Patents by Inventor Libor Vyklicky
Libor Vyklicky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240092785Abstract: The presented invention relates to a process for preparation of Ibrutinib, comprising: a. Reacting compound of Formula (2) with compound of Formula (3) in a presence of Lewis acid to provide compound of Formula (4); b. Contacting compound of Formula (4) with toluene; c. Isolate a solid form of compound of Formula (4); d. Transforming compound of Formula (4) into Ibrutinib.Type: ApplicationFiled: January 20, 2022Publication date: March 21, 2024Inventors: Petr MITAS, Libor VYKLICKY, Jiri BARTL, Oldrich SMEKAL
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Patent number: 11390593Abstract: The presented invention relates to a process for preparation of compound of formula (1) or a salt thereof (i.e.) ozanimod: (1). The invention also relates to intermediates used in the process.Type: GrantFiled: December 5, 2019Date of Patent: July 19, 2022Assignee: Synthon B.V.Inventors: Marian Buchlovic, Lenka Chalupova, Libor Vyklicky, Jiri Bartl
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Publication number: 20210363117Abstract: The presented invention relates to a process for preparation of compound of formula (1) or a salt thereof (i.e.) ozanimod: (1). The invention also relates to intermediates used in the process.Type: ApplicationFiled: December 5, 2019Publication date: November 25, 2021Inventors: Marian BUCHLOVIC, Lenka CHALUPOVA, Libor VYKLICKY, Jiri BARTL
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Publication number: 20190144452Abstract: The present invention relates to an improved process of preparation of idelalisib using a solid form of intermediate of formula (2); characterized by XRPD pattern having 2? values 5.5°, 10.9°, 14.3°, 16.9° (±0.2) the process comprising steps a. Reacting of compound of formula (1); ?with a chlorinating agent to obtain a product; b. Reacting of the product with (S)-2-((tert-butoxycarbonyl)amino)butanoic acid and a base, wherein pH of the reaction mixture is set between 7.5 and 10 to obtain compound of formula (2); c. Isolating a solid form of compound of formula (2); d. Transforming the compound of formula (2) into idelalisib.Type: ApplicationFiled: November 13, 2018Publication date: May 16, 2019Inventors: Libor VYKLICKY, Zuzana BEDNAROVA, Radomir SKOUMAL
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Patent number: 9981965Abstract: The present invention relates to an improved process for preparing Idelalisib (1). In this process, acid addition salts of idelalisamine (2) are useful intermediates for purification purposes.Type: GrantFiled: March 24, 2016Date of Patent: May 29, 2018Assignee: Synthon B.V.Inventors: Libor Vyklicky, Miroslav Zabadal
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Publication number: 20180093987Abstract: The present invention relates to an improved process for preparing Idelalisib (1). In this process, acid addition salts of idelalisamine (2) are useful intermediates for purification purposes.Type: ApplicationFiled: March 24, 2016Publication date: April 5, 2018Inventors: Libor VYKLICKY, Miroslav ZABADAL
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Patent number: 9726977Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.Type: GrantFiled: February 8, 2010Date of Patent: August 8, 2017Assignee: GlobalFoundries Inc.Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Greogory P. Prokopowicz, David A. Valeri, Libor Vyklicky, Wu-Song S. Huang, Wenjie Li, Pushkara R. Varanasi, Irene Y. Popova
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Patent number: 9465290Abstract: A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.Type: GrantFiled: April 2, 2014Date of Patent: October 11, 2016Assignee: GLOBALFOUNDRIES INC.Inventors: Wu-Song Huang, Martin Glodde, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Libor Vyklicky
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Patent number: 9012133Abstract: An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.Type: GrantFiled: August 30, 2011Date of Patent: April 21, 2015Assignee: International Business Machines CorporationInventors: Javier J. Perez, Dario L. Goldfarb, Ranee W. Kwong, Libor Vyklicky
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Publication number: 20140210034Abstract: A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.Type: ApplicationFiled: April 2, 2014Publication date: July 31, 2014Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Wu-Song Huang, Martin Glodde, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Libor Vyklicky
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Patent number: 8772376Abstract: A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.Type: GrantFiled: August 18, 2009Date of Patent: July 8, 2014Assignee: International Business Machines CorporationInventors: Wu-Song Huang, Martin Glodde, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Libor Vyklicky
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Patent number: 8652762Abstract: An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.Type: GrantFiled: March 19, 2012Date of Patent: February 18, 2014Assignee: International Business Machines CorporationInventors: Dario L. Goldfarb, Libor Vyklicky, Sean D. Burns, David R. Medeiros, Daniel P. Sanders, Robert D. Allen
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Patent number: 8586283Abstract: A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.Type: GrantFiled: September 10, 2012Date of Patent: November 19, 2013Assignee: International Business Machines CorporationInventors: Martin Glodde, Dario L. Goldfarb, Wu-Song Huang, Wai-Kin Li, Sen Liu, Pushkara R. Varanasi, Libor Vyklicky
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Patent number: 8557501Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.Type: GrantFiled: March 21, 2012Date of Patent: October 15, 2013Assignee: International Business Machines CorporationInventors: Wu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi
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Patent number: 8546062Abstract: A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.Type: GrantFiled: November 22, 2011Date of Patent: October 1, 2013Assignee: International Business Machines CorporationInventors: Wu-Song Huang, Irene Popova, Pushkara Rao Varanasi, Libor Vyklicky
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Publication number: 20130052593Abstract: An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.Type: ApplicationFiled: August 30, 2011Publication date: February 28, 2013Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Javier J. Perez, Dario L. Goldfarb, Ranee W. Kwong, Libor Vyklicky
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Publication number: 20130001484Abstract: A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.Type: ApplicationFiled: September 10, 2012Publication date: January 3, 2013Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Martin Glodde, Dario L. Goldfarb, Wu-Song Huang, Wai-Kin Li, Sen Liu, Pushkara R. Varanasi, Libor Vyklicky
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Patent number: 8293451Abstract: A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.Type: GrantFiled: August 18, 2009Date of Patent: October 23, 2012Assignee: International Business Machines CorporationInventors: Martin Glodde, Dario L. Goldfarb, Wu-Song Huang, Wai-Kin Li, Sen Liu, Pushkara R. Varanasi, Libor Vyklicky
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Publication number: 20120178029Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.Type: ApplicationFiled: March 21, 2012Publication date: July 12, 2012Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Wu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi
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Patent number: 8182978Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.Type: GrantFiled: February 2, 2009Date of Patent: May 22, 2012Assignee: International Business Machines CorporationInventors: Wu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi