Patents by Inventor Linni Wei

Linni Wei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for post-routing lithography-hotspot correction of a layout
    Patent number: 8037428
    Abstract: One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database.
    Type: Grant
    Filed: May 29, 2008
    Date of Patent: October 11, 2011
    Assignee: Synopsys, Inc.
    Inventors: Yang-Shan Tong, Daniel Zhang, Linni Wei, Alex Miloslavsky, Wei-Chih Tseng, Zongwu Tang
  • METHOD AND SYSTEM FOR POST-ROUTING LITHOGRAPHY-HOTSPOT CORRECTION OF A LAYOUT
    Publication number: 20090300561
    Abstract: One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database.
    Type: Application
    Filed: May 29, 2008
    Publication date: December 3, 2009
    Applicant: SYNOPSYS, INC.
    Inventors: Yang-Shan Tong, Daniel Zhang, Linni Wei, Alex Miloslavsky, Wei-Chih Tseng, Zongwu Tang