Patents by Inventor Liang-Xiang Chen

Liang-Xiang Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • DIELECTRIC LAYER
    Publication number: 20110001221
    Abstract: A dielectric layer is provided. The dielectric layer includes a photo-sensitive polymer or a non-photo-sensitive polymer and an amorphous metal oxide disposed in the photo-sensitive polymer or a non-photo-sensitive polymer.
    Type: Application
    Filed: September 16, 2010
    Publication date: January 6, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wei-Ling Lin, Pang LIN, Tarng-Shiang Hu, Liang-Xiang Chen
  • Fabricating dielectric layer
    Patent number: 7829137
    Abstract: A composition for forming a dielectric layer includes a liquid organometallic compound serving as a precursor with high dielectric constant, a photo-sensitive polymer or a non-photo-sensitive polymer and a solvent, wherein the liquid organometallic compound includes metal alkoxide, and the metal of the metal alkoxide includes Al Ti, Zr, Ta, Si, Ba, Ge and Hf. The dielectric layer formed by the composition includes the photo-sensitive polymer or the non-photo-sensitive polymer and an amorphous metal oxide formed therein.
    Type: Grant
    Filed: March 21, 2006
    Date of Patent: November 9, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Wei-Ling Lin, Pang Lin, Tarng-Shiang Hu, Liang-Xiang Chen
  • DIELECTRIC LAYER, COMPOSITION AND METHOD FOR FORMING THE SAME
    Publication number: 20070172583
    Abstract: A composition for forming a dielectric layer includes a liquid organometallic compound serving as a precursor with high dielectric constant, a photo-sensitive polymer or a non-photo-sensitive polymer and a solvent, wherein the liquid organometallic compound includes metal alkoxide, and the metal of the metal alkoxide includes Al Ti, Zr, Ta, Si, Ba, Ge and Hf. The dielectric layer formed by the composition includes the photo-sensitive polymer or the non-photo-sensitive polymer and an amorphous metal oxide formed therein.
    Type: Application
    Filed: March 21, 2006
    Publication date: July 26, 2007
    Inventors: Wei-Ling Lin, Pang Lin, Tarng-Shiang Hu, Liang-Xiang Chen