Abstract: A thin film transistor structure includes a gate electrode, a gate insulation layer, a first amorphous silicon layer, a source/drain electrode, and a second amorphous silicon layer. The gate insulation layer is located on the gate electrode. The first amorphous silicon layer is located on the gate insulation layer. The source/drain electrode is located on the first amorphous silicon layer. The second amorphous silicon layer is located in the gate insulation layer.

Abstract: A flexible display apparatus including a flexible display panel, a driving chip and a hot-melt protective layer is provided. The flexible display panel has a display area and a bonding area located outside the display area. The driving chip is disposed on the bonding area of the flexible display panel via at least one flexible circuit board. The hot-melt protective layer is disposed on the display area and a portion of the flexible circuit board. The hot-melt protective layer locates on a top surface of the flexible display panel.

Abstract: A flexible display apparatus including a flexible display panel, a driving chip and a hot-melt protective layer is provided. The flexible display panel has a display area and a bonding area located outside the display area. The driving chip is disposed on the bonding area of the flexible display panel via at least one flexible circuit board. The hot-melt protective layer is disposed on the display area and a portion of the flexible circuit board. The hot-melt protective layer locates on a top surface of the flexible display panel.

Abstract: A manufacturing method of a flexible display apparatus is provided. A flexible display panel is formed on the substrate. The flexible display panel has a display area and a bonding area located outside the display area. A driving chip is bonded on the bonding area of the flexible display panel via at least one flexible circuit board. A hot-melt protective layer is formed on the display area and the bonding area of the flexible display panel and a portion of the flexible circuit board. A heating step is performed to soften the hot-melt protective layer. The flexible display panel is separated from the substrate.

Abstract: A manufacturing method of a flexible display apparatus is provided. A flexible display panel is formed on the substrate. The flexible display panel has a display area and a bonding area located outside the display area. A driving chip is bonded on the bonding area of the flexible display panel via at least one flexible circuit board. A hot-melt protective layer is formed on the display area and the bonding area of the flexible display panel and a portion of the flexible circuit board. A heating step is performed to soften the hot-melt protective layer. The flexible display panel is separated from the substrate.

Abstract: A touch panel including a substrate, a plurality of first and second sensing series, and a plurality of conductive repairing pattern layers is provided. The first sensing series are disposed on the substrate and extended along a first direction. Each of the first sensing series includes a plurality of first sensing pads and first bridge lines, and the first bridge lines serially connect two adjacent first sensing pads. The second sensing series are disposed on the substrate and extended along a second direction. Each of the second sensing series includes a plurality of second sensing pads and second bridge lines, and the second bridge lines serially connect two adjacent second sensing pads. Each conductive repairing pattern layer electrically floating locates around the crossover region of the first and second sensing series. Two adjacent sensing pads are connected by the conductive repairing pattern layer after a repair procedure is finished.

Abstract: A touch panel including a substrate, a plurality of first and second sensing series, and a plurality of conductive repairing pattern layers is provided. The first sensing series are disposed on the substrate and extended along a first direction. Each of the first sensing series includes a plurality of first sensing pads and first bridge lines, and the first bridge lines serially connect two adjacent first sensing pads. The second sensing series are disposed on the substrate and extended along a second direction. Each of the second sensing series includes a plurality of second sensing pads and second bridge lines, and the second bridge lines serially connect two adjacent second sensing pads. Each conductive repairing pattern layer electrically floating locates around the crossover region of the first and second sensing series. Two adjacent sensing pads are connected by the conductive repairing pattern layer after a repair procedure is finished.

Abstract: A gas barrier substrate including a flexible base material, at least one first inorganic gas barrier layer and at least one second inorganic gas barrier layer is provided. The flexible base material has an upper surface. The first inorganic gas barrier layer is disposed on the flexible base material and covers the upper surface. The second inorganic gas barrier layer is disposed on the first inorganic gas barrier layer and covers the first inorganic gas barrier layer. A water vapor and oxygen transmission rate of the second inorganic gas barrier layer is lower than that of the first inorganic gas barrier layer.

Abstract: A flexible display apparatus including a flexible display panel, a flexible circuit board, a driving chip, and a sealing layer is provided. The flexible display panel has a display area and a bonding area located outside the display area. The flexible circuit board is disposed in the bonding area of the flexible display panel. The driving chip is disposed on the flexible circuit board. The sealing layer encapsulates a periphery of the flexible display panel and extendedly covers the bonding area and a portion of the flexible circuit board.

Abstract: A flexible display apparatus including a flexible display panel, at least one flexible circuit board, at least one driving chip, and a sealing layer is provided. The flexible display panel has a display area and a bonding area located outside the display area. The flexible circuit board is disposed in the bonding area of the flexible display panel. The driving chip is disposed on the flexible circuit board. The sealing layer encapsulates a periphery of the flexible display panel and extendedly covers the bonding area and a portion of the flexible circuit board.

Abstract: A surface treatment method for a flexible substrate is provided. A flexible insulation substrate is provided. A surface of the flexible insulation substrate has at least one defect. A plasma etching is performed on the flexible insulation substrate to smooth a profile of the defect.

