Patents by Inventor Liang-Yong Tan

Liang-Yong Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140196251
    Abstract: A semiconductor fabricating apparatus includes a reaction chamber, a first gas pipeline, and a second gas pipeline. The first gas pipeline includes a first cleaning gas pipeline for providing a first cleansing gas to the reaction chamber in a cleansing process, and a second cleansing gas pipeline for providing a second cleansing gas to the reaction chamber in the cleansing process. The first cleansing gas pipeline and the second cleansing gas pipeline are connected in parallel. The second gas pipeline provides a reactive gas to the reaction chamber in a fabricating process. The first gas pipeline and the second gas pipeline are connected in parallel.
    Type: Application
    Filed: January 13, 2013
    Publication date: July 17, 2014
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: YINGJIE XU, Chaw Che, Yu-Yang Chen, Liang-Yong Tan, HAI YUAN, XIANYU MENG