Abstract: Integrated rotary structure and fabrication method thereof are provided. An integrated rotary structure includes a cylinder material. The cylinder material includes a circular side wall, a third surface at one end of the circular side wall and a fourth surface at another end of the circular side wall opposing to the third surface. The third surface of the cylinder material is machined to form an elliptical reflective surface. The circular side wall of the cylinder material is machined to form a fifth surface and a sixth surface. A central symmetrical axis of the fifth surface and the sixth surface coincides with a first optical axis of the elliptical reflective surface. By using the fifth surface and the sixth surface as holding planes, the third surface is machined to form a curved non-reflective surface surrounding the elliptical reflective surface.

Abstract: A substrate alignment device includes a plurality of state detection units, each of which is configured to move from a standby position to a detection position for detecting a positional state of a substrate and return back from the detection position back to the standby position, and a multidimensional robot arm configured to receive and support the substrate, transfer the substrate to a substrate detection site, and adjust the substrate in at least one orientation or position according to the detected positional state of the substrate to position the substrate to a target position for overlay mark measurements.

Abstract: Calibrating apparatus and method for correcting aberrations in an extreme ultraviolet (EUV) light source are provided.

Abstract: Calibrating apparatus and method for correcting aberrations in an extreme ultraviolet (EUV) light source are provided.

Abstract: The present disclosure provides apparatus and methods for overlay measurement. An exemplary overlay measurement apparatus includes an illuminating unit, configured to generate light to illuminate a first overlay marker having a first sub-overlay marker along a first direction and a second overlay marker along a second direction; a first measuring unit, configured to receive light reflected from the first overlay marker to cause the reflected light to laterally shift and shear to generate interference light, to receive the interference light to form a first image and to determine existence of overlay offsets along the first direction and the second direction and values of the overlay offset; and a first drive unit connected to the first measuring unit, and configured to drive the first measuring unit to rotate from a first position to a second position to measure the first sub-overlay marker and the second sub-overlay marker, respectively.

Abstract: Integrated rotary structure and fabrication method thereof are provided. An integrated rotary structure includes a cylinder material. The cylinder material includes a circular side wall, a third surface at one end of the circular side wall and a fourth surface at another end of the circular side wall opposing to the third surface. The third surface of the cylinder material is machined to form an elliptical reflective surface. The circular side wall of the cylinder material is machined to form a fifth surface and a sixth surface. A central symmetrical axis of the fifth surface and the sixth surface coincides with a first optical axis of the elliptical reflective surface. By using the fifth surface and the sixth surface as holding planes, the third surface is machined to form a curved non-reflective surface surrounding the elliptical reflective surface.

Abstract: The present disclosure provides an extreme ultraviolet (EUV) light source. The EUV light source includes a droplet array with a plurality of nozzles arranged along a straight scanning direction, the plurality of nozzle sequentially and intermittently ejecting droplets downward to a radiating position; a laser source configured to generate at least two laser beams and scan the at least two laser beams along the straight scanning direction, the at least two laser beams alternately bombarding droplets arriving at the radiating position to form EUV light; and a condenser with a condenser mirror having a reflective ellipsoidal surface, configured to collect the EUV light and converge collected EUV light at a center of focus.

Abstract: A substrate alignment device includes a plurality of state detection units, each of which is configured to move from a standby position to a detection position for detecting a positional state of a substrate and return back from the detection position back to the standby position, and a multidimensional robot arm configured to receive and support the substrate, transfer the substrate to a substrate detection site, and adjust the substrate in at least one orientation or position according to the detected positional state of the substrate to position the substrate to a target position for overlay mark measurements.

Abstract: In some embodiments of the disclosed subject matter, an extreme ultraviolet (EUV) light source is provided. The EUV light source comprises: a droplet nozzle array droplet nozzle array comprising multiple nozzles arranged in a ring, the nozzles are configured for sequentially ejecting droplets towards an annular radiation position; a laser source for generating a laser beam, wherein the laser beam is controlled to rotate and sequentially bombard the droplets that reach the annular radiation position; and an integrated rotary structure located between the droplet nozzle array and the laser source, the integrated rotary structure includes: a condenser mirror comprising a first surface and a second surface opposing to the first surface, and a motor driving shaft that is integrally connected with the condenser mirror.

Abstract: The present disclosure provides apparatus and methods for overlay measurement. An exemplary overlay measurement apparatus includes an illuminating unit configured to generate illuminating light to illuminate a first overlay marker formed on a wafer to generate reflected light; and a first measuring unit configured to receive the reflected light from the first overlay marker to cause the reflected light to laterally shift and shear to generate interference light, to receive the interference light to form a first image, and to determine existence of an overlay offset and an exact value of the overlay offset, according to the first image.

