Abstract: Mask simulation tools are typically extremely complicated to learn and to use effectively. Therefore, providing access to a mask simulation tool over a wide area network (WAN) to multiple on-line users can be very cost effective. Specifically, in a network-based simulation server, multiple users can view the same mask image, simulations, and analysis results and provide real-time comments to each other as simulation and analysis are performed, thereby encouraging invaluable problem-solving dialogue among users. The user interface for this mask simulation tool can advantageously facilitate this dialogue. For example, the user interface can include an enter box for a user to enter a message and a talk box for capturing any message sent by any user of the simulation tool using the enter box.

Abstract: A simulated wafer image of a physical mask and a defect-free reference image are used to generate a severity score for each defect, thereby giving a customer meaningful information to accurately assess the consequences of using a mask or repairing that mask. The defect severity score is calculated based on a number of factors relating to the changes in critical dimensions of the neighbor features to the defect. A common process window can also be used to provide objective information regarding defect printability. Certain other aspects of the mask relating to mask quality, such as line edge roughness and contact corner rounding, can also be quantified by using the simulated wafer image of the physical mask.

Abstract: A simulated wafer image of a physical mask and a defect-free reference image are used to generate a severity score for each defect, thereby giving a customer meaningful information to accurately assess the consequences of using a mask or repairing that mask. The defect severity score is calculated based on a number of factors relating to the changes in critical dimensions of the neighbor features to the defect. A common process window can also be used to provide objective information regarding defect printability. Certain other aspects of the mask relating to mask quality, such as line edge roughness and contact corner rounding, can also be quantified by using the simulated wafer image of the physical mask.

Abstract: A simulated wafer image of a physical mask and a defect-free reference image are used to generate a severity score for each defect, thereby giving a customer meaningful information to accurately assess the consequences of using a mask or repairing that mask. The defect severity score is calculated based on a number of factors relating to the changes in critical dimensions of the neighbor features to the defect. A common process window can also be used to provide objective information regarding defect printability. Certain other aspects of the mask relating to mask quality, such as line edge roughness and contact corner rounding, can also be quantified by using the simulated wafer image of the physical mask.

Abstract: To exam mask defect impact during the transfer of a mask pattern to a wafer layer, tools can use mask images obtained during mask inspection. Specifically, these tools can also use optical models of such mask images to simulate wafer images. However, when feature sizes become very small, optical models may not provide sufficiently accurate simulation results. Using a photoresist model would yield significantly more accurate simulation results than using an optical model. Unfortunately, resist modeling is very slow, thereby making it commercially impractical. A simulation tool can generate a simulated wafer image having the accuracy of a photoresist model with the speed of an optical model by using a threshold look-up table. In one embodiment, the threshold look-up table could include variables such as feature size, pitch size, feature type, and defect type.

Abstract: Defect printability analysis in a mask or wafer requires the accurate identification of defect images and reference (i.e. defect-free) images, in particular for a die-to-die inspection mode. A method of automatically distinguishing a reference image from a defect image is provided. In this method, multiple images can be accessed and aligned. Then, a common area of the multiple images can be defined. At this point, a complexity of each of the images, as defined by the common area, can be computed. Advantageously, by comparing the complexity of the multiple images, the reference and defect images can be quickly and accurately designated. Specifically, the most complex image is designated the defect image because the defect image must describe the defect. Complexity can be computed using various techniques.

Abstract: Masks that include optical proximity correction or phase shifting regions are increasingly being used in the manufacturing process. These masks, either initially or after repair, can have “soft” defects, e.g. phase and/or transmission defects. In accordance with one feature of the invention, soft defect information can be computed from standard test images of a mask. This soft defect information can be used to generate an accurate simulated wafer image, thereby providing valuable defect impact information to a user. Knowing the impact of the soft defect can enable a user to make better decisions regarding the mask. Specifically, a user can now with confidence accept the mask for the desired lithographic process, repair the mask at certain critical locations, or reject the mask, all without exposing a wafer.

Abstract: Serious defects on a mask can compromise the functionality of the integrated circuits formed on the wafer. Nuisance defects, which do not affect the functionality, waste expensive resources. A defect analysis tool with job-based automation can accurately and efficiently determine defect printability. This tool can run a job, using a mask file, to simulate the wafer exposure that the mask would provide under a given set of parameters. These parameters can relate to the mask itself, the inspection system used to create the mask file, and the stepper that can be used to expose the mask. The processes performed during the job can be done uniformly for defects on the mask. This uniformity allows the tool to efficiently run multiple jobs. The results of the job can be presented using different levels of detail to facilitate user review.

Abstract: A medical diagnostic ultrasound imaging system aligns substantially co-planar two-dimensional images to form an extended field of view using improved compounding methods. Compounding with a finite impulse response is used for more versatile compositing. The compounding is adaptive, such as through adapting the image regions, weighting, or type of compounding as a function of correlation, location within the image, estimated motion or combinations thereof. A user warning is provided as a function of the correlation between images.

Abstract: Mask simulation tools are typically extremely complicated to learn and to use effectively. Therefore, providing access to a mask simulation tool over a wide area network (WAN) to multiple on-line users can be very cost effective. Specifically, in a network-based simulation server, multiple users can view the same mask image, simulations, and analysis results and provide real-time comments to each other as simulation and analysis are performed, thereby encouraging invaluable problem-solving dialogue among users. The user interface for this mask simulation tool can advantageously facilitate this dialogue. For example, the user interface can include an enter box for a user to enter a message and a talk box for capturing any message sent by any user of the simulation tool using the enter box.

