Patents by Inventor Lieve Van Look

Lieve Van Look has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Quality assessment of directed self-assembling method
    Patent number: 10048212
    Abstract: A method for evaluating the quality of a directed self-assembling method used for generating directed self-assembling patterns. The method for evaluating comprises obtaining at least one set of parameter values for a parameterized set of processing steps and material properties characterizing the directed self-assembling method, thus characterizing a specific directed self-assembling method used for generating a directed self-assembled pattern. The method furthermore comprises obtaining a scattered radiation pattern on the directed self-assembled pattern obtained using the directed self-assembling method characterized by the set of parameter values, thus obtaining scattered radiation pattern results for the directed self-assembled pattern. The method furthermore comprises determining based on the scattered radiation pattern results a qualification score and correlating the qualification score with the set of parameter values.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: August 14, 2018
    Assignee: IMEC VZW
    Inventors: Roel Gronheid, Lieve Van Look, Paulina Alejandra Rincon Delgadillo
  • Quality Assessment of Directed Self-Assembling Method
    Publication number: 20150276624
    Abstract: A method for evaluating the quality of a directed self-assembling method used for generating directed self-assembling patterns. The method for evaluating comprises obtaining at least one set of parameter values for a parameterized set of processing steps and material properties characterizing the directed self-assembling method, thus characterizing a specific directed self-assembling method used for generating a directed self-assembled pattern. The method furthermore comprises obtaining a scattered radiation pattern on the directed self-assembled pattern obtained using the directed self-assembling method characterized by the set of parameter values, thus obtaining scattered radiation pattern results for the directed self-assembled pattern. The method furthermore comprises determining based on the scattered radiation pattern results a qualification score and correlating the qualification score with the set of parameter values.
    Type: Application
    Filed: March 31, 2015
    Publication date: October 1, 2015
    Applicants: Katholieke Universiteit Leuven, KU LEUVEN R&D, IMEC VZW
    Inventors: Roel Gronheid, Lieve Van Look, Paulina Alejandra Rincon Delgadillo
  • Method of making alternating phase shift masks
    Patent number: 7761837
    Abstract: One inventive aspect relates to a phase shift mask suitable for lithographic processing of a device, to a method of making such a mask and to lithographic processing using such a mask. The phase shift mask is made taking into account the threshold or dose that will be used for lithographic processing using the mask. In this way, image imbalance will be reduced in a significant focus-exposure processing window. In one embodiment, evaluation of the image imbalance is performed taking into account the processing windows for the different edges of the features of the pattern.
    Type: Grant
    Filed: October 3, 2006
    Date of Patent: July 20, 2010
    Assignee: IMEC
    Inventors: Lieve Van Look, Staf Verhaegen, Eric Hendrickx