Patents by Inventor Lingfei WANG

Lingfei WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11966389
    Abstract: A method (and structure and computer product) of machine translation for processing input questions includes receiving, in a processor on a computer, an input question presented in a natural language. The input question is preprocessed to find one or more condition values for possible Structured Query Language (SQL) queries. One or more possible SQL queries are enumerated based on the one or more found condition values and a paraphrasing model is used to rank the enumerated SQL queries. The highest ranked SQL query is executed against a relational database to search for a response to the input question.
    Type: Grant
    Filed: February 13, 2019
    Date of Patent: April 23, 2024
    Assignee: International Business Machines Corporation
    Inventors: Vadim Sheinin, Zhiguo Wang, Lingfei Wu, Kun Xu
  • Publication number: 20240120444
    Abstract: A light-emitting device includes a substrate, a semiconductor epitaxial structure, and an etch stop layer. The substrate has a first surface and a second surface opposite to the first surface. The semiconductor epitaxial structure has a side surface that has a roughened structure formed with protrusions, and includes a first type semiconductor layer, an active layer, and a second type semiconductor layer disposed on the first surface of the substrate in such order. The etch stop layer is disposed on a surface of the semiconductor epitaxial structure away from the substrate for preventing an etching solution from etching the semiconductor epitaxial structure. A light-emitting package and a light-emitting apparatus are also provided. A method for manufacturing a light-emitting device is also provided.
    Type: Application
    Filed: December 18, 2023
    Publication date: April 11, 2024
    Inventors: Wuqi SHEN, Die HU, Shaohua WU, Lingfei WANG, Zhendong NING, Chen Kang HSIEH, Chun-I CHANG, Duxiang WANG
  • Patent number: 11954291
    Abstract: A touch panel and a manufacturing method thereof, and a display device. An insulation layer (4) positioned between a substrate (1) and a polarizer (3) is configured to comprise a silicon nitride layer (41) and a barrier layer (42) positioned at one side of the silicon nitride layer (41) away from the substrate (1). The barrier layer (42) can serve as a covering layer that stops an ammonia gas escaped from the silicon nitride layer (41) from moving to the polarizer (3) so as to prevent fading of the polarizer. The insulation layer (4) is configured to comprise two thin layers, namely a silicon nitride layer (41) and a barrier layer (42).
    Type: Grant
    Filed: January 6, 2021
    Date of Patent: April 9, 2024
    Assignees: Chongqing BOE Display Technology Co., Ltd., BOE Technology Group Co., Ltd.
    Inventors: Lingfei Wang, Tianlong Zhao, Dawei Shi
  • Patent number: 11928156
    Abstract: Obtain, at a computing device, a segment of computer code. With a classification module of a machine learning system executing on the computing device, determine a required annotation category for the segment of computer code. With an annotation generation module of the machine learning system executing on the computing device, generate a natural language annotation of the segment of computer code based on the segment of computer code and the required annotation category. Provide the natural language annotation to a user interface for display adjacent the segment of computer code.
    Type: Grant
    Filed: November 3, 2020
    Date of Patent: March 12, 2024
    Assignee: International Business Machines Corporation
    Inventors: Dakuo Wang, Lingfei Wu, Xuye Liu, Yi Wang, Chuang Gan, Jing Xu, Xue Ying Zhang, Jun Wang, Jing James Xu
  • Publication number: 20230004244
    Abstract: A touch panel and a manufacturing method thereof, and a display device. An insulation layer (4) positioned between a substrate (1) and a polarizer (3) is configured to comprise a silicon nitride layer (41) and a barrier layer (42) positioned at one side of the silicon nitride layer (41) away from the substrate (1). The barrier layer (42) can serve as a covering layer that stops an ammonia gas escaped from the silicon nitride layer (41) from moving to the polarizer (3) so as to prevent fading of the polarizer. The insulation layer (4) is configured to comprise two thin layers, namely a silicon nitride layer (41) and a barrier layer (42).
    Type: Application
    Filed: January 6, 2021
    Publication date: January 5, 2023
    Inventors: Lingfei WANG, Tianlong ZHAO, Dawei SHI
  • Patent number: 11215652
    Abstract: A method for obtaining a contact resistance of a planar device includes: obtaining a contact resistance of a planar device by using a potential measurement method, in the measurement of the surface potential distribution, the planar device is in a state of current flowing, a certain voltage drop is formed at a junction area of the device; extracting the voltage drop measured through the Kelvin microscope by using a linear fitting method; and dividing the measured voltage drop by the current flowing through the device, thereby accurately calculating the magnitude of the contact resistance at the junction area of the planar device. With the present invention, the contact resistance of the planar device can be precisely measured, which is suitable for the contact resistance measurement experiments of devices such as thin film transistors and diodes.
    Type: Grant
    Filed: December 25, 2015
    Date of Patent: January 4, 2022
    Assignee: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
    Inventors: Guangwei Xu, Zhiheng Han, Wei Wang, Congyan Lu, Lingfei Wang, Ling Li, Ming Liu
  • Publication number: 20210165027
    Abstract: A method for obtaining a contact resistance of a planar device includes: obtaining a contact resistance of a planar device by using a potential measurement method, in the measurement of the surface potential distribution, the planar device is in a state of current flowing, a certain voltage drop is formed at a junction area of the device; extracting the voltage drop measured through the Kelvin microscope by using a linear fitting method; and dividing the measured voltage drop by the current flowing through the device, thereby accurately calculating the magnitude of the contact resistance at the junction area of the planar device. With the present invention, the contact resistance of the planar device can be precisely measured, which is suitable for the contact resistance measurement experiments of devices such as thin film transistors and diodes.
    Type: Application
    Filed: December 25, 2015
    Publication date: June 3, 2021
    Inventors: Guangwei XU, Zhiheng HAN, Wei WANG, Congyan LU, Lingfei WANG, Ling LI, Ming LIU
  • Patent number: 10971690
    Abstract: Embodiments of the present disclosure provide for solar cells including an organometallic halide perovskite monocrystalline film (see FIG. 1.1B), other devices including the organometallic halide perovskite monocrystalline film, methods of making organometallic halide perovskite monocrystalline film, and the like.
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: April 6, 2021
    Assignee: KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Osman M. Bakr, Wei Peng, Lingfei Wang
  • Publication number: 20180248142
    Abstract: Embodiments of the present disclosure provide for solar cells including an organometallic halide perovskite monocrystalline film (see FIG. 1.1B), other devices including the organometallic halide perovskite monocrystalline film, methods of making organometallic halide perovskite monocrystalline film, and the like.
    Type: Application
    Filed: August 15, 2016
    Publication date: August 30, 2018
    Inventors: Osman M. BAKR, Wei PENG, Lingfei WANG