Patents by Inventor Liesl M. McMurray, legal representative

Liesl M. McMurray, legal representative has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Particle emission analysis for semiconductor fabrication steps
    Patent number: 8158449
    Abstract: A structure and a method for operating the same. The method includes providing a detecting structure which includes N detectors. N is a positive integer. A fabrication step is simultaneously performed on the detecting structure and M product structures in a fabrication tool resulting in a particle-emitting layer on the detecting structure. The detecting structure is different than the M product structures. The M product structures are identical. M is a positive integer. An impact of emitting particles from the particle-emitting layer on the detecting structure is analyzed after said performing is performed.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: April 17, 2012
    Assignee: International Business Machines Corporation
    Inventors: Cyril Cabral, Jr., Michael S. Gordon, Jeff McMurray, Liesl M. McMurray, legal representative, Cristina Plettner, Paul Andrew Ronsheim