Abstract: Methods, devices and systems are described to eliminate or reduce unwanted polarization aberrations associated with interference filters. An example method for producing a polarization aberration compensator for a thin film interference filter includes obtaining a set of Mueller matrix values based on polarization measurements of the thin film interference filter over a spectral range, and generating a metric based on a difference between a compensated Mueller matrix and an identity matrix over the spectral range. The compensated matrix represents a cumulative Mueller matrix for a combination of the thin film interference filter and the polarization aberration compensator. A configuration of the polarization aberration compensator is determined based on evaluating the metric that eliminates or reduces the difference between the compensated Mueller matrix and the identity matrix over the spectral range.

Abstract: A photonic device including a first waveguide and a second waveguide is provided. The device includes an interconnect coupled with the first waveguide and the second waveguide. The interconnect includes a substrate. The interconnect includes a film including a refractive index contrast (RIC) polymer and a core. The core includes a first domain having a first refractive index. The core includes a second domain adjacent to the first domain and having a second refractive index. The second refractive index is less than the first refractive index. The core includes a third domain adjacent to the second domain and having a third refractive index. The third refractive index is less than the second refractive index. The second domain is disposed between the first domain and the third domain. The refractive index of the substrate is less than the first refractive index, the second refractive index, and the third refractive index.

Abstract: In accordance with a method of forming a waveguide in a polymer film disposed on a substrate, a plurality of regions on a polymer film are selectively exposed to a first dosage of radiation. The polymer film is formed from a material having a refractive index that decreases by exposure to the radiation and subsequent heating. At least one region of the polymer film that was not previously exposed to the radiation is selectively exposing to a second dosage of radiation. The second dosage of radiation is less than the first dosage of radiation. The polymer film is heated to complete curing of the polymer film.

Abstract: Methods, devices and systems are described that reduce polarization aberrations in waveguides used in a variety of applications, such as augmented or virtual reality. An example waveguide device includes a cladding with a first index of refraction, and a core with a plurality of layers that can maintain propagation of the polarized beam with multiple total internal reflections (TIRs). Each layer of the core has an index of refraction that is larger than the first index of refraction, and the core has a graded index profile that varies from a higher index at an inner core location to a lower index at an outer location of the core. The core has a predetermined number of layers such that a polarization retardance of the polarized beam for a range of angles of incidence spanning at least 6 degrees, and after a plurality of TIRs, remains less than 10 degrees.

Abstract: Methods, apparatus and systems that relate to high performance UV disinfection in a HVAC system with integrated concentrator optics are described. One example device for air disinfection includes a housing structured to include an interior volume and having an air inlet at a first end of the housing and an air outlet at a second end of the housing, the housing providing an air passage through the interior volume between the air inlet and the air outlet. The device filter includes at least one light source positioned proximate to the interior volume and at least one nonimaging optics element positioned proximate to the interior volume.

Abstract: Methods, devices and systems are described that reduce polarization aberration of a metal coated surface. An example optical device includes a multi-layer structure that includes a reflective layer having retardance and diattenuation over a particular range of wavelengths. The multi-layer structure also includes a uniaxial birefringent layer positioned above the reflective layer, and an anti-reflection layer positioned above the uniaxial birefringent layer. The uniaxial birefringent layer's thickness is selected to compensate for at least a portion of the retardance of the reflective layer over the particular range of wavelengths. The anti-reflection layer's thickness is selected to compensate for at least a portion of the diattenuation associated with the reflective layer over the particular range of wavelengths. The uniaxial birefringent layer can be a C-plate, and example reflective layers include an aluminum layer, a silver layer or a gold layer.

Abstract: In accordance with a method of forming a waveguide in a polymer film disposed on a substrate, a plurality of regions on a polymer film are selectively exposed to a first dosage of radiation. The polymer film is formed from a material having a refractive index that decreases by exposure to the radiation and subsequent heating. At least one region of the polymer film that was not previously exposed to the radiation is selectively exposing to a second dosage of radiation. The second dosage of radiation is less than the first dosage of radiation. The polymer film is heated to complete curing of the polymer film.

