Patents by Inventor Lien-Sheng Chen

Lien-Sheng Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for step-and-align interference lithography
    Patent number: 7969580
    Abstract: A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the interference light beam is being carried to move by a carrier is measured before interference lithography, and then the displacement error is used as a reference to compensate a positioning error between adjacent interference patterns during step-and-align interference lithography.
    Type: Grant
    Filed: November 7, 2008
    Date of Patent: June 28, 2011
    Assignee: Industrial Technology Research Institute
    Inventors: Jia-Yush Yen, Shuo-Hung Chang, Cheng-Hung Chen, Lien-Sheng Chen
  • METHOD AND SYSTEM FOR STEP-AND-ALIGN INTERFERENCE LITHOGRAPHY
    Publication number: 20090323078
    Abstract: A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the interference light beam is being carried to move by a carrier is measured before interference lithography, and then the displacement error is used as a reference to compensate a positioning error between adjacent interference patterns during step-and-align interference lithography.
    Type: Application
    Filed: November 7, 2008
    Publication date: December 31, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jia-Yush YEN, Shuo-Hung CHANG, Cheng-Hung CHEN, Lien-Sheng CHEN