Abstract: C-MEMS architecture having carbon structures with high surface areas due to high aspect ratios and nanoscale surface enhancements, and improved systems and methods for producing such structures are provided. Specifically, high aspect ratio carbon structures are microfabricated by pyrolyzing a patterned carbon precursor polymer. Pyrolysing the polymer preferably comprises a multi-step process in an atmosphere of inert and forming gas at high temperatures that trail the glass transition temperature (Tg) for the polymer. The surface area of the carbon microstructures is increases by nanotexturing the surface through oxygen plasma exposure, and by integrating nanoscale structures with the carbon microstructures by exposing the carbon microstructures and a catalyst to hydrocarbon gas. In a preferred embodiment, the carbon microstructures are the source of carbon gas.

Abstract: C-MEMS architecture having carbon structures with high surface areas due to high aspect ratios and nanoscale surface enhancements, and improved systems and methods for producing such structures are provided. Specifically, high aspect ratio carbon structures are microfabricated by pyrolyzing a patterned carbon precursor polymer. Pyrolysing the polymer preferably comprises a multi-step process in an atmosphere of inert and forming gas at high temperatures that trail the glass transition temperature (Tg) for the polymer. The surface area of the carbon microstructures is increases by nanotexturing the surface through oxygen plasma exposure, and by integrating nanoscale structures with the carbon microstructures by exposing the carbon microstructures and a catalyst to hydrocarbon gas. In a preferred embodiment, the carbon microstructures are the source of carbon gas.

Abstract: C-MEMS architecture having high aspect ratio carbon structures and improved systems and methods for producing high aspect ratio C-MEMS structures are provided. Specifically, high aspect ratio carbon structures are microfabricated by pyrolyzing a patterned carbon precursor polymer. Pyrolysing the polymer preferably comprises a multi-step process in an atmosphere of inert and forming gas at high temperatures that trail the glass transit temperature (Tg) for the polymer. Multi-layer C-MEMS carbon structures are formed from multiple layers of negative photoresist, wherein a first layer forms carbon interconnects and the second and successive layers form high aspect ratio carbon structures. High-conductivity interconnect traces to connect C-MEMS carbon structures are formed by depositing a metal layer on a substrate, patterning a polymer precursor on top of the metal layer and pyrolyzing the polymer to create the final structure.