Abstract: An inner pod holding device conducive to reducing dust contamination comprises a separator, a plurality of supporters, a first positioning module, and a second positioning module. The separator defines a concealing space and a holding space. The plurality of supporters is disposed in the holding space. The first positioning module includes a first driving member and at least one first positioning member. The first driving member is disposed in the concealing space and configured to move in a first direction. The second positioning module includes a second driving member and at least one second positioning member. The second driving member is disposed in the concealing space and configured to move in a second direction. The first and second positioning members each have a top portion protruding to the holding space. An optical inspection apparatus with the inner pod holding device is further provided.

Abstract: An optical inspection device for a surface of a reticle pod includes a carrier platform having a carrier surface, a light source module, a photographic module, and a control module. The light source module includes first and second light sources for irradiating the carrier surface in first and second directions, respectively. An angle of an included angle between the first direction and the carrier surface is greater than an angle of an included angle between the second direction and the carrier surface. The control module is signally connected to the camera module, first light source, and second light source. The control module controls one of the first light source and second light source to turn on and the other one to turn off. An optical inspection method for a surface of a reticle pod is further provided to operate to inspect a reticle pod efficiently and precisely.

Abstract: An inspection device for a sub-element of a reticle pod comprises a carrier platform, a light source module, a camera module and a control module. The light source module includes a coaxial light source and a height adjustment mechanism. The height adjustment mechanism is connected to at least one of the coaxial light source and the carrier platform. The camera module is connected to the coaxial light source and has a lens facing the carrier platform. The control module is signally connected to the camera module and the height adjustment mechanism. The control module controls the height adjustment mechanism to adjust a relative distance between the coaxial light source and the carrier platform. The inspection device for a sub-element of a reticle pod performs optical inspection on the sub-element of a reticle pod.

Abstract: A high-speed surface inspection system for a reticle pod and method comprises a cabinet, a clamping module, a first inspection device, a second inspection device, and a travel stroke controller. An interior of the cabinet is divided into an automated device area, a first inspection area, and a second inspection area. The travel stroke controller controls the clamping module to reciprocate between the automated device area and the first inspection area so as to transport a first portion of the reticle pod, and controls the clamping module to reciprocate between the automated device area and the second inspection area so as to transport a second portion of the reticle pod. A high-speed surface inspection method for a reticle pod is further provided. The present application solves the issue of an inability for efficient surface inspection of a reticle pod.

Abstract: A gripping mechanism for inspection of a reticle inner pod includes a quadrilateral frame and fourth gripper units. The four gripper units are respectively disposed at four border strips of the quadrilateral frame and are opposite in pairs. Each gripper unit has a body, a first gripping portion and a second gripper portion. The first and second gripping portions are respectively located on different positions of the body. The first gripping portions form a first gripping plane, and the second gripping portions form a second gripping plane. At least two adjacent gripper units have a power member, which is in power connection with the body so as to adjust a distance between two bodies opposite to each other. The gripping mechanism for the inspection of the reticle inner pod is capable of securely gripping the reticle inner pod during transportation or turning of reticles.

Abstract: A drawer-replaced cleaning apparatus comprises: a box, at least one cleaning module and a lifting power module, the box has an accommodating space and a drawer, the drawer is located in the accommodating space, and may be pulled out from one side of the box, a bottom surface of the drawer has at least one mounting slot, the at least one cleaning module is detachably disposed in the mounting slot, the lifting power module is located in the accommodating space, and disposed below the cleaning module, the lifting power module passes through the mounting slot to push the cleaning module up away from the drawer, and the lifting power module is lowered so that the cleaning module is relocated in the mounting slot. The present disclosure solves the problem that the cleaning module of the prior art is difficult to replace.

Abstract: A microarray carrier assembly including a scan tray and a plurality of microarray blocks detachably disposed on the scan tray is provided. The scan tray includes a frame including an opening and a slot, and a transparent substrate covering the opening of the frame. Each of the microarray blocks includes a main body, a probe array distributed on the main body and facing towards the transparent substrate of the scan tray, and a plurality of guiding pins disposed on the main body and surrounding the probe array, wherein a top surface area of the guiding pin opposite to the main body is less than a bottom surface area of the guiding pin connected to the main body, and the guiding pins are detachably inserted into the slot of the frame of the scan tray.

Abstract: A microarray carrier assembly including a scan tray and a plurality of microarray blocks detachably disposed on the scan tray is provided. The scan tray includes a frame including an opening and a slot, and a transparent substrate covering the opening of the frame. Each of the microarray blocks includes a main body, a probe array distributed on the main body and facing towards the transparent substrate of the scan tray, and a plurality of guiding pins disposed on the main body and surrounding the probe array, wherein a top surface area of the guiding pin opposite to the main body is less than a bottom surface area of the guiding pin connected to the main body, and the guiding pins are detachably inserted into the slot of the frame of the scan tray.

Abstract: A surface of a mask substrate is divided into a main field region and a blank periphery region surrounding the main field region. A first pattern, at least one second pattern and at least one third pattern are formed within the main field region to form a phase shift mask (PSM). By using the PSM, a pattern transferring process is performed to transfer the first pattern, the second pattern and the third pattern to a semiconductor wafer. Finally, by using the second and third patterns transferred to the semiconductor wafer, a PSM test is performed.

Abstract: A surface of a mask substrate is divided into a main field region and a blank periphery region surrounding the main field region. A first pattern, at least one second pattern and at least one third pattern are formed within the main field region to form a phase shift mask (PSM). By using the PSM, a pattern transferring process is performed to transfer the first pattern, the second pattern and the third pattern to a semiconductor wafer. Finally, by using the second and third patterns transferred to the semiconductor wafer, a PSM test is performed.

Abstract: A fabrication process for a mask used in exposure processes using x-rays, which includes first forming and patterning an absorber, and then forming a membrane over it. The fabrication process can avoid the use of a selective etching process on the absorber and the membrane. The mask, according to the invention, can prevent transferred pattern misalignment or displacement or misplacement, and exposure to secondary electrons as well.