Patents by Inventor Ling-Jen Meng

Ling-Jen Meng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist cleaning composition used in photolithography and a method for treating substrate therewith
    Patent number: 10072237
    Abstract: It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 ?m, which contains (a) quaternary ammonium hydroxide (b) a mixture of water-soluble organic solvents (c) at least one corrosion inhibitor and (d) water, and a method for treating a substrate therewith.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: September 11, 2018
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Randy Li-Kai Chang, Gene Everad Parris, Hsiu Mei Chen, Yi-Chia Lee, Wen Dar Liu, Tianniu Chen, Laura M. Matz, Ryback Li Chang Lo, Ling-Jen Meng
  • Photoresist Cleaning Composition Used in Photolithography and a Method for Treating Substrate Therewith
    Publication number: 20170037344
    Abstract: It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 ?m, which contains (a) quaternary ammonium hydroxide (b) a mixture of water-soluble organic solvents (c) at least one corrosion inhibitor and (d) water, and a method for treating a substrate therewith.
    Type: Application
    Filed: August 3, 2016
    Publication date: February 9, 2017
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Randy Li-Kai Chang, Gene Everad Parris, Hsiu Mei Chen, Yi-Chia Lee, Wen Dar Liu, Tianniu Chen, Laura M. Matz, Ryback Li Chang Lo, Ling-Jen Meng