Abstract: An identification of an item that was misclassified by a classification model constructed in accordance with a machine learning technique is received. One example of such a machine learning technique is a random forest. A subset of training data, previously used to construct the model, and that is associated with the item is identified. At least a portion of the identified subset is provided as output.

Abstract: A method and apparatus for determining an application to be recommended are provided. The method includes: obtaining mode identification information of a usage mode used by each of a plurality of terminal devices and application identification information of an application run in the usage mode used by each of the plurality of terminal devices which are sent from each of the plurality of terminal devices; gathering the mode identification information and the application identification information sent from the plurality of terminal devices; and determining an application meeting a predetermined condition for each usage mode based on the gathered mode identification information and application identification information, where the application meeting the predetermined condition for each usage mode is an application to be recommended for each usage mode.

Abstract: Methods, computer program products, and systems are presented. The methods include, for instance: providing a distributed virtual gateway for Network Virtualization over Layer 3 (NVO3) network. A gateway stack having three or more nodes is implemented as a distributed virtual gateway, providing Layer 2 or Layer 3 gateway services in a fail-safe manner. Nodes of the gateway stack are configured to autonomously process and forward inbound NVO3 data packets with known destination addresses without engaging a master of the gateway stack.

Abstract: A system for performing single Gaussian skin detection is described herein. The system includes a memory and a processor. The memory is configured to receive image data. The processor is coupled to the memory. The processor is to generate a single Gaussian skin model based on a skin dominant region associated with the image data and a single Gaussian non-skin model based on a second region associated with the image data and to classify individual pixels associated with the image data via a discriminative skin likelihood function based on the single Gaussian skin model and the single Gaussian non-skin model to generate skin label data associated with the image data.

Abstract: Skin smoothing is applied to images using a bilateral filter and aided by a skin map. In one example a method includes receiving an image having pixels at an original resolution. The image is buffered. The image is downscaled from the original resolution to a lower resolution. A bilateral filter is applied to pixels of the downscaled image. The filtered pixels of the downscaled image are blended with pixels of the image having the original resolution, and the blended image is produced.

Abstract: A method and apparatus for processing a semiconductor substrate are described herein. A process system described herein includes a plasma source and a flow distribution plate. A method described herein includes generating fluorine radicals or ions, delivering the fluorine radicals or ions through one or more plasma blocking screens to a volume defined by the flow distribution plate and one of one or more plasma blocking screens, delivering oxygen and hydrogen to the volume, mixing the oxygen and hydrogen with fluorine radicals or ions to form hydrogen fluoride, flowing hydrogen fluoride through the flow distribution plate, and etching a substrate using bifluoride. The concentration of fluorine radicals or ions on the surface of the substrate is reduced to less than about two percent.

Abstract: Exemplary cleaning or etching methods may include flowing a fluorine-containing precursor into a remote plasma region of a semiconductor processing chamber. Methods may include forming a plasma within the remote plasma region to generate plasma effluents of the fluorine-containing precursor. The methods may also include flowing the plasma effluents into a processing region of the semiconductor processing chamber. A substrate may be positioned within the processing region, and the substrate may include a region of exposed oxide. Methods may also include providing a hydrogen-containing precursor to the processing region. The methods may further include removing at least a portion of the exposed oxide while maintaining a relative humidity within the processing region below about 50%. Subsequent to the removal, the methods may include increasing the relative humidity within the processing region to greater than or about 50%. The methods may further include removing an additional amount of the exposed oxide.

Abstract: Techniques for categorizing mobile uniform resource locators (URLs) that are used by mobile applications are disclosed. A URL is extracted from a mobile application. A category for the URL is determined based on a categorization of the mobile application. The URL and its determined category are then generated as output.

Abstract: A method for information processing includes displaying a display object at a first display location in a first space area of a physical scene; detecting a first user-related event; and in response to the first user-related event satisfying a preset condition, performing a display operation in connection to the display object with respect to a second space area of the physical scene.

Abstract: Exemplary cleaning or etching methods may include flowing a fluorine-containing precursor into a remote plasma region of a semiconductor processing chamber. Methods may include forming a plasma within the remote plasma region to generate plasma effluents of the fluorine-containing precursor. The methods may also include flowing the plasma effluents into a processing region of the semiconductor processing chamber. A substrate may be positioned within the processing region, and the substrate may include a region of exposed oxide and a region of exposed metal. Methods may also include providing a hydrogen-containing precursor to the processing region. The methods may further include removing at least a portion of the exposed oxide.

