Patents by Inventor Liang-Yu Chen

Liang-Yu Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8712136
    Abstract: An image reconstruction method is described as follows. A structural image of an object is obtained. An actual optical detected result of the object is obtained. An inhomogeneous initial state is determined based on the structural image. At least one solution converged with the actual optical detected result is determined by iteratively calculating a physical model from the inhomogeneous initial state. The image of the object is reconstructed based on the solution.
    Type: Grant
    Filed: February 16, 2012
    Date of Patent: April 29, 2014
    Assignee: National Central University
    Inventors: Min-Chun Pan, Hung-Chih Chiang, Liang-Yu Chen, Min-Chen Pan
  • Publication number: 20130089250
    Abstract: An image reconstruction method is described as follows. A structural image of an object is obtained. An actual optical detected result of the object is obtained. An inhomogeneous initial state is determined based on the structural image. At least one solution converged with the actual optical detected result is determined by iteratively calculating a physical model from the inhomogeneous initial state. The image of the object is reconstructed based on the solution.
    Type: Application
    Filed: February 16, 2012
    Publication date: April 11, 2013
    Applicant: NATIONAL CENTRAL UNIVERSITY
    Inventors: Min-Chun PAN, Hung-Chih CHIANG, Liang-Yu CHEN, Min-Chen PAN
  • Patent number: 8395120
    Abstract: A bidirectional optical scanner assisting in mammography is revealed. The optical scanner that calculates functional images obtained by diffuse optical tomography, used in combination with a mammography machine can reduce the number of mammograms taken and the dose exposure. The bidirectional optical scanner includes a first compression plate, a first optical detection module, a second optical detection module and a second compression plate. The same test position of the tested breast can be detected twice in different directions by the first and the second optical detection modules. No matter where the tumor is located, the tumor can be detected. Besides structural images provided by the mammography machine, functional tomographic images of the breast are obtained by the bidirectional optical scanner. Thus diagnostic accuracy in the detection of breast cancer is improved.
    Type: Grant
    Filed: January 17, 2012
    Date of Patent: March 12, 2013
    Assignee: National Central University
    Inventors: Min-Chun Pan, Jhao-Ming Yu, Hung-Chih Chiang, Min-Cheng Pan, Chun-Yu Chen, Liang-Yu Chen
  • Patent number: 8378302
    Abstract: A bidirectional optical scanner assisting in mammography is revealed. The optical scanner that calculates functional images obtained by diffuse optical tomography, used in combination with a mammography machine can reduce the number of mammograms taken and the dose exposure. The bidirectional optical scanner includes a compression module, a first optical detection module, and a second optical detection module. The same test position of the tested breast can be detected twice in different directions by the first and the second optical detection modules. No matter where the tumor is located, the tumor can be detected. Besides structural images provided by the mammography machine, functional tomographic images of the breast are obtained by the bidirectional optical scanner. Thus diagnostic accuracy in the detection of breast cancer is improved.
    Type: Grant
    Filed: February 25, 2011
    Date of Patent: February 19, 2013
    Assignee: National Central University
    Inventors: Min-Chun Pan, Hung-Chin Chiang, Chun-Yu Chen, Liang-Yu Chen, Ching-Tang Wu, Min-Cheng Pan
  • Publication number: 20120220862
    Abstract: A bidirectional optical scanner assisting in mammography is revealed. The optical scanner that calculates functional images obtained by diffuse optical tomography, used in combination with a mammography machine can reduce the number of mammograms taken and the dose exposure. The bidirectional optical scanner includes a first compression plate, a first optical detection module, a second optical detection module and a second compression plate. The same test position of the tested breast can be detected twice in different directions by the first and the second optical detection modules. No matter where the tumor is located, the tumor can be detected. Besides structural images provided by the mammography machine, functional tomographic images of the breast are obtained by the bidirectional optical scanner. Thus diagnostic accuracy in the detection of breast cancer is improved.
    Type: Application
    Filed: January 17, 2012
    Publication date: August 30, 2012
    Applicant: NATIONAL CENTRAL UNIVERSITY
    Inventors: MIN-CHUN PAN, JHAO-MING YU, HUNG-CHIH CHIANG, MIN-CHENG PAN, CHUN-YU CHEN, LIANG-YU CHEN
  • Publication number: 20120085908
    Abstract: A bidirectional optical scanner assisting in mammography is revealed. The optical scanner that calculates functional images obtained by diffuse optical tomography, used in combination with a mammography machine can reduce the number of mammograms taken and the dose exposure. The bidirectional optical scanner includes a compression module, a first optical detection module, and a second optical detection module. The same test position of the tested breast can be detected twice in different directions by the first and the second optical detection modules. No matter where the tumor is located, the tumor can be detected. Besides structural images provided by the mammography machine, functional tomographic images of the breast are obtained by the bidirectional optical scanner. Thus diagnostic accuracy in the detection of breast cancer is improved.
    Type: Application
    Filed: February 25, 2011
    Publication date: April 12, 2012
    Inventors: Min-Chun PAN, Hung-Chin Chiang, Chun-Yu Chen, Liang-Yu Chen, Ching-Tang Wu, Min-Cheng Pan
  • Patent number: 6372633
    Abstract: The present invention provides a method and apparatus for forming reliable interconnects in which the overlap of the line over the plug or via is minimized or eliminated. In one aspect, a barrier plug comprised of a conductive material, such as tungsten, is deposited over the via to provide an etch stop during line etching and to prevent diffusion of the metal, such as copper, into the surrounding dielectric material if the line is misaligned over the via. Additionally, the barrier plug prevents an overall reduction in resistance of the interconnect and enables reactive ion etching to be employed to form the metal line. In another aspect, reactive ion etching techniques are employed to selectively etch the metal line and the barrier layer to provide a controlled etching process which exhibits selectivity for the metal line, then the barrier and then the via or plug.
    Type: Grant
    Filed: July 8, 1998
    Date of Patent: April 16, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Dan Maydan, Ashok K. Sinha, Zheng Xu, Liang-Yu Chen, Roderick Craig Mosely, Daniel Carl, Diana Xiaobing Ma, Yan Ye, Wen Chiang Tu
  • Patent number: 6017144
    Abstract: The present invention is to a chemical vapor deposition process for depositing a substantially planar, highly reflective layer on a substrate, and is particularly useful for filling high aspect ratio holes in the substrate with metal-containing material. The substrate is placed in a process zone, and successive seeding and oriented crystal growth stages are performed on the substrate. In the seeding stage, the substrate is heated to temperatures T.sub.s, within a first lower range of temperatures .DELTA. T.sub.s, and a seeding gas is introduced into the process zone. The seeding gas deposits a substantially continuous, non-granular, and planar seeding layer on the substrate. Thereafter, in an oriented crystal growth stage, the substrate is maintained at deposition temperatures T.sub.d, within a second higher range of temperatures .DELTA. T.sub.D, and deposition gas is introduced into the process zone.
    Type: Grant
    Filed: October 24, 1996
    Date of Patent: January 25, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Ted Tie Guo, Mehul Bhagubhai Naik, Liang-Yu Chen, Roderick Craig Mosely, Israel Beinglass
  • Patent number: 5399415
    Abstract: A process for fabricating mechanically interconnected, released, electrically isolated metal microstructures, and circuit components and actuators produced by the process. A dielectric stack on a substrate is patterned and etched to produce trenches in which a metal such as tungsten is deposited. The dielectric is removed from selected regions of the metal to expose metal beams, and to form mechanically interconnecting, electrically insulating hinges supporting the beams. The beams and hinges are then released for relative motion. Electrical potentials may be established between adjacent beams to produce controlled motion.
    Type: Grant
    Filed: June 4, 1993
    Date of Patent: March 21, 1995
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Liang-Yu Chen, Noel C. MacDonald