Abstract: A mask defect printability simulation server provides simulations, one-dimensional analysis, and reports to multiple clients over a wide area network, such as the Internet. This network-based simulation server allows a client to leverage a core of highly-trained engineers. Additionally, the network-based simulation server can be easily supported since only a single source for the tools associated with the simulation server is necessary for multiple clients. A client can access the simulation server using a standard personal computer having a browser, thereby eliminating the need for client to maintain an expensive database for the server. Finally, in the network-based simulation server, multiple users can view the same mask defect image and provide real-time comments to each other as simulation and analysis are performed on the defect image, thereby encouraging problem solving and decision-making dialogue among the users.

Abstract: A reference image is generated from a subject image of at least a portion of a photolithography mask to enable a photolithography mask inspection and analysis system that otherwise cannot generate a reference image from a reference die or digitized design data, for example, to perform a mask analysis using the reference image. A mask inspection and analysis system may then be enhanced to perform one or more additional mask analyses to analyze the mask. The reference image is generated by identifying a defect or contaminant of the mask in the subject image and modifying the subject image to remove the defect or contaminant from the mask to generate the reference image. For one embodiment, a system using a STARlight inspection tool that captures transmitted and reflected images of a portion of a mask may then be enhanced to perform one or more mask analyses that use a reference image.

Abstract: A medical diagnostic ultrasonic imaging system acquires image data for at least two frames at each of multiple positions, each frame identified with a respective phase of a physiological cycle. A multiphase 3-D or extended field of view data set is constructed from the image data. Then a plurality of images are generated from the multiphase data set. Each image is associated with a respective phase of the physiological cycle, and these images are displayed in sequence to a user. The acquired sequence of image frames is synchronized by adding frames to the sequence in portions of the sequence characterized by a low number of image frames per period of the physiological cycle, and by removing image frames from portions of the sequence characterized by an excessive number of frames per period of the physiological cycle.

Abstract: Medical diagnostic ultrasound methods and systems for automated structure analysis are provided. Where the vessel bifurcates, such as the carotid artery, the common portion (i.e. the bifurcation bulb) is divided between the branches. For example, the common portion is divided as a function of a ratio of (1) the integral of ultrasound flow data at a cross-section of a first branch to (2) the integral of ultrasound flow data at a cross-section of a second branch. As another example, the intersection of three-dimensional surfaces perpendicular to the center axis of each branch within the common area divides the common portion. The ultrasound data representing the common portion is associated with each branch as a function of the division. This association assists with flow and structural analysis. For use with the bifurcation division discussed above or for other vessels, a method and system for automatically assigning a center (i.e. medial) axis of the vessel is provided.

Abstract: A simulated wafer image of a physical mask and a defect-free reference image are used to generate a severity score for each defect, thereby giving a customer meaningful information to accurately assess the consequences of using a mask or repairing that mask. The defect severity score is calculated based on a number of factors relating to the changes in critical dimensions of the neighbor features to the defect. A common process window can also be used to provide objective information regarding defect printability. Certain other aspects of the mask relating to mask quality, such as line edge roughness and contact corner rounding, can also be quantified by using the simulated wafer image of the physical mask.

Abstract: A simulated wafer image of a physical mask and a defect-free reference image are used to generate a severity score for each defect, thereby giving a customer meaningful information to accurately assess the consequences of using a mask or repairing that mask. The defect severity score is calculated based on a number of factors relating to the changes in critical dimensions of the neighbor features to the defect. A common process window can also be used to provide objective information regarding defect printability. Certain other aspects of the mask relating to mask quality, such as line edge roughness and contact corner rounding, can also be quantified by using the simulated wafer image of the physical mask.

Abstract: A method and system for mapping surface data onto a geometrical representation of a structure for 3D imaging is provided. A boundary of a structure is determined from one type of data, such as Doppler energy data. Another type of data, such as B-mode data, representing the boundary or an area adjacent the boundary is extracted or identified. The B-mode data is then rendered as a function of the boundary, such as by texture mapping the B-mode data onto or adjacent the boundary. As the user examines the structure representation, the texture mapped data may provide texture details based on an optimally determined representation. The boundary may alternatively be used to select data for volume rendering.

Abstract: A medical diagnostic ultrasound imaging system aligns substantially co-planar two-dimensional images to form an extended field of view using improved compounding methods. Compounding with a finite impulse response is used for more versatile compositing. The compounding is adaptive, such as through adapting the image regions, weighting, or type of compounding as a function of correlation, location within the image, estimated motion or combinations thereof. A user warning is provided as a function of the correlation between images.

Abstract: A system for editing a 3-D medical diagnostic ultrasound image dataset displays both a 3-D reconstruction of the dataset and an editing object. A user moves the editing object relative to the 3-D reconstruction with a six degrees of freedom input device that allows the user to control both the position and the orientation of the editing object. The 3-D reconstruction and the associated 3-D dataset are edited to reduce opacity of a portion of a 3-D reconstruction on a selected side of the editing object. The disclosed editing system is fast, efficient and intuitive, and it allows the user to designate the portions of the 3-D dataset to be removed simply and reliably.

Abstract: An medical diagnostic ultrasonic image processing method estimates motion between first and second composite ultrasonic images that include both B-mode and Color Doppler information. First and second B-mode images are extracted from the first and second composite ultrasonic images, respectively, and then motion is estimated between the first and second B-mode images. The estimated motion is then used to compose a multi-frame image using at least portions of the composite ultrasonic images or derivatives of the composite ultrasonic images, such as the B-mode images.