Patents by Inventor Lih-Jou Chung

Lih-Jou Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Controlled selectivity etch for use with optical component fabrication
    Patent number: 7005247
    Abstract: A method of fabricating an optical component includes forming a mask on an optical component precursor. The method also includes etching through at least a portion of the mask so as to etch an underlying medium concurrently with remaining mask and transfer a feature of an upper surface of the mask onto an upper surface of the underlying medium. The etch can be configured such that a ratio of the underlying medium etch rate to the mask etch rate is less than about 1.5:1. In some instances, the underlying medium is silicon and the mask is a photoresist.
    Type: Grant
    Filed: January 15, 2003
    Date of Patent: February 28, 2006
    Assignee: Kotusa, Inc.
    Inventors: Joan Fong, Wei Qian, Dawei Zheng, Zhian Shao, Lih-Jou Chung, Xiaoming Yin
  • Optical component having waveguides extending from a common region
    Patent number: 6921490
    Abstract: A method of forming an optical component includes forming a first mask on an optical component precursor. The first mask is formed with a plurality of waveguide portions extending from a common portion. Each waveguide portion is positioned so as to protect a waveguide region of the optical component precursor where a waveguide is to be formed. The method also includes forming a second mask between waveguide portions of the first mask. The resistance of the second mask to etching varies along at least one dimension of the second mask.
    Type: Grant
    Filed: September 6, 2002
    Date of Patent: July 26, 2005
    Assignee: Kotura, Inc.
    Inventors: Wei Qian, Dazeng Feng, Dawei Zheng, Joan Yiqiong Fong, Zhian Shao, Lih-Jou Chung, Xiaoming Yin