Abstract: To provide a processor and a processing method to make the operation to load and unload workpieces to and from a processing chamber more efficient, and improve workpiece processing efficiency.

Abstract: In one embodiment, a method (e.g., a method for forming one or more semiconductor layers on a device) includes modifying a first side of a first semiconductor body inside of a processing system to at least partially manufacture one or more photovoltaic modules; flipping the first semiconductor body over inside the processing system; and modifying an opposite, second side of the first semiconductor body inside of the processing system to continue fabrication of the one or more photovoltaic cells, wherein modifying at least one of the first side or second side of the first semiconductor body is performed in at least one of a reduced pressure or increased temperature environment of the processing system and flipping the first semiconductor body is performed without removing the first semiconductor body from the processing system.

Abstract: A showerhead for a plasma process apparatus for processing substrates, comprising a showerhead body comprising a top plate and a bottom plate defining a cavity in between; a gas inlet formed in the top plate; a perforated plate positioned between the top plate and the bottom plate and dissecting the cavity into an upper gas compartment and a lower gas compartment; and, wherein the bottom plate comprises a plurality of elongated diffusion slots on its lower surface and a plurality of diffusion holes on its upper surface, each of the diffusion holes making fluid connection from the lower gas compartment to more than one of the diffusion slots.

Abstract: To provide a processor and a processing method to make the operation to load and unload workpieces to and from a processing chamber more efficient, and improve workpiece processing efficiency.

Abstract: A showerhead for a plasma process apparatus for processing substrates, comprising a showerhead body comprising a top plate and a bottom plate defining a cavity in between; a gas inlet formed in the top plate; a perforated plate positioned between the top plate and the bottom plate and dissecting the cavity into an upper gas compartment and a lower gas compartment; and, wherein the bottom plate comprises a plurality of elongated diffusion slots on its lower surface and a plurality of diffusion holes on its upper surface, each of the diffusion holes making fluid connection from the lower gas compartment to more than one of the diffusion slots.