Abstract: The embodiments of the present disclosure provide an antibody or antigen-binding fragment against SARS-CoV-2 spike(S) protein, comprising: three complementarity determining regions (HCDRs) of a heavy chain variable region or one or more variants thereof, the heavy chain variable region set forth as SEQ ID NO. 30 or SEQ ID NO. 46, each of the one or more variants having at most two amino acid changes compared to the corresponding CDR; and three complementarity determining regions (LCDRs) of a light chain variable region or one or more variants thereof, the light chain variable region set forth as SEQ ID NO. 32 or SEQ ID NO. 48, each of the one or more variants having at most two amino acid changes compared to the corresponding CDR.

Abstract: Provided is a focusing assembly including a focusing barrel and a barrel retaining ring; the focusing barrel includes a first sleeve, a second sleeve, and a third sleeve that are sequentially sleeved from inside to outside of the focusing barrel; the first sleeve is provided with a lens mounting portion for mounting a focusing lens, a first end of the second sleeve is provided with a display screen mounting portion for mounting a display screen, a second end of the second sleeve is detachably connected to the barrel retaining ring, the first end and the second end being opposite ends of the second sleeve; and the lens mounting portion and the display screen mounting portion are configured such that the relative position thereof in a focusing direction of the focusing assembly is adjustable.

Abstract: A motion stage device, an exposure device and a lithography machine are disclosed. The motion stage device includes: Y-direction motors (203), a mover of each Y-direction motor (203) movable in a horizontal Y-direction; X-direction motors provided on X-direction guide rails (105), the X-direction guide rails (105) is in connection with the movers of the Y-direction motors (203) and movable in the horizontal Y-direction under actuation of the Y-direction motors (203), the X-direction motors having movers (107b) movable in a horizontal X-direction; an inner frame (102), supporting the X-direction guide rails (105); and a motion stage (108, 106), disposed on the movers (107b) of the X-direction motor. This motion stage device possesses improved modal and vibration characteristics because of a reduced load on the Y-direction motors (203).

Abstract: A motion stage device, an exposure device and a lithography machine are disclosed. The motion stage device includes: Y-direction motors (203), a mover of each Y-direction motor (203) movable in a horizontal Y-direction; X-direction motors provided on X-direction guide rails (105), the X-direction guide rails (105) is in connection with the movers of the Y-direction motors (203) and movable in the horizontal Y-direction under actuation of the Y-direction motors (203), the X-direction motors having movers (107b) movable in a horizontal X-direction; an inner frame (102), supporting the X-direction guide rails (105); and a motion stage (108, 106), disposed on the movers (107b) of the X-direction motor. This motion stage device possesses improved modal and vibration characteristics because of a reduced load on the Y-direction motors (203).

Abstract: A silicon wafer edge protection device having: a horizontal motion assembly; vertical motion assembly; speed regulating device, which is in signal connection with the vertical motion assembly and used for regulating vertical motion assembly motion speed; flexible bumper assembly, which is connected to the horizontal motion assembly and vertical motion assembly and used for reducing the amplitude of vibration of the silicon wafer edge protection device when a collision occurs; and control device, which is in signal connection with the speed regulating device and used for sending a control signal to the speed regulating device to control motion of the vertical motion assembly. The silicon wafer edge protection device can prevent a wafer stage from undergoing an instantaneous strong impact and prevent a silicon wafer from being crushed. When a collision occurs, the wafer stage and the silicon wafer can be protected. Production efficiency is also improved.

Abstract: A silicon wafer edge protection device having: a horizontal motion assembly; vertical motion assembly; speed regulating device, which is in signal connection with the vertical motion assembly and used for regulating vertical motion assembly motion speed; flexible bumper assembly, which is connected to the horizontal motion assembly and vertical motion assembly and used for reducing the amplitude of vibration of the silicon wafer edge protection device when a collision occurs; and control device, which is in signal connection with the speed regulating device and used for sending a control signal to the speed regulating device to control motion of the vertical motion assembly. The silicon wafer edge protection device can prevent a wafer stage from undergoing an instantaneous strong impact and prevent a silicon wafer from being crushed. When a collision occurs, the wafer stage and the silicon wafer can be protected. Production efficiency is also improved.