Patents by Inventor Ling-Kai Su
Ling-Kai Su has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9184520Abstract: An electrical connector includes a base and an elastic terminal. The base has a recess. The elastic terminal is connected to the base and extends to the recess. The elastic terminal has a fixed end and a free end, the fixed end is connected to the base, and the free end is located at the recess and is curved. When the contact moves towards the recess, the contact is capable of pushing the contact protrusion to bend towards the bottom of the recess so that the free end leans against the bottom of the recess. The electrical connector may further include a contact protrusion connected to the elastic terminal. When the contact moves towards the recess, the contact is capable of pushing the contact protrusion to make the elastic terminal bend towards the bottom portion of the recess so that the free end leans against the bottom of the recess.Type: GrantFiled: April 16, 2014Date of Patent: November 10, 2015Assignee: Unimicron Technology Corp.Inventors: Chih-Peng Fan, Yin-Hwa Cheng, Ching-Ho Hsieh, Ling-Kai Su, Yung-Hao Hsueh
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Publication number: 20140335705Abstract: An electrical connector includes a base an elastic terminal and an elastic terminal. The base has a recess. The elastic terminal is connected to the base and extends to the recess. When the contact moves towards the recess, the contact is capable of pushing the contact protrusion to bend towards the bottom of the recess. In addition, the electrical connector may further include a contact protrusion connected to the elastic terminal. When the contact moves towards the recess, the contact is capable of pushing the contact protrusion to make the elastic terminal bend towards the bottom portion of the recess.Type: ApplicationFiled: July 3, 2013Publication date: November 13, 2014Inventors: Chih-Peng Fan, Yin-Hwa Cheng, Ching-Ho Hsieh, Ling-Kai Su, Yung-Hao Hsueh
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Publication number: 20140335706Abstract: An electrical connector includes a base and an elastic terminal. The base has a recess. The elastic terminal is connected to the base and extends to the recess. The elastic terminal has a fixed end and a free end, the fixed end is connected to the base, and the free end is located at the recess and is curved. When the contact moves towards the recess, the contact is capable of pushing the contact protrusion to bend towards the bottom of the recess so that the free end leans against the bottom of the recess. The electrical connector may further include a contact protrusion connected to the elastic terminal. When the contact moves towards the recess, the contact is capable of pushing the contact protrusion to make the elastic terminal bend towards the bottom portion of the recess so that the free end leans against the bottom of the recess.Type: ApplicationFiled: April 16, 2014Publication date: November 13, 2014Applicant: Unimicron Technology Corp.Inventors: Chih-Peng Fan, Yin-Hwa Cheng, Ching-Ho Hsieh, Ling-Kai Su, Yung-Hao Hsueh
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Publication number: 20130029500Abstract: The present invention provides a connector including a substrate, at least a conductive via disposed inside the substrate, a pad disposed on one surface of the substrate and electrically connected to the conductive via, a resilient flange disposed on the pad, and an anisotropic conductive adhesive interposed between the pad and the resilient flange to electrically connect the pad with the resilient flange.Type: ApplicationFiled: April 19, 2012Publication date: January 31, 2013Inventors: Chih-Peng Fan, Ling-Kai Su, Yen-Ti Chia
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Patent number: 8318411Abstract: Method for fabricating an interposer is provided. A substrate is provided having thereon at least a conductive via and at least a flange. The flange is bonded on the substrate and shades a portion of the via. A photoresist layer is formed on the interior surface of the via, on a contact surface of the flange and on an inner surface of the flange opposite to the contact surface. An opening is formed in the photoresist layer to expose a portion of the contact surface of the flange, while the photoresist layer still covers the interior surface of the via and the inner surface of the flange. A plating layer is formed on the exposed contact surface of the flange. The photoresist layer is then removed.Type: GrantFiled: July 15, 2010Date of Patent: November 27, 2012Assignee: Unimicron Technology Corp.Inventors: Chang-Ming Lee, Wen-Fang Liu, Shih-Jung Huang, Ling-Kai Su
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Patent number: 8294042Abstract: A method of manufacturing a connector is provided. Firstly, a substrate having a first surface, a second surface opposite to the first surface and a through hole is provided. Next, a first conductive layer covering the inside wall of the through hole is formed on the substrate. Then, a filler is filled in the through hole to form a filler post. Next, a conductive elastic cantilever is formed over the first surface and electrically connected to the first conductive layer. Then, a gold layer is formed on the conductive elastic cantilever and over the first surface. A solder ball electrically connected to the first conductive layer is formed over the second surface.Type: GrantFiled: July 27, 2010Date of Patent: October 23, 2012Assignee: Unimicron Technology Corp.Inventors: Chang-Ming Lee, Wen-Fang Liu, Shih-Jung Huang, Ling-Kai Su
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Patent number: 8274798Abstract: A carrier substrate includes a substrate having a chip side and a PCB side, a plurality of bond pads disposed on the chip side for bonding a chip, a plurality of land grid array (LGA) pads disposed on the PCB side, and a plurality of resilient flanges installed on the PCB side in an array manner. The plurality of resilient flanges electrically connects with the LGA pads correspondingly.Type: GrantFiled: July 28, 2010Date of Patent: September 25, 2012Assignee: Unimicron Technology Corp.Inventors: Shih-Jung Huang, Wen-Fang Liu, Ling-Kai Su
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Publication number: 20120024584Abstract: A method of manufacturing a connector is provided. Firstly, a substrate having a first surface, a second surface opposite to the first surface and a through hole is provided. Next, a first conductive layer covering the inside wall of the through hole is formed on the substrate. Then, a filler is filled in the through hole to form a filler post. Next, a conductive elastic cantilever is formed over the first surface and electrically connected to the first conductive layer. Then, a gold layer is formed on the conductive elastic cantilever and over the first surface. A solder ball electrically connected to the first conductive layer is formed over the second surface.Type: ApplicationFiled: July 27, 2010Publication date: February 2, 2012Applicant: UNIMICRON TECHNOLOGY CORP.Inventors: Chang-Ming Lee, Wen-Fang Liu, Shih-Jung Huang, Ling-Kai Su
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Publication number: 20120026708Abstract: A carrier substrate includes a substrate having a chip side and a PCB side, a plurality of bond pads disposed on the chip side for bonding a chip, a plurality of land grid array (LGA) pads disposed on the PCB side, and a plurality of resilient flanges installed on the PCB side in an array manner. The plurality of resilient flanges electrically connects with the LGA pads correspondingly.Type: ApplicationFiled: July 28, 2010Publication date: February 2, 2012Inventors: Shih-Jung Huang, Wen-Fang Liu, Ling-Kai Su
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Publication number: 20120015304Abstract: Method for fabricating an interposer is provided. A substrate is provided having thereon at least a conductive via and at least a flange. The flange is bonded on the substrate and shades a portion of the via. A photoresist layer is formed on the interior surface of the via, on a contact surface of the flange and on an inner surface of the flange opposite to the contact surface. An opening is formed in the photoresist layer to expose a portion of the contact surface of the flange, while the photoresist layer still covers the interior surface of the via and the inner surface of the flange. A plating layer is formed on the exposed contact surface of the flange. The photoresist layer is then removed.Type: ApplicationFiled: July 15, 2010Publication date: January 19, 2012Inventors: Chang-Ming Lee, Wen-Fang Liu, Shih-Jung Huang, Ling-Kai Su