Abstract: Exemplary cleaning or etching methods may include flowing a fluorine-containing precursor into a remote plasma region of a semiconductor processing chamber. Methods may include forming a plasma within the remote plasma region to generate plasma effluents of the fluorine-containing precursor. The methods may also include flowing the plasma effluents into a processing region of the semiconductor processing chamber. A substrate may be positioned within the processing region, and the substrate may include a region of exposed oxide and a region of exposed metal. Methods may also include providing a hydrogen-containing precursor to the processing region. The methods may further include removing at least a portion of the exposed oxide.

Abstract: An apparatus for conditioning a component of a processing chamber is provided. A tank for holding a megasonic conditioning solution is provided. A mount holds the component immersed in a megasonic conditioning solution, when the tank is filled with the megasonic conditioning solution. A megasonic conditioning solution inlet system delivers the megasonic conditioning solution to the tank. A megasonic transducer head comprises at least one megasonic transducer to provide megasonic energy to the megasonic conditioning solution, wherein the megasonic energy is delivered to the component via the megasonic conditioning solution. A megasonic conditioning solution drain system drains the megasonic conditioning solution from the tank at a location above where the component is held in the megasonic conditioning solution. An actuator moves the megasonic transducer head across the tank.

Abstract: A thermogalvanic electrochemical system includes two battery sources connected together in a switchable circuit to provide electric current to an electrical load in the circuit. The battery sources are located in a thermal environment having a varying temperature, and each battery source has a corresponding electrical potential that varies with temperature of the thermal environment. A power management processor operates the circuit to: form a closed circuit at a first temperature with current flow from a first battery source through the electrical load to a second battery source until reaching a first thermal equilibrium, and then form an open circuit, then form a closed circuit at a second temperature with current flow from the second battery source through the electrical load to the first current source until reaching a second thermal equilibrium, and then form an open circuit.

Abstract: Categorizing mobile uniform resource locators (URLs) used by a mobile application is disclosed. A plurality of URLs is extracted from the mobile application. A category is assigned to at least one URL included in the plurality of URLs. The category is assigned to the URL based on a categorization of the mobile application.

Abstract: A method for coating a part body for use in a plasma processing chamber is provided. The part body is received into a chamber. At least part of a surface of the part body is coated by physical vapor deposition or chemical vapor deposition with a coating with a thickness of no more than 30 microns consisting essentially of a Lanthanide series or Group III or Group IV element in an oxyfluoride.

Abstract: Exemplary cleaning or etching methods may include flowing a fluorine-containing precursor into a remote plasma region of a semiconductor processing chamber. Methods may include forming a plasma within the remote plasma region to generate plasma effluents of the fluorine-containing precursor. The methods may also include flowing the plasma effluents into a processing region of the semiconductor processing chamber. A substrate may be positioned within the processing region, and the substrate may include a region of exposed oxide. Methods may also include providing a hydrogen-containing precursor to the processing region. The methods may further include removing at least a portion of the exposed oxide while maintaining a relative humidity within the processing region below about 50%. Subsequent to the removal, the methods may include increasing the relative humidity within the processing region to greater than or about 50%. The methods may further include removing an additional amount of the exposed oxide.

Abstract: A fluid handling component for a vacuum chamber of a semiconductor substrate processing apparatus is provided. The fluid handling component comprises interior fluid wetted surfaces and an atomic layer deposition (ALD) or molecular layer deposition (MLD) barrier coating on the interior fluid wetted surfaces wherein the fluid wetted surfaces which include the ALD or MLD barrier coating are configured to be contacted by a process gas and/or fluid during a semiconductor substrate processing process wherein the ALD or MLD barrier coating protects the underlying fluid wetted surfaces from erosion and/or corrosion.

Abstract: Disclosed is a session link control method. The method comprises: monitoring a data transmission rate of a transmission link used currently by a mobile terminal; and when it is monitored that the data transmission rate of the transmission link where the mobile terminal is located is lower than a preset rate threshold, creating a new transmission link for the mobile terminal, and controlling the mobile terminal to be switched from the current transmission link to the new transmission link. In addition, also disclosed are a session link control apparatus and a computer storage medium.

Abstract: Provided are a method and device for recording a system log. The method includes: acquiring the sequence information of a virtual log file in a system, wherein the virtual log file is a preset file for the system, and the virtual log file includes the sequence information, and the sequence information is used for determining a position of a log file which is written last time by the system; and determining the log file which is written last time by the system according to the sequence information of the virtual log file, and writing the log in the determined log file. By the disclosure, the sequence of system log recording is not influenced by changes in the system time.

Abstract: A method for conditioning and cleaning a silicon part is provided. The silicon part is heated to a temperature of at least 300° C. in the presence of oxygen to form an outer surface of the silicon part into silicon oxide. The silicon part is placed in a wet bath wherein the bath is a solution that selectively etches silicon oxide with respect to silicon.