Patents by Inventor Lieve Govaerts

Lieve Govaerts has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8379964
    Abstract: The present invention is directed to a method for detecting anomalies in a semiconductor substrate comprising the steps of providing a semiconductor substrate, making an inspection image I of the substrate, generating an image K from image I by image processing, generating image B by binarizing image K, and examining image I using image B, characterized in that generating image K comprises multiplying a high-pass convolution filtered image G(I) from image I and a first weight image W1. The present invention is also directed to an apparatus suitable for applying the method.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: February 19, 2013
    Assignee: KLA-Tencor Corporation
    Inventors: Dominque Janssens, Luc Vanderheydt, Johan DeGreeve, Lieve Govaerts
  • Publication number: 20130035881
    Abstract: A system for characterizing interruption defect induced efficiency loss in a photovoltaic cell includes an inspection system configured to acquire inspection data from a photovoltaic cell, a control system configured to: receive the inspection data acquired from the photovoltaic cell, identify one or more interruption defects in one or more fingers of an electrode of the one photovoltaic cell utilizing the inspection data, determine a spatial parameter associated with at least one of the identified interruption defects and one or more floating finger portions of the one or more fingers created by two or more identified interruption defects, determine an interruption-defect-induced efficiency loss of the photovoltaic cell based on the determined spatial parameter associated with the at least one of the identified interruption defects and the floating finger portions of the one or more fingers created by two or more identified interruption defects.
    Type: Application
    Filed: August 2, 2012
    Publication date: February 7, 2013
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Choon (George) Hoong Hoo, Patrick Tung-Sing Pak, Choon Wai Chang, Kristiaan Van Rossen, Johan DeGreeve, Lieve Govaerts, Jia-Jie Patrick Yin
  • Publication number: 20110123091
    Abstract: The present invention is directed to a method for detecting anomalies in a semiconductor substrate comprising the steps of providing a semiconductor substrate, making an inspection image I of the substrate, generating an image K from image I by image processing, generating image B by binarizing image K, and examining image I using image B, characterized in that generating image K comprises multiplying a high-pass convolution filtered image G(I) from image I and a first weight image W1. The present invention is also directed to an apparatus suitable for applying the method.
    Type: Application
    Filed: August 29, 2008
    Publication date: May 26, 2011
    Applicant: ICOS VISION SYSTEMS NV
    Inventors: Dominque Janssens, Luc Vanderheydt, Johan DeGreeve, Lieve Govaerts