Abstract: A method for establishing optical coupling between spatially separated first and second planar waveguides includes arranging an optical interconnect on the first planar waveguide. The optical interconnect has first and second end portions and an intermediate portion. Each of the end portions has an inverse taper. The second planar waveguide is arranged on the optical interconnect so that the second planar waveguide overlaps with one of the inverse tapered end portions but not the other inverse tapered end portion to thereby enable an adiabatic transition of an optical signal from the first planar waveguide to the second planar waveguide via the optical interconnect. The first and second planar waveguides have different refractive indices at an operating wavelength and the optical interconnect have a higher refractive index at the operating wavelength than the refractive indices of a core of the first planar waveguide and a core of the second planar waveguide.

Abstract: A method of forming an optical interconnect between first and second photonic chips located on an optical printed circuit board (OPCB) includes applying a coupling agent to a bonding surface of a flexible, freestanding polymer waveguide array film having at least one polymer waveguide disposed therein. The waveguide array film is placed onto the first and second photonic chips so that the waveguide array film extends over a gap and/or a step between the first and second photonic chips to thereby form a bonding interface between the bonding surface of the waveguide array film and the first and second photonic chips. The coupling agent is selected such that optical coupling between the first and second photonic chips arises simultaneously with formation of the bonding interface.

Abstract: Methods, devices and systems are described to eliminate or reduce unwanted polarization aberrations associated with interference filters. An example method for producing a polarization aberration compensator for a thin film interference filter includes obtaining a set of Mueller matrix values based on polarization measurements of the thin film interference filter over a spectral range, and generating a metric based on a difference between a compensated Mueller matrix and an identity matrix over the spectral range. The compensated matrix represents a cumulative Mueller matrix for a combination of the thin film interference filter and the polarization aberration compensator. A configuration of the polarization aberration compensator is determined based on evaluating the metric that eliminates or reduces the difference between the compensated Mueller matrix and the identity matrix over the spectral range.

Abstract: A photonic device including a first waveguide and a second waveguide is provided. The device includes an interconnect coupled with the first waveguide and the second waveguide. The interconnect includes a substrate. The interconnect includes a film including a refractive index contrast (RIC) polymer and a core. The core includes a first domain having a first refractive index. The core includes a second domain adjacent to the first domain and having a second refractive index. The second refractive index is less than the first refractive index. The core includes a third domain adjacent to the second domain and having a third refractive index. The third refractive index is less than the second refractive index. The second domain is disposed between the first domain and the third domain. The refractive index of the substrate is less than the first refractive index, the second refractive index, and the third refractive index.

Abstract: Methods, apparatus and systems that relate to high performance UV disinfection in a HVAC system with integrated concentrator optics are described. One example device for air disinfection includes a housing structured to include an interior volume and having an air inlet at a first end of the housing and an air outlet at a second end of the housing, the housing providing an air passage through the interior volume between the air inlet and the air outlet. The device filter includes at least one light source positioned proximate to the interior volume and at least one nonimaging optics element positioned proximate to the interior volume.

Abstract: In accordance with a method of forming a waveguide in a polymer film disposed on a substrate, a plurality of regions on a polymer film are selectively exposed to a first dosage of radiation. The polymer film is formed from a material having a refractive index that decreases by exposure to the radiation and subsequent heating. At least one region of the polymer film that was not previously exposed to the radiation is selectively exposing to a second dosage of radiation. The second dosage of radiation is less than the first dosage of radiation. The polymer film is heated to complete curing of the polymer film.