Abstract: A flexible display apparatus including a flexible display panel, at least one flexible circuit board, at least one driving chip, and a sealing layer is provided. The flexible display panel has a display area and a bonding area located outside the display area. The flexible circuit board is disposed in the bonding area of the flexible display panel. The driving chip is disposed on the flexible circuit board. The sealing layer encapsulates a periphery of the flexible display panel and extendedly covers the bonding area and a portion of the flexible circuit board.

Abstract: A gas barrier substrate including a flexible base material, at least one first inorganic gas barrier layer and at least one second inorganic gas barrier layer is provided. The flexible base material has an upper surface. The first inorganic gas barrier layer is disposed on the flexible base material and covers the upper surface. The second inorganic gas barrier layer is disposed on the first inorganic gas barrier layer and covers the first inorganic gas barrier layer. A water vapor and oxygen transmission rate of the second inorganic gas barrier layer is lower than that of the first inorganic gas barrier layer.

Abstract: A thin film transistor array substrate and a manufacturing method thereof are provided. In the manufacturing method, a first patterned conductive layer including a plurality of scan lines and a plurality of gates connected with the scan lines is formed on a substrate. A patterned gate insulating layer having a plurality of openings is then formed on the substrate to cover at least a portion of the first patterned conductive layer, and a plurality of dielectric patterns are formed in the openings. A plurality of semiconductor patterns are formed on the patterned gate insulating layer. A second patterned conductive layer is formed on the semiconductor patterns, the patterned gate insulating layer, and the dielectric patterns. A passivation layer is formed on the semiconductor patterns, the patterned gate insulating layer, and the dielectric patterns. A plurality of pixel electrodes are formed on the passivation layer.

Abstract: A touch panel including a substrate, a plurality of first and second sensing series, and a plurality of conductive repairing pattern layers is provided. The first sensing series are disposed on the substrate and extended along a first direction. Each of the first sensing series includes a plurality of first sensing pads and first bridge lines, and the first bridge lines serially connect two adjacent first sensing pads. The second sensing series are disposed on the substrate and extended along a second direction. Each of the second sensing series includes a plurality of second sensing pads and second bridge lines, and the second bridge lines serially connect two adjacent second sensing pads. Each conductive repairing pattern layer electrically floating locates around the crossover region of the first and second sensing series. Two adjacent sensing pads are connected by the conductive repairing pattern layer after a repair procedure is finished.

Abstract: A thin film transistor array substrate and a manufacturing method thereof are provided. In the manufacturing method, a first patterned conductive layer including a plurality of scan lines and a plurality of gates connected with the scan lines is formed on a substrate. A patterned gate insulating layer having a plurality of openings is then formed on the substrate to cover at least a portion of the first patterned conductive layer, and a plurality of dielectric patterns are formed in the openings. A plurality of semiconductor patterns are formed on the patterned gate insulating layer. A second patterned conductive layer is formed on the semiconductor patterns, the patterned gate insulating layer, and the dielectric patterns. A passivation layer is formed on the semiconductor patterns, the patterned gate insulating layer, and the dielectric patterns. A plurality of pixel electrodes are formed on the passivation layer.

Abstract: Substrate structures and fabrication methods thereof. A substrate structure includes a bendable substrate and an inorganic electrode structure on the bendable structure, wherein the inorganic electrode structure includes a conductive layer or a semiconductor layer. The inorganic electrode structure includes carbon nanotubes, carbon nanofibers, a nanolinear material, or a micro-linear material. The bendable substrate includes polyethylene (PE), polyimide (PI), polyvinyl alcohol (PVA), or polymethyl methacrylate (PMMA).

Abstract: A method for fabricating a cathode plate of a field emission display is disclosed. A patterned electrode layer is formed on a surface of the substrate, and emitters for absorbing a light source are formed on the patterned electrode layer. Next, a dielectric layer is formed over the substrate, and a patterned gate layer is formed on the dielectric layer. Thereafter, a backside exposure process is carried out using the emitters as a mask, and portions of the dielectric layer not masked by the emitters react with a light used in the backside exposure process. Next, portions of the dielectric layer not exposed to the light and portions of the gate layer are removed to form via holes and gate holes.

Abstract: Substrate structures and fabrication methods thereof. A substrate structure includes a bendable substrate and an inorganic electrode structure on the bendable structure, wherein the inorganic electrode structure includes a conductive layer or a semiconductor layer. The inorganic electrode structure includes carbon nanotubes, carbon nanofibers, a nanolinear material, or a micro-linear material. The bendable substrate includes polyethylene (PE), polyimide (PI), polyvinyl alcohol (PVA), or polymethyl methacrylate (PMMA).

Abstract: Coating apparatuses and methods for coating patterned film using the same are presented. The coating apparatus includes a stage, arranged to support a substrate. A stencil is included having patterned openings, wherein the patterned openings are desired film printed patterns. A squeegee set is included, including a scraper and an auxiliary nozzle, wherein the scraper serves as a spreading device and spreads paste on the stencil and fills paste into the patterned openings, and wherein the auxiliary nozzle exerts a force on the paste in the patterned openings to transfer the paste onto the substrate.