Patents by Inventor Liem Nguyen
Liem Nguyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11175221Abstract: Disclosed is an ellipsometer or scatterometer including a light source, a polarizer, an optical illumination system suitable for directing an incident polarized light beam towards a sample, a wavefront-division optical beam splitter arranged to receive a secondary light beam produced by reflection, transmission or diffraction, the wavefront-division optical beam splitter being oriented to form three collimated split beams, an optical polarization modification device and an optical polarization splitting device to form six angularly split beams, a detection system suitable for detecting the six split beams, and a processing system suitable for deducing therefrom an ellipsometric or scatterometric measurement.Type: GrantFiled: March 14, 2019Date of Patent: November 16, 2021Assignee: HORIBA FRANCE SASInventors: Olivier Acher, Alexander Podzorov, Thanh-Liem Nguyen, Brice Villier, GĂ©raldine Melizzi, Jean-Paul Gaston
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Publication number: 20210010928Abstract: Disclosed is an ellipsometer or scatterometer including a light source, a polarizer, an optical illumination system suitable for directing an incident polarized light beam towards a sample, a wavefront-division optical beam splitter arranged to receive a secondary light beam produced by reflection, transmission or diffraction, the wavefront-division optical beam splitter being oriented to form three collimated split beams, an optical polarization modification device and an optical polarization splitting device to form six angularly split beams, a detection system suitable for detecting the six split beams, and a processing system suitable for deducing therefrom an ellipsometric or scatterometric measurement.Type: ApplicationFiled: March 14, 2019Publication date: January 14, 2021Inventors: Olivier ACHER, Alexander PODZOROV, Thanh-Liem NGUYEN, Brice VILLIER, GĂ©raldine MELIZZI, Jean-Paul GASTON
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Publication number: 20190202099Abstract: A part for a mold is disclosed. The part includes a body formed of a shape-memory alloy. The body includes a first shape or first configuration at a first temperature and a second shape or second configuration at a second temperature. In one embodiment, the first shape includes at least one protrusion and the second shape is straight. A part of the present disclosure eliminates damage to a molded piece during removal of a molded piece from an injection mold by changing its shape in such a way that is suitable for part ejection.Type: ApplicationFiled: January 2, 2019Publication date: July 4, 2019Inventors: Christina Rabolli, Liem Nguyen
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Patent number: 10139733Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: GrantFiled: March 3, 2016Date of Patent: November 27, 2018Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
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Patent number: 9551618Abstract: An accurate and robust wavefront-division polarimetric analysis method and device, allows the quasi-instantaneous measurement of the polarization states of a luminous object. The device can be used to produce a plurality of light beams, all polarized according to different polarization states, from a single upstream light beam. The polarized light beams, which do not overlap and which carry information items that are complementary in terms of polarization, are analyzed simultaneously by a plurality of detectors that measure the luminous intensity of each beam. Processing elements digitally process the luminous intensity values obtained in order to determine the polarization state of the upstream light beam. The operations performed by the processing elements prevent luminous intensity variations in the split light beams during the division of the wavefront of the upstream light beam.Type: GrantFiled: July 25, 2013Date of Patent: January 24, 2017Assignee: HORIBA JOBIN YVON SASInventors: Olivier Acher, Simon Richard, Thanh-Liem Nguyen
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Publication number: 20160282724Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: ApplicationFiled: March 3, 2016Publication date: September 29, 2016Inventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
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Patent number: 9341955Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.Type: GrantFiled: February 13, 2014Date of Patent: May 17, 2016Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Uy-Liem Nguyen
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Publication number: 20150204724Abstract: An accurate and robust wavefront-division polarimetric analysis method and device, allows the quasi-instantaneous measurement of the polarization states of a luminous object. The device can be used to produce a plurality of light beams, all polarized according to different polarization states, from a single upstream light beam. The polarized light beams, which do not overlap and which carry information items that are complementary in terms of polarization, are analyzed simultaneously by a plurality of detectors that measure the luminous intensity of each beam. Processing elements digitally process the luminous intensity values obtained in order to determine the polarization state of the upstream light beam. The operations performed by the processing elements prevent luminous intensity variations in the split light beams during the division of the wavefront of the upstream light beam.Type: ApplicationFiled: July 25, 2013Publication date: July 23, 2015Inventors: Olivier Acher, Simon Richard, Thanh-Liem Nguyen
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Publication number: 20140160456Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.Type: ApplicationFiled: February 13, 2014Publication date: June 12, 2014Applicant: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Uy-Liem Nguyen
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Patent number: 8687169Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.Type: GrantFiled: September 30, 2010Date of Patent: April 1, 2014Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Uy-Liem Nguyen
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Patent number: 8570676Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: GrantFiled: March 11, 2011Date of Patent: October 29, 2013Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
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Publication number: 20120075611Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: ApplicationFiled: November 30, 2011Publication date: March 29, 2012Applicant: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bun Patrick Kwan, Michael Muehlbeyer
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Patent number: 8089707Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: GrantFiled: February 4, 2010Date of Patent: January 3, 2012Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
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Patent number: 8009343Abstract: An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.Type: GrantFiled: July 2, 2004Date of Patent: August 30, 2011Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Gellrich, Thomas Bischoff, Hermann Bieg, Martin Huber, Francois Henzelin, Gerhard Szekely, Uy-Liem Nguyen, Martin E. Humphries
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Publication number: 20110181857Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: ApplicationFiled: March 11, 2011Publication date: July 28, 2011Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
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Patent number: 7966233Abstract: An arrangement collects data from disparate system back-end sources, such as a contracts system, a billing system, a service provisioning system, and analyzes the data to determine whether any inconsistencies exist. If so, the system issues a modification request to compensate for the inconsistency.Type: GrantFiled: December 30, 2005Date of Patent: June 21, 2011Assignee: AT&T Intellectual Property II, L.P.Inventors: Pradeep Khowash, Deven Chandrakant Meghani, Yang Li, Pravinchandra Chokshi, Prakash Talur, Prakash Vasa, Liem Nguyen, Patricia Seglio Donohue, John McCanuel, Hossein Eslambolchi, Anand Kumar Singh, Paritosh Bajpay, Roger Aboujaoude
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Patent number: 7929227Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: GrantFiled: July 2, 2010Date of Patent: April 19, 2011Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
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Publication number: 20110063595Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.Type: ApplicationFiled: September 30, 2010Publication date: March 17, 2011Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Uy-Liem Nguyen
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Publication number: 20100271607Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: ApplicationFiled: July 2, 2010Publication date: October 28, 2010Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
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Patent number: 7791826Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: GrantFiled: January 26, 2006Date of Patent: September 7, 2010Assignee: Carl Zeiss SMT AGInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen