Patents by Inventor LIN TL

LIN TL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS OF CLEANING AN OXIDE LAYER IN A FILM STACK TO ELIMINATE ARCING DURING DOWNSTREAM PROCESSING
    Publication number: 20200203144
    Abstract: Methods and apparatus for reducing arcing of a silicon oxide layer in a film stack are provided. In some embodiments a method for reducing arcing of a silicon oxide layer in a film stack includes: depositing a silicon oxide layer having a top surface atop a low-k dielectric layer, wherein the silicon oxide layer and low-k dielectric layer are disposed upon a substrate and within a film stack; contacting the silicon oxide layer with argon plasma in an amount sufficient to clean the silicon oxide layer; and depositing a nitride layer atop the silicon oxide layer.
    Type: Application
    Filed: March 29, 2019
    Publication date: June 25, 2020
    Inventors: CHAO DU, VAIBHAV SONI, LIN TL, YONG CAO, MINGDONG LI, MINGTE LIU, CHEN GONG, XIAODONG WANG, RONGJUN WANG, XIANMIN TANG