Patents by Inventor Lisi Xie

Lisi Xie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Directional deposition in etch chamber
    Patent number: 11742212
    Abstract: Methods for forming a vertical growth mask for use in etching applications are described herein. Disclosed embodiments include introducing a tungsten-containing deposition precursor and one or more carrier gases while igniting a plasma to deposit tungsten selectively on field regions of positive features of a patterned etch mask without substantial deposition on sidewalls of the positive features or on an exposed surface of a target layer underlying the patterned etch mask.
    Type: Grant
    Filed: October 29, 2019
    Date of Patent: August 29, 2023
    Assignee: Lam Research Corporation
    Inventors: Zhongkui Tan, Lisi Xie, Yoko Yamaguchi, Yasushi Ishikawa, Patrick Ponath, Sung Jin Jung, Sangjun Park, Wonchul Lee, Jayoung Choi
  • DIRECTIONAL DEPOSITION IN ETCH CHAMBER
    Publication number: 20220028697
    Abstract: Methods for forming a vertical growth mask for use in etching applications are described herein. Disclosed embodiments include introducing a tungsten-containing deposition precursor and one or more carrier gases while igniting a plasma to deposit tungsten selectively on field regions of positive features of a patterned etch mask without substantial deposition on sidewalls of the positive features or on an exposed surface of a target layer underlying the patterned etch mask.
    Type: Application
    Filed: October 29, 2019
    Publication date: January 27, 2022
    Inventors: Zhongkui Tan, Lisi Xie, Yoko Yamaguchi, Yasushi Ishikawa, Patrick Ponath, Sung Jin Jung, Sangjun Park, Wonchul Lee, Jayoung Choi