Patents by Inventor Li-ming Dai

Li-ming Dai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate-supported aligned carbon nanotube films
    Patent number: 7799163
    Abstract: This invention relates to a process for preparing a substrate-supported aligned carbon nanotube film including: synthesizing a layer of aligned carbon nanotubes on the substrate capable of supporting nanotube growth, applying a layer of a second substrate to a top surface of aligned carbon nanotube layer, removing said substrate capable of supporting nanotube growth to provide an aligned carbon nanotube film supported on said second substrate.
    Type: Grant
    Filed: May 25, 2000
    Date of Patent: September 21, 2010
    Assignee: University of Dayton
    Inventors: Albert Mau, Li-ming Dai, Shaoming Huang
  • Process for making aligned carbon nanotubes
    Patent number: 6866801
    Abstract: A process for preparing a patterned layer of aligned carbon nanotubes on a substrate including: applying a pattern of polymeric material to the surface of a substrate capable of supporting nanotube growth using a soft-lithographic technique; subjecting said polymeric material to carbonization to form a patterned layer of carbonized polymer on the surface of the substrate; synthesising a layer of aligned carbon nanotubes on regions of said substrate to which carbonized polymer is not attached to provide a patterned layer of aligned carbon nanotubes on said substrate.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: March 15, 2005
    Assignee: Commonwealth Scientific and Industrial Research Organisation
    Inventors: Albert Mau, Li-ming Dai, Shaoming Huang
  • Patterned carbon nanotube films
    Patent number: 6811957
    Abstract: This invention relates to a process for preparing a patterned layer of aligned carbon nanotubes on a substrate including: applying a photoresist layer to at least a portion of a surface of a substrate capable of supporting nanotube growth, masking a region of said photoresist layer to provide a masked portion and an unmasked portion, subjecting said unmasked portion to electromagnetic radiation of a wavelength and intensity sufficient to transform the unmasked portion while leaving the masked portion substantially untransformed, said transformed portion exhibiting solubility characteristics different to said untransformed portion, developing said photoresist layer by contacting with a solvent for a time and under conditions sufficient to dissolve one of said transformed and untransformed portions of the photoresist, leaving the other portion attached to said substrate, synthesising a layer of aligned carbon nanotubes on regions of said substrate to which said remaining photoresist portion is not attached to p
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: November 2, 2004
    Assignee: Commonwealth Scientific and Industrial Research Organisation
    Inventors: Albert Mau, Li-ming Dai, Shaoming Huang, Yong Yuan Yang, Hui Zhu He