Abstract: Embodiments of the present disclosure disclose a Cupriavidus metallidurans CML2, wherein the Cupriavidus metallidurans CML2 is deposited in the China Center for Type Culture Collection with a depository number CCTCC NO: M20231365, and a 16s rDNA of the Cupriavidus metallidurans CML2 has a nucleotide sequence of SEQ ID No. 1.

Abstract: A method of fabricating a nanodevice includes providing a nanowire having a first portion and a second portion. The nanowire has a polymer coating. A nanostructure is provided that is proximate to the second portion of the nanowire. Solely the first portion of the nanowire is irradiated with near-infrared radiation, thereby exciting the first portion to generate ultraviolet radiation. The generated ultraviolet radiation is guided from the first portion along the nanowire toward the second portion, so that a region of the polymer coating on the second portion is polymerized and bonds the nanostructure to the nanowire.

Abstract: A method and system for photolithography is provided. The system includes a photoresist comprising a photoinitiator and a prepolymer resin. The system further includes a first light source operable to generate at least a first beam of light which is focused on a first area of the photoresist. The first beam of light is configured to excite the photoinitiator. The system further includes a second light source operable to generate at least a second beam of light which is focused on a second area of the photoresist, the second beam of light configured to deactivate at least temporarily the photoinitiator excited by the first beam of light. The first area and second area overlap at least partially. A time difference of at least 10 ns exists between the photoinitiator being excited by the first beam of light and the photoinitiator initiating polymerization.

Abstract: A method of fabricating a nanodevice includes providing a nanowire having a first portion and a second portion. The nanowire has a polymer coating. A nanostructure is provided that is proximate to the second portion of the nanowire. Solely the first portion of the nanowire is irradiated with near-infrared radiation, thereby exciting the first portion to generate ultraviolet radiation. The generated ultraviolet radiation is guided from the first portion along the nanowire toward the second portion, so that a region of the polymer coating on the second portion is polymerized and bonds the nanostructure to the nanowire.

Abstract: The present invention relates to polymers and their use in coating metal nanorods (especially gold nanorods), and to the coated nanorods compositions. In particular, the invention relates to a process for forming cetyltrimethylammonium bromide (CTAB)-coated gold nanorods and to such coated nanorods that additionally comprise an external cross-linked polymer coating.

Abstract: A method and system for photolithography is provided. The system includes a photoresist comprising a photoinitiator and a prepolymer resin. The system further includes a first light source operable to generate at least a first beam of light which is focused on a first area of the photoresist. The first beam of light is configured to excite the photoinitiator. The system further includes a second light source operable to generate at least a second beam of light which is focused on a second area of the photoresist, the second beam of light configured to deactivate at least temporarily the photoinitiator excited by the first beam of light. The first area and second area overlap at least partially. A time difference of at least 10 ns exists between the photoinitiator being excited by the first beam of light and the photoinitiator initiating polymerization.