Abstract: The disclosure describes artificial reality systems and techniques for saving and exporting artificial reality data. For example, an artificial reality system includes an application engine configured to generate artificial reality content based on a pose of a user participating in an artificial reality environment and a head-mounted display (HMD) configured to output the artificial reality content to the user. The HMD includes a buffer configured to hold data representative of the artificial reality environment during a time window on a rolling basis and a capture engine configured to, in response to user input, capture the data representative of the artificial reality environment held in the buffer at a point in time at which the user input was received.

Abstract: A workflow management system can be used to determine whether a set of transaction events have been properly processed according to a business process rule. A business process rule includes a set of transaction events setup in accordance with a government regulation or an internal company process. An event data may include information associated with a transaction event. A workflow management system includes a workflow management server that receives cryptographically signed transaction event data from one or more additional servers so that the workflow management server can determine whether the received transaction event data comprises a complete or an incomplete transaction.

Abstract: In general, this disclosure describes a suspend mode feature for artificial reality systems and, more specifically, system configurations and techniques for generating a suspend mode environment during execution of an artificial reality application, and presenting and controlling user interface (UI) elements within the suspend mode environment. The suspend mode feature enables a user interacting with one or more other users (or one or more avatars corresponding to the one or more other users) within an artificial reality (AR) environment to suspend the AR environment from the user's perspective. While in the suspend mode environment, the user is able to view and select the other users from the AR environment. For example, the user may select another user to friend, message, mute, block, or report that user from the suspend mode environment.

Abstract: In general, this disclosure describes a suspend mode feature for artificial reality systems and, more specifically, system configurations and techniques for generating a suspend mode environment during execution of an artificial reality application, and presenting and controlling user interface (UI) elements within the suspend mode environment. The suspend mode feature enables a user interacting with one or more other users (or one or more avatars corresponding to the one or more other users) within an artificial reality (AR) environment to suspend the AR environment from the user's perspective. While in the suspend mode environment, the user is able to view and select the other users from the AR environment. For example, the user may select another user to friend, message, mute, block, or report that user from the suspend mode environment.

Abstract: In general, this disclosure describes a suspend mode feature for artificial reality systems and, more specifically, system configurations and techniques for generating a suspend mode environment during execution of an artificial reality application, and presenting and controlling user interface (UI) elements within the suspend mode environment. The suspend mode feature enables a user interacting with one or more other users (or one or more avatars corresponding to the one or more other users) within an artificial reality (AR) environment to suspend the AR environment from the user's perspective. While in the suspend mode environment, the user is able to view and select the other users from the AR environment. For example, the user may select another user to friend, message, mute, block, or report that user from the suspend mode environment.

Abstract: In general, this disclosure describes a suspend mode feature for artificial reality systems and, more specifically, system configurations and techniques for generating a suspend mode environment during execution of an artificial reality application, and presenting and controlling user interface (UI) elements within the suspend mode environment. The suspend mode feature enables a user interacting with one or more other users (or one or more avatars corresponding to the one or more other users) within an artificial reality (AR) environment to suspend the AR environment from the user's perspective. While in the suspend mode environment, the user is able to view and select the other users from the AR environment. For example, the user may select another user to friend, message, mute, block, or report that user from the suspend mode environment.

Abstract: A method for texturing a surface of a substrate comprising creating micro-fractures in the surface of the substrate to be textured, and etching the surface of the substrate to be textured to open the micro-fractures.

Abstract: As a step in performing a process on a structure, a hole pattern is provided in a thin layer of organic resin masking material formed over the structure to provide a process mask. A processing step is then performed through the openings in the mask, and after a processing step is completed the mask is adjusted by a re-flow process in which the structure is placed into an atmosphere of solvent vapor of a solvent of the mask material. By way of the re-flow process, the mask material softens and re-flows to reduce the size of the openings in the mask causing edges of the surface areas on which the processing step was performed to be covered by the mask for subsequent processing steps.

Abstract: As a step in performing a process on a structure, a hole pattern is provided in a thin layer of organic resin masking material formed over the structure to provide a process mask. A processing step is then performed through the openings in the mask, and after a processing step is completed the mask is adjusted by a re-flow process in which the structure is placed into an atmosphere of solvent vapor of a solvent of the mask material. By way of the re-flow process, the mask material softens and re-flows to reduce the size of the openings in the mask causing edges of the surface areas on which the processing step was performed to be covered by the mask for subsequent processing steps.

Abstract: As a step in performing a process on a structure, a hole pattern is provided in a thin layer of organic resin masking material formed over the structure to provide a process mask. A processing step is then performed through the openings in the mask, and after a processing step is completed the mask is adjusted by a re-flow process in which the structure is placed into an atmosphere of solvent vapor of a solvent of the mask material. By way of the reflow process, the mask material softens and re-flows to reduce the size of the openings in the mask causing edges of the surface areas on which the processing step was performed to be covered by the mask for subsequent processing steps.

Abstract: A thin film of organic resin material (17), such as novolac, is used as an etch mask and openings (32) are formed in the mask in a predetermined pattern to allow processing in selected areas defined by the openings. The openings (32) are formed by applying a pattern of droplets (76) of caustic etchant, such as sodium hydroxide (NaOH) or potassium hydroxide (KOH) in the areas where the openings are to be formed. The droplets (76) are applied using a inkjet printer (90) which is scanned over the surface of the organic resin as the droplets are applied. The droplets (76) are of a size which defines the dimension of the openings (32) and allows the organic resin (17) under the droplet (76) to be completely removed. After the etchant has etched through the organic resin to expose an underlying surface (12), the etchant is washed from the organic resin and the openings (32).

Abstract: Silicon (12) is etched through a mask (11) comprising a layer of organic resin material (such as novolac) through which openings (32) are formed in the areas to be etched. The layer of organic resin is first deposited over a free surface of the device to be etched. The openings (32) are then formed by depositing droplets of a caustic etchant such as sodium hydroxide (NaOH) or potassium hydroxide (KOH) with an inkjet printer. The etchant reacts with the resin to expose the silicon surface in areas to be etched. The etching of the silicon surface is performed by applying a dilute solution of hydrofluoric acid (HF) and potassium permanganate (KMnO4) to the exposed surface through the openings in the mask to etch the silicon to a desired depth (83).

Abstract: As a step in performing a process on a structure, a hole pattern is provided in a thin layer of organic resin masking material formed over the structure to provide a process mask. A processing step is then performed through the openings in the mask, and after a processing step is completed the mask is adjusted by a re-flow process in which the structure is placed into an atmosphere of solvent vapor of a solvent of the mask material. By way of the reflow process, the mask material softens and re-flows to reduce the size of the openings in the mask causing edges of the surface areas on which the processing step was performed to be covered by the mask for subsequent processing steps.