Patents by Inventor Liesl McMurray

Liesl McMurray has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PARTICLE EMISSION ANALYSIS FOR SEMICONDUCTOR FABRICATION STEPS
    Publication number: 20100084656
    Abstract: A structure and a method for operating the same. The method includes providing a detecting structure which includes N detectors. N is a positive integer. A fabrication step is simultaneously performed on the detecting structure and M product structures in a fabrication tool resulting in a particle-emitting layer on the detecting structure. The detecting structure is different than the M product structures. The M product structures are identical. M is a positive integer. An impact of emitting particles from the particle-emitting layer on the detecting structure is analyzed after said performing is performed.
    Type: Application
    Filed: October 8, 2008
    Publication date: April 8, 2010
    Inventors: Cyril Cabral, JR., Michael S. Gordon, Jeff McMurray, Liesl McMurray, Cristina Plettner, Paul Andrew Ronsheim