Patents by Inventor LILA RAJ DAHAL

LILA RAJ DAHAL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COATED GLASS ARTICLES
    Publication number: 20230071762
    Abstract: A coated glass article provides a visible light reflecting, solar control glazing with a low emittance, a low solar heat gain coefficient, and a low shading coefficient that can significantly improve energy costs in buildings and homes while providing a desirable neutral color for, at least, film side reflection. The low emittance characteristic of the 5 glazing would minimize any indirect heat gain from absorption.
    Type: Application
    Filed: February 18, 2021
    Publication date: March 9, 2023
    Applicant: PILKINGTON GROUP LIMITED
    Inventors: SRIKANTH VARANASI, VIKASH RANJAN, LILA RAJ DAHAL
  • Coated glass article, method of making the same, and photovoltaic cell made therewith
    Patent number: 11542194
    Abstract: A coated glass article includes a glass substrate. A coating is formed on the glass substrate. The coating includes a first coating layer. The first coating layer includes fluorine doped tin oxide. A second coating layer is provided between the glass substrate and the first coating layer. The second coating layer includes silicon dioxide and at least one of phosphorus and boron. The coated glass article exhibits a haze of 2.0% or less.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: January 3, 2023
    Assignee: Pilkington Group Limited
    Inventors: Lila Raj Dahal, Douglas Martin Nelson, Jun Ni, David Alan Strickler, Srikanth Varanasi
  • Chemical vapor deposition process for depositing a coating and the coating formed thereby
    Patent number: 11535552
    Abstract: A chemical vapor deposition process for depositing a coating comprising silicon oxide and titanium oxide is provided. A coating formed by the chemical vapor deposition process is also provided.
    Type: Grant
    Filed: February 17, 2017
    Date of Patent: December 27, 2022
    Assignee: Pilkington Group Limited
    Inventors: Lila Raj Dahal, David Alan Strickler
  • Chemical vapor deposition process for forming a silicon oxide coating
    Patent number: 11485678
    Abstract: A chemical vapor deposition process for forming a silicon oxide coating includes providing a moving glass substrate. A gaseous mixture is formed and includes a silane compound, a first oxygen-containing molecule, a radical scavenger, and at least one of a phosphorus-containing compound and a boron-containing compound. The gaseous mixture is directed toward and along the glass substrate. The gaseous mixture is reacted over the glass substrate to form a silicon oxide coating on the glass substrate at a deposition rate of 150 nm*m/min or more.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: November 1, 2022
    Assignee: Pilkington Group Limited
    Inventors: Lila Raj Dahal, Douglas Martin Nelson, Jun Ni, David Alan Strickler, Srikanth Varanasi
  • COATED GLASS ARTICLE, METHOD OF MAKING THE SAME, AND PHOTOVOLTAIC CELL MADE THEREWITH
    Publication number: 20210155535
    Abstract: A coated glass article includes a glass substrate. A coating is formed on the glass substrate. The coating includes a first coating layer. The first coating layer includes fluorine doped tin oxide. A second coating layer is provided between the glass substrate and the first coating layer. The second coating layer includes silicon dioxide and at least one of phosphorus and boron. The coated glass article exhibits a haze of 2.0% or less.
    Type: Application
    Filed: August 31, 2018
    Publication date: May 27, 2021
    Applicant: PILKINGTON GROUP LIMITED
    Inventors: LILA RAJ DAHAL, DOUGLAS MARTIN NELSON, JUN NI, DAVID ALAN STRICKLER, SRIKANTH VARANASI
  • CHEMICAL VAPOR DEPOSITION PROCESS FOR FORMING A SILICON OXIDE COATING
    Publication number: 20210130229
    Abstract: A chemical vapor deposition process for forming a silicon oxide coating includes providing a moving glass substrate. A gaseous mixture is formed and includes a silane compound, a first oxygen-containing molecule, a radical scavenger, and at least one of a phosphorus-containing compound and a boron-containing compound. The gaseous mixture is directed toward and along the glass substrate. The gaseous mixture is reacted over the glass substrate to form a silicon oxide coating on the glass substrate at a deposition rate of 150 nm*m/min or more.
    Type: Application
    Filed: August 31, 2018
    Publication date: May 6, 2021
    Applicant: PILKINGTON GROUP LIMITED
    Inventors: LILA RAJ DAHAL, DOUGLAS MARTIN NELSON, JUN NI, DAVID ALAN STRICKLER, SRIKANTH VARANASI
  • CHEMICAL VAPOR DEPOSITION PROCESS FOR DEPOSITING A COATING AND THE COATING FORMED THEREBY
    Publication number: 20210094868
    Abstract: A chemical vapor deposition process for depositing a coating comprising silicon oxide and titanium oxide is provided. A coating formed by the chemical vapor deposition process is also provided.
    Type: Application
    Filed: February 17, 2017
    Publication date: April 1, 2021
    Inventors: LILA RAJ DAHAL, DAVID ALAN STRICKLER