Abstract: A drawer-replaced cleaning apparatus comprises: a box, at least one cleaning module and a lifting power module, the box has an accommodating space and a drawer, the drawer is located in the accommodating space, and may be pulled out from one side of the box, a bottom surface of the drawer has at least one mounting slot, the at least one cleaning module is detachably disposed in the mounting slot, the lifting power module is located in the accommodating space, and disposed below the cleaning module, the lifting power module passes through the mounting slot to push the cleaning module up away from the drawer, and the lifting power module is lowered so that the cleaning module is relocated in the mounting slot. The present disclosure solves the problem that the cleaning module of the prior art is difficult to replace.

Abstract: A microarray carrier assembly including a scan tray and a plurality of microarray blocks detachably disposed on the scan tray is provided. The scan tray includes a frame including an opening and a slot, and a transparent substrate covering the opening of the frame. Each of the microarray blocks includes a main body, a probe array distributed on the main body and facing towards the transparent substrate of the scan tray, and a plurality of guiding pins disposed on the main body and surrounding the probe array, wherein a top surface area of the guiding pin opposite to the main body is less than a bottom surface area of the guiding pin connected to the main body, and the guiding pins are detachably inserted into the slot of the frame of the scan tray.

Abstract: A microarray carrier assembly including a scan tray and a plurality of microarray blocks detachably disposed on the scan tray is provided. The scan tray includes a frame including an opening and a slot, and a transparent substrate covering the opening of the frame. Each of the microarray blocks includes a main body, a probe array distributed on the main body and facing towards the transparent substrate of the scan tray, and a plurality of guiding pins disposed on the main body and surrounding the probe array, wherein a top surface area of the guiding pin opposite to the main body is less than a bottom surface area of the guiding pin connected to the main body, and the guiding pins are detachably inserted into the slot of the frame of the scan tray.

Abstract: A surface of a mask substrate is divided into a main field region and a blank periphery region surrounding the main field region. A first pattern, at least one second pattern and at least one third pattern are formed within the main field region to form a phase shift mask (PSM). By using the PSM, a pattern transferring process is performed to transfer the first pattern, the second pattern and the third pattern to a semiconductor wafer. Finally, by using the second and third patterns transferred to the semiconductor wafer, a PSM test is performed.

Abstract: A surface of a mask substrate is divided into a main field region and a blank periphery region surrounding the main field region. A first pattern, at least one second pattern and at least one third pattern are formed within the main field region to form a phase shift mask (PSM). By using the PSM, a pattern transferring process is performed to transfer the first pattern, the second pattern and the third pattern to a semiconductor wafer. Finally, by using the second and third patterns transferred to the semiconductor wafer, a PSM test is performed.

Abstract: A fabrication process for a mask used in exposure processes using x-rays, which includes first forming and patterning an absorber, and then forming a membrane over it. The fabrication process can avoid the use of a selective etching process on the absorber and the membrane. The mask, according to the invention, can prevent transferred pattern misalignment or displacement or misplacement, and exposure to secondary electrons as well.