Abstract: An extreme ultraviolet (EUV) light source is provided. The EUV light source comprises a spray nozzle array having a plurality of spray nozzles configured to spray a plurality of rows of droplets to an irradiating position; a laser source configured to generate a first laser beam and a second laser beam and cause the first laser beam and the second laser beam to alternately bombard the rows of droplets to generate EUV light with increased output power; a focusing mirror having at least two first sub-focusing mirrors and at least two second sub-focusing mirrors; and a first driving device having at least two first sub-driving device and at least two second sub-driving device, each of first driving devices driving one of the first sub-focusing mirrors and each of the second sub-driving devices driving one of the second sub-focusing mirrors.

Abstract: In some embodiments of the disclosed subject matter, an extreme ultraviolet (EUV) light source is provided. The EUV light source comprises: a droplet nozzle array droplet nozzle array comprising multiple nozzles arranged in a ring, the nozzles are configured for sequentially ejecting droplets towards an annular radiation position; a laser source for generating a laser beam, wherein the laser beam is controlled to rotate and sequentially bombard the droplets that reach the annular radiation position; and an integrated rotary structure located between the droplet nozzle array and the laser source, the integrated rotary structure includes: a condenser mirror comprising a first surface and a second surface opposing to the first surface, and a motor driving shaft that is integrally connected with the condenser mirror.

Abstract: The present disclosure provides apparatus and methods for overlay measurement. An exemplary overlay measurement apparatus includes an illuminating unit, configured to generate light to illuminate a first overlay marker having a first sub-overlay marker along a first direction and a second overlay marker along a second direction; a first measuring unit, configured to receive light reflected from the first overlay marker to cause the reflected light to laterally shift and shear to generate interference light, to receive the interference light to form a first image and to determine existence of overlay offsets along the first direction and the second direction and values of the overlay offset; and a first drive unit connected to the first measuring unit, and configured to drive the first measuring unit to rotate from a first position to a second position to measure the first sub-overlay marker and the second sub-overlay marker, respectively.

Abstract: The present disclosure provides apparatus and methods for overlay measurement. An exemplary overlay measurement apparatus includes an illuminating unit configured to generate illuminating light to illuminate a first overlay marker formed on a wafer to generate reflected light; and a first measuring unit configured to receive the reflected light from the first overlay marker to cause the reflected light to laterally shift and shear to generate interference light, to receive the interference light to form a first image, and to determine existence of an overlay offset and an exact value of the overlay offset, according to the first image.

Abstract: An extreme ultraviolet (EUV) light source is provided. The EUV light source comprises a spray nozzle array having a plurality of spray nozzles configured to spray a plurality of rows of droplets to an irradiating position. The EUV light source also includes a laser source having a first reflective mirror and a second reflective mirror configured to generate a first laser beam and a second laser beam, and to cause the first laser beam and the second laser beam to sequentially bombard the plurality of droplets arriving at the irritating position to generate EUV light with increased output power. Further, the EUV light source includes a light focusing device a light focusing device comprising a first partial focusing mirror and a second partial focusing mirror configured to perform a rotating scanning to collect EUV light and focus the collected EUV light at a central focusing point.

Abstract: The present disclosure provides an extreme ultraviolet (EUV) light source. The EUV light source includes a droplet array with a plurality of nozzles arranged along a straight scanning direction, the plurality of nozzle sequentially and intermittently ejecting droplets downward to a radiating position; a laser source configured to generate at least two laser beams and scan the at least two laser beams along the straight scanning direction, the at least two laser beams alternately bombarding droplets arriving at the radiating position to form EUV light; and a condenser with a condenser mirror having a reflective ellipsoidal surface, configured to collect the EUV light and converge collected EUV light at a center of focus.

Abstract: An extreme ultraviolet (EUV) light source is provided. The EUV light source comprises a spray nozzle array having a plurality of spray nozzles configured to spray a plurality of rows of droplets to an irradiating position; a laser source configured to generate a first laser beam and a second laser beam and cause the first laser beam and the second laser beam to alternately bombard the rows of droplets to generate EUV light with increased output power; a focusing mirror having at least two first sub-focusing mirrors and at least two second sub-focusing mirrors; and a first driving device having at least two first sub-driving device and at least two second sub-driving device, each of first driving devices driving one of the first sub-focusing mirrors and each of the second sub-driving devices driving one of the second sub-focusing mirrors.

Abstract: An extreme ultraviolet (EUV) light source is provided. The EUV light source comprises a spray nozzle array having a plurality of spray nozzles configured to spray a plurality of rows of droplets to an irradiating position. The EUV light source also includes a laser source having a first reflective mirror and a second reflective mirror configured to generate a first laser beam and a second laser beam, and to cause the first laser beam and the second laser beam to sequentially bombard the plurality of droplets arriving at the irritating position to generate EUV light with increased output power. Further, the EUV light source includes a light focusing device a light focusing device comprising a first partial focusing mirror and a second partial focusing mirror configured to perform a rotating scanning to collect EUV light and focus the collected EUV light at a central focusing point.