Patents by Inventor Libor Vyklicky

Libor Vyklicky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11390593
    Abstract: The presented invention relates to a process for preparation of compound of formula (1) or a salt thereof (i.e.) ozanimod: (1). The invention also relates to intermediates used in the process.
    Type: Grant
    Filed: December 5, 2019
    Date of Patent: July 19, 2022
    Assignee: Synthon B.V.
    Inventors: Marian Buchlovic, Lenka Chalupova, Libor Vyklicky, Jiri Bartl
  • Patent number: 9981965
    Abstract: The present invention relates to an improved process for preparing Idelalisib (1). In this process, acid addition salts of idelalisamine (2) are useful intermediates for purification purposes.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: May 29, 2018
    Assignee: Synthon B.V.
    Inventors: Libor Vyklicky, Miroslav Zabadal
  • Patent number: 9726977
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
    Type: Grant
    Filed: February 8, 2010
    Date of Patent: August 8, 2017
    Assignee: GlobalFoundries Inc.
    Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Greogory P. Prokopowicz, David A. Valeri, Libor Vyklicky, Wu-Song S. Huang, Wenjie Li, Pushkara R. Varanasi, Irene Y. Popova
  • Patent number: 9465290
    Abstract: A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
    Type: Grant
    Filed: April 2, 2014
    Date of Patent: October 11, 2016
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Wu-Song Huang, Martin Glodde, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Libor Vyklicky
  • Patent number: 9012133
    Abstract: An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: April 21, 2015
    Assignee: International Business Machines Corporation
    Inventors: Javier J. Perez, Dario L. Goldfarb, Ranee W. Kwong, Libor Vyklicky
  • Publication number: 20140210034
    Abstract: A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
    Type: Application
    Filed: April 2, 2014
    Publication date: July 31, 2014
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Wu-Song Huang, Martin Glodde, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Libor Vyklicky
  • Patent number: 8772376
    Abstract: A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
    Type: Grant
    Filed: August 18, 2009
    Date of Patent: July 8, 2014
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Martin Glodde, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Libor Vyklicky
  • Patent number: 8652762
    Abstract: An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: February 18, 2014
    Assignee: International Business Machines Corporation
    Inventors: Dario L. Goldfarb, Libor Vyklicky, Sean D. Burns, David R. Medeiros, Daniel P. Sanders, Robert D. Allen
  • Patent number: 8586283
    Abstract: A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
    Type: Grant
    Filed: September 10, 2012
    Date of Patent: November 19, 2013
    Assignee: International Business Machines Corporation
    Inventors: Martin Glodde, Dario L. Goldfarb, Wu-Song Huang, Wai-Kin Li, Sen Liu, Pushkara R. Varanasi, Libor Vyklicky
  • Patent number: 8557501
    Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
    Type: Grant
    Filed: March 21, 2012
    Date of Patent: October 15, 2013
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi
  • Patent number: 8546062
    Abstract: A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
    Type: Grant
    Filed: November 22, 2011
    Date of Patent: October 1, 2013
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Irene Popova, Pushkara Rao Varanasi, Libor Vyklicky
  • Publication number: 20130052593
    Abstract: An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.
    Type: Application
    Filed: August 30, 2011
    Publication date: February 28, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Javier J. Perez, Dario L. Goldfarb, Ranee W. Kwong, Libor Vyklicky
  • Publication number: 20130001484
    Abstract: A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
    Type: Application
    Filed: September 10, 2012
    Publication date: January 3, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Martin Glodde, Dario L. Goldfarb, Wu-Song Huang, Wai-Kin Li, Sen Liu, Pushkara R. Varanasi, Libor Vyklicky
  • Patent number: 8293451
    Abstract: A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
    Type: Grant
    Filed: August 18, 2009
    Date of Patent: October 23, 2012
    Assignee: International Business Machines Corporation
    Inventors: Martin Glodde, Dario L. Goldfarb, Wu-Song Huang, Wai-Kin Li, Sen Liu, Pushkara R. Varanasi, Libor Vyklicky
  • Publication number: 20120178029
    Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
    Type: Application
    Filed: March 21, 2012
    Publication date: July 12, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Wu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi
  • Patent number: 8182978
    Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
    Type: Grant
    Filed: February 2, 2009
    Date of Patent: May 22, 2012
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi
  • Publication number: 20120070782
    Abstract: A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
    Type: Application
    Filed: November 22, 2011
    Publication date: March 22, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Wu-Song Huang, Irene Popova, Pushkara Rao Varanasi, Libor Vyklicky
  • Patent number: 8137874
    Abstract: An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
    Type: Grant
    Filed: January 23, 2008
    Date of Patent: March 20, 2012
    Assignee: International Business Machines Corporation
    Inventors: Dario L. Goldfarb, Libor Vyklicky, Sean D. Burns, David R. Medeiros, Daniel P. Sanders, Robert D. Allen
  • Patent number: 8097401
    Abstract: A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
    Type: Grant
    Filed: March 24, 2009
    Date of Patent: January 17, 2012
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Irene Popova, Pushkara Rao Varanasi, Libor Vyklicky
  • Publication number: 20110300483
    Abstract: A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer. Pattern-wise exposing the coated substrate to imaging radiation and contacting the coated substrate with a developer, produces the patterned material layer. Any optional top coat material and a portion of the photoresist layer can be simultaneously removed from the coated substrate to form a patterned photoresist layer on the substrate.
    Type: Application
    Filed: July 25, 2011
    Publication date: December 8, 2011
    Applicant: International Business Machines Corporation
    Inventors: Joy Cheng, Dario L. Goldfarb, David R. Medeiros, Daniel P. Sanders, Dirk Pfeiffer, Libor Vyklicky