, and a vehicle-mounted system. The vehicle-mounted system includes a vehicle-mounted device, a data center, and a service platform. The vehicle-mounted device not only can be locally activated according to an activating information corresponding to an identity information of the vehicle-mounted device which indicates an unique identity of the vehicle-mounted device, but also can be remotely activated through wireless communication. Moreover, the vehicle-mounted system further includes application sub-modules which can provide extended/added functions. Therefore, by the method for activating a vehicle-mounted device provided by the present invention, the vehicle-mounted device can be activated in time, so that the information resources can be more easily and conveniently obtained by the user.
    Type: Application
    Filed: December 27, 2010
    Publication date: October 11, 2012
    Applicants: Shanghai PATEO Internet Technology Service Co., Ltd., Shanghai PATEO Electronic Equipment Manufacturing Co., Ltd.
    Inventors: Liang Huo, Zhifeng Zhong, Yu Yao, Jun Zhu, Jianlong Luo, Dawei Zhu, Yehui Zhang
  • Patent number: 8269268
    Abstract: The device includes: a tunnel insulating layer, a charge trap layer; a blocking insulating layer; and a gate electrode sequentially formed on a substrate. The charge trap layer includes: plural trap layers comprising a first material having a first band gap energy level; spaced apart nanodots, each nanodot being at least partially surrounded by at least one of the trap layers, wherein the nanodots comprise a second material having a second band gap energy level that is lower than the first band gap energy level; and an intermediate blocking layer comprising a third material having a third band gap energy level that is higher than the first band gap energy level, formed between at least two of the trap layers. This structure prevents loss of charges from the charge trap layer and improves charge storage capacity.
    Type: Grant
    Filed: April 2, 2008
    Date of Patent: September 18, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Zong-liang Huo, In-seok Yeo, Seung-Hyun Lim, Kyong-hee Joo, Jun-kyu Yang
  • Publication number: 20120158212
    Abstract: The present invention provides a intelligent data center based on a service platform for vehicle-mounted devices, including: a static data storage unit, adapted for storing static data relating to a vehicle-mounted device; a static data processing unit, adapted for processing the static data stored in the static data storage unit; a dynamic data storage unit, adapted for storing dynamic data which are relating to the vehicle-mounted device and acquired by the service platform for vehicle-mounted devices; and a data analysis unit, adapted for analyzing the static data and the dynamic data. The intelligent data center can provide a wide variety of services for the vehicle-mounted device through the service platform.
    Type: Application
    Filed: December 27, 2010
    Publication date: June 21, 2012
    Applicants: Shanghai Pateo Internet Technology Service Co., Ltd., Shanghai Pateo Electronic Equipment Manufacturing Co., Ltd.
    Inventors: Yilun Ying, Liang Huo, Yu Jiang, Jun Zhu, Shuxin Li, Yong Gao, Dawei Zhu, Yehui Zhang
  • Publication number: 20120149354
    Abstract: A vehicle information system includes: a vehicle-mounted device, a network processing device and a service center which is adapted for providing service for the vehicle-mounted device. A service configuration channel is configured between the network processing device and the service center and is adapted for transmitting configuration data which are adapted for configuring service that is provided for the vehicle-mounted device. The service configuration channel is established on basis of connection to internet. A service channel system is configured between the vehicle-mounted device and the service center. A complete solution for providing information service may be provided by the vehicle information system, thereby improving the quality of user experience while using a vehicle.
    Type: Application
    Filed: December 25, 2010
    Publication date: June 14, 2012
    Applicants: Shanghan PATEO Internet Technology Service Co., Ltd., Shanghai PATEO Electronic Equipment Manufacturing Co., Ltd.
    Inventors: Yilun Ying, Liang Huo, Yu Jiang, Xing Liu, Yu Yao, Zhihong Zhang, Dawei Zhu, Yehui Zhang, Yang Luan, Song Yang
  • Publication number: 20120061752
    Abstract: Single transistor floating-body DRAM devices have a vertical channel transistor structure. The DRAM devices include a substrate, and first and second floating bodies disposed on the substrate and isolated from each other. A source region and a drain region are disposed under and above each of the first and second floating bodies. A gate electrode is disposed between the first and second floating bodies. Methods of fabricating the single transistor floating-body DRAM devices are also provided.
    Type: Application
    Filed: November 21, 2011
    Publication date: March 15, 2012
    Inventors: Zong-Liang Huo, Seung-Jae Baik, In-Seok Yeo, Hong-Sik Yoon, Shi-Eun Kim
  • Patent number: 8084316
    Abstract: Single transistor floating-body DRAM devices have a vertical channel transistor structure. The DRAM devices include a substrate, and first and second floating bodies disposed on the substrate and isolated from each other. A source region and a drain region are disposed under and above each of the first and second floating bodies. A gate electrode is disposed between the first and second floating bodies. Methods of fabricating the single transistor floating-body DRAM devices are also provided.
