Patents by Inventor Libor Vylicky

Libor Vylicky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Self-segregating multilayer imaging stack with built-in antireflective properties
    Patent number: 8084193
    Abstract: A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material. The polymeric photoresistive material and the antireflective coating material that make up the self segregating composition are contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. The substrate can comprise one of a ceramic, dielectric, metal, or semiconductor material and in some instances a material such as a BARC material that is not from the self segregating composition. The composition may also contain a radiation-sensitive acid generator and a base quencher. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer.
    Type: Grant
    Filed: July 12, 2008
    Date of Patent: December 27, 2011
    Assignee: International Business Machines Corporation
    Inventors: Joy Cheng, Dario L Goldfarb, David R Medeiros, Daniel P Sanders, Dirk Pfeifer, Libor Vylicky
  • SELF-SEGREGATING MULTILAYER IMAGING STACK WITH BUILT-IN ANTIREFLECTIVE PROPERTIES
    Publication number: 20100009132
    Abstract: A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material. The polymeric photoresistive material and the antireflective coating material that make up the self segregating composition are contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. The substrate can comprise one of a ceramic, dielectric, metal, or semiconductor material and in some instances a material such as a BARC material that is not from the self segregating composition. The composition may also contain a radiation-sensitive acid generator and a base quencher. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer.
    Type: Application
    Filed: July 12, 2008
    Publication date: January 14, 2010
    Applicant: International Business Machines Corporation
    Inventors: Joy Cheng, Dario L. Goldfarb, David R. Medeiros, Daniel P. Sanders, Dirk Pfeifer, Libor Vylicky