Abstract: The embodiment of the present application proposes a TFT-LCD float glass substrate processing line, which is sequentially divided into a precision cutting and edge grinding working area, a surface grinding working area, and an inspection and packaging working area. In the precision cutting and edge grinding working area, a cold-end cutting device, a precision cutting and breaking device, a multi-axis edge grinding device, an after-edge-grinding cleaning device, a first edge inspection machine device, a first size measurement device, a grinding range measurement device, a flipping conveyor belt, and a loading frame are sequentially installed.

Abstract: The present invention relates to a high-generation TFT-LCD glass substrate production line. The production line includes a kiln, a large-flow precious metal channel, a tin bath, an annealing kiln, a cutting machine and an unloading machine connected in sequence. The present invention combines high-efficiency melting, clarification and homogenization of molten glass, ultrathin float forming and annealing process technologies of the TFT-LCD glass, which can produce the TFT-LCD glass substrates with large sizes such as 8.5 generations and 10.5/11 generations, which has the advantages of large product size, excellent product performance, coherent process procedures, high production efficiency, high productivity and the like.

Abstract: A large-flow precious metal channel is provided, which comprises a molten glass mixed-flow stirring section, at least two molten glass heating, clarifying and cooling sections are connected in parallel at one end of the molten glass mixed-flow stirring section, the other end of which is communicated with a liquid supply tank. The channel is mainly used for the clarification and homogenization of large-flow high-temperature molten glass in the production process of 8.5-generation and higher-generation TFT glass, and provides bubble-free and streak-free high-quality molten glass for subsequent float forming or overflow forming processes.

Abstract: Provided is alkali-free aluminoborosilicate glass. The glass is prepared by the following raw materials in percentage by weight: 60-72% SiO2, 13-18% of Al2O3, 8.5-10% of B2O3, 1-4.5% of MgO, 3-8% of CaO, 1-5% of SrO, 0.5-2% of ZrO2, 1-5% of P2O5, and 0.1-0.5% of SnO2, wherein SiO2+Al2O3 is 76-85%; (MgO+CaO+SrO)/Al2O3 is 0.4-0.7; the total amount of alkaline earth metal oxide is 5-11.5%; B2O3/(B2O3+ZrO2+P2O5) is 0.6-0.9; and (ZrO2+P2O5)/(MgO+CaO+SrO) is 0.15-0.8. The glass has the characteristics such as higher strain point, high Young modulus, high hardness, high specific modulus, proper thermal expansion coefficient, and low thermal shrinkage; the boron volatilization rate is as low as 5.6-10.