Abstract: A substrate drying system having an IPA concentration interlock detector for detecting the concentration of substrate-drying IPA vapor in a processing or cleaning tank of a Marongoni-type substrate drying system, for example, as substrates are dried in the cleaning tank after washing typically using deionized water. In the event that inadequate concentrations of the IPA vapor are delivered to the cleaning tank, the IPA concentration interlock detector transmits an alarm signal to the tool controller to alert facility personnel to the inadequate IPA concentrations in the cleaning tank and prevent the formation of water marks on the substrates.

Abstract: A novel interlocked automatic chemical mixing system and method of use which is particularly well-suited to preparing a final diluted HF (hydrofluoric acid) mixture of desired concentration for the post-cleaning rinsing of semiconductor wafer substrates. The automatic chemical mixing system includes a mixing tank having a normal level sensor and a mixing level sensor above the normal level sensor. A mixing system is provided for thoroughly mixing the liquid precursor components in the mixing tank. In typical application, DI water is introduced into the mixing tank until the DI water reaches the level of the mixing sensor. The precursor aqueous HF is then introduced into the mixing tank until the level of the HF reaches the normal level sensor.

Abstract: An apparatus for drying semiconductor wafers in a solvent drying chamber and a method for drying are disclosed. The apparatus is equipped with an alarm/interlocking system such that when a flow of the solvent vapor into the drying chamber is stopped, the alarm is triggered and the interlocking system is activated to stop the further loading of wafers into the drying chamber and thus preventing the outputting of undried wafers from the chamber. The apparatus is used to prevent any malfunction in the flow control valves or in any other flow control system that stops the flow of solvent vapor into the drying chamber.