Abstract: A dielectric mirror including a substrate and a reflector portion disposed directly on the substrate. The reflector portion includes alternating layers, e.g. in excess of 150 alternating layers, of high and low index of refraction material. In one embodiment, the layers are configured for reflecting each wavelength in a bandwidth of 400 nm at greater than 97.5% reflectivity. In another embodiment, the layers are configured for reflecting an s-polarization and p-polarization of each wavelength in the range from 350 nm to 100 nm at greater than 98% reflectivity. High reflectivity is achieved for a wide range of angle of incidence.

Abstract: An optical filter including at least one substrate and first and second thin-film interference filters disposed directly on the substrate. The interference filters include a plurality of hard coating thin film layers of alternating high and low index of refraction. A fluorescence spectroscopy system and method of selecting a band of wavelengths from light in a fluorescence spectroscopy system are also provided.

Abstract: Thin-film interference filters are constructed with a generalized pattern of layers differing in both thickness and refractive index to produce spectral responses appropriate for adjusting optical power among a plurality of different wavelength channels. Each of the layers is composed of unit sub-layers having thicknesses equal to a quarter-wavelength thickness of a monitoring beam. Interference fluctuations of the monitoring beam associated with the deposition of the unit sub-layers enable a gain-flattening filter to achieve greater manufacturing accuracy by exploiting self-correcting effects of “turning point monitoring” techniques.