Abstract: A photovoltaic (“PV”) module may comprise an array of freeform micro-optics and an array of PV cells. The PV module may be a flat panel with a nominal thickness smaller than the length and width of the flat panel. An array of lenses may be embedded in an array substrate. The lenses may be coupled to light pipes. The lenses may concentrate light through the light pipes to multi-junction cells. Diffuse light may be transferred through the array substrate to a silicon cell. The lenses and light pipes may be manufactured using a molding and drawing process.

Abstract: A method for establishing optical coupling between spatially separated first and second planar waveguides includes arranging an optical interconnect on the first planar waveguide. The optical interconnect has first and second end portions and an intermediate portion. Each of the end portions has an inverse taper. The second planar waveguide is arranged on the optical interconnect so that the second planar waveguide overlaps with one of the inverse tapered end portions but not the other inverse tapered end portion to thereby enable an adiabatic transition of an optical signal from the first planar waveguide to the second planar waveguide via the optical interconnect. The first and second planar waveguides have different refractive indices at an operating wavelength and the optical interconnect have a higher refractive index at the operating wavelength than the refractive indices of a core of the first planar waveguide and a core of the second planar waveguide.

Abstract: A method of forming an optical interconnect between first and second photonic chips located on an optical printed circuit board (OPCB) includes applying a coupling agent to a bonding surface of a flexible, freestanding polymer waveguide array film having at least one polymer waveguide disposed therein. The waveguide array film is placed onto the first and second photonic chips so that the waveguide array film extends over a gap and/or a step between the first and second photonic chips to thereby form a bonding interface between the bonding surface of the waveguide array film and the first and second photonic chips. The coupling agent is selected such that optical coupling between the first and second photonic chips arises simultaneously with formation of the bonding interface.

Abstract: A method of forming an optical interconnect between first and second photonic chips located on an optical printed circuit board includes applying a flexible, freestanding film onto the first and second chips so that the film extends over a gap and/or step between the chips. The film includes a photosensitive layer having a refractive index that decreases by exposure to radiation and a backing layer. The film is exposed to a flood exposure having a radiation dosage penetrating the backing layer and only a surface sublayer of the photosensitive layer. After curing the film, the backing layer is removed so that the photosensitive layer remains on the first and second chips. The photosensitive layer is selectively exposed to a second radiation dosage to define waveguide core(s) in unexposed regions of the photosensitive layer below the surface sublayer. The photosensitive layer is heated to cure the selectively exposed portions.

Abstract: A method of forming an optical interconnect between first and second photonic chips located on an optical printed circuit board includes applying a flexible, freestanding film onto the first and second chips so that the film extends over a gap and/or step between the chips. The film includes a photosensitive layer having a refractive index that decreases by exposure to radiation and a backing layer. The film is exposed to a flood exposure having a radiation dosage penetrating the backing layer and only a surface sublayer of the photosensitive layer. After curing the film, the backing layer is removed so that the photosensitive layer remains on the first and second chips. The photosensitive layer is selectively exposed to a second radiation dosage to define waveguide core(s) in unexposed regions of the photosensitive layer below the surface sublayer. The photosensitive layer is heated to cure the selectively exposed portions.

Abstract: A photovoltaic (“PV”) module may comprise an array of freeform micro-optics and an array of PV cells. The PV module may be a flat panel with a nominal thickness smaller than the length and width of the flat panel. An array of lenses may be embedded in an array substrate. The lenses may be coupled to light pipes. The lenses may concentrate light through the light pipes to multi-junction cells. Diffuse light may be transferred through the array substrate to a silicon cell. The lenses and light pipes may be manufactured using a molding and drawing process.

Abstract: A photovoltaic (“PV”) module may comprise an array of freeform micro-optics and an array of PV cells. The PV module may be a flat panel with a nominal thickness smaller than the length and width of the flat panel. An array of lenses may be embedded in an array substrate. The lenses may be coupled to light pipes. The lenses may concentrate light through the light pipes to multi junction cells. Diffuse light may be transferred through the array substrate to a silicon cell. The lenses and light pipes may be manufactured using a molding and drawing process.