    Type: Grant
    Filed: May 1, 2006
    Date of Patent: December 27, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Zong-Liang Huo, Seung-Jae Baik, In-Seok Yeo, Hong-Sik Yoon, Shi-Eun Kim
  • Publication number: 20110267903
    Abstract: A semiconductor memory device may have a DRAM cell mode and a non-volatile memory cell mode without a capacitor, including multiple transistors arranged in an array and having floating bodies, word lines connected to gate electrodes of the transistors, bit lines at a first side of the gate electrodes connected to drains of the transistors, source lines at a second side of the gate electrodes, different from the first side, and connected to sources of the transistors on the semiconductor substrate, and charge storage regions between the gate electrodes and the floating bodies.
    Type: Application
    Filed: July 14, 2011
    Publication date: November 3, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Zong-Liang HUO, In-Seok YEO
  • Patent number: 7994003
    Abstract: A method of fabricating a nonvolatile memory device includes forming a tunnel insulating layer on a semiconductor substrate, forming a charge storage layer on the tunnel insulating layer, forming a dielectric layer on the charge storage layer, the dielectric layer including a first aluminum oxide layer, a silicon oxide layer, and a second aluminum oxide layer sequentially stacked on the charge storage layer, and forming a gate electrode on the dielectric layer, the gate electrode directly contacting the second aluminum oxide layer of the dielectric layer.
    Type: Grant
    Filed: March 20, 2009
    Date of Patent: August 9, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Byong-Ju Kim, Sun-Jung Kim, Zong-Liang Huo, Jun-Kyu Yang, Seon-Ho Jo, Han-Mei Choi, Young-Sun Kim
  • Patent number: 7982256
    Abstract: A semiconductor memory device may have a DRAM cell mode and a non-volatile memory cell mode without a capacitor, including multiple transistors arranged in an array and having floating bodies, word lines connected to gate electrodes of the transistors, bit lines at a first side of the gate electrodes connected to drains of the transistors, source lines at a second side of the gate electrodes, different from the first side, and connected to sources of the transistors on the semiconductor substrate, and charge storage regions between the gate electrodes and the floating bodies.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: July 19, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Zong-Liang Huo, In-Seok Yeo
  • Patent number: 7795659
    Abstract: In a DRAM device and a method of manufacturing the same, a multiple tunnel junction (MTJ) structure is provided, which includes conductive patterns and nonconductive patterns alternately stacked on each other. The nonconductive patterns have a band gap larger than a band gap of the conductive patterns. A gate insulation layer and a gate electrode are formed on a sidewall of the MTJ structure. A word line is connected with the MTJ structure, and a bit line is connected with one of top and bottom surfaces of the MTJ structure. A capacitor is connected with one of top and bottom surfaces of the MTJ structure that is not connected with the bit line. Current leakage in the DRAM device is reduced and a unit cells may be vertically stacked on the substrate, so a smaller surface area of the substrate is required for the DRAM device.
    Type: Grant
    Filed: May 1, 2008
    Date of Patent: September 14, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hong-Sik Yoon, In-Seok Yeo, Seung-Jae Baik, Zong-Liang Huo, Shi-Eun Kim
  • Publication number: 20090239367
    Abstract: A method of fabricating a nonvolatile memory device includes forming a tunnel insulating layer on a semiconductor substrate, forming a charge storage layer on the tunnel insulating layer, forming a dielectric layer on the charge storage layer, the dielectric layer including a first aluminum oxide layer, a silicon oxide layer, and a second aluminum oxide layer sequentially stacked on the charge storage layer, and forming a gate electrode on the dielectric layer, the gate electrode directly contacting the second aluminum oxide layer of the dielectric layer.
    Type: Application
    Filed: March 20, 2009
    Publication date: September 24, 2009
    Inventors: Byong-Ju Kim, Sun-Jung Kim, Zong-Liang Huo, Jun-Kyu Yang, Seon-Ho Jo, Han-Mei Choi, Young-Sun Kim
  • Publication number: 20080246078
    Abstract: A charge trap flash memory device and method of making same are provided. The device includes: a tunnel insulating layer, a charge trap layer; a blocking insulating layer; and a gate electrode sequentially formed on a substrate. The charge trap layer includes: plural trap layers comprising a first material having a first band gap energy level; spaced apart nanodots, each nanodot being at least partially surrounded by at least one of the trap layers, wherein the nanodots comprise a second material having a second band gap energy level that is lower than the first band gap energy level; and an intermediate blocking layer comprising a third material having a third band gap energy level that is higher than the first band gap energy level, formed between at least two of the trap layers. This structure prevents loss of charges from the charge trap layer and improves charge storage capacity.
    Type: Application
    Filed: April 2, 2008
    Publication date: October 9, 2008
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Zong-liang Huo, In-seok Yeo, Seung-Hyun Lim, Kyong-hee Joo, Jun-kyu Yang
  • Patent number: D666631
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: September 4, 2012
    Inventors: Wenjin Ma, Yunjuan Zhu, Liang Huo, Kun Xu, Kuojing Li, Xing Liu
  • Patent number: D882429
    Type: Grant
    Filed: November 25, 2018
    Date of Patent: April 28, 2020
    Assignee: Shenzhen ATuMan Precision Machinery Technology Co., Ltd.
    Inventor: Liang Huo
  • Patent number: D977348
    Type: Grant
    Filed: November 5, 2021
    Date of Patent: February 7, 2023
    Assignee: HENAN ATUMAN PRECISION MACHINERY TECHNOLOGY CO., LTD.
    Inventor: Liang Huo