Abstract: A bubble removing system and a bubble removing method are provided. The bubble removing system comprises a main bubble removing apparatus which comprises a first enclosed container, a first fluid lead-in pipe, a first fluid lead-out pipe, and a bubble collecting member. The cross section of the inner cavity of the first enclosed container is circular, and the first enclosed container is used for accommodating a fluid substance. The first fluid lead-in pipe passes through a sidewall of the first enclosed container, is tangent to the inner cavity wall of the first enclosed container, and is disposed at the upper part of the first enclosed container. The first fluid lead-out pipe passes through the sidewall of the first enclosed container and is disposed at the lower part of the first enclosed container.

Abstract: A spraying device, which includes a spraying mechanism and a rotating mechanism is disclosed. The rotating mechanism includes a rotating sidewall, which sidewall is provided with multiple sets of spraying holes arranged along the circumference of the rotating sidewall. Each set of spraying holes includes a plurality of spraying holes, and the spraying holes of at least two adjacent sets of spraying holes are arranged in a staggered arrangement. The spraying mechanism includes an infusion channel, the sidewall of which is provided with a spraying spout. The infusion channel extends along the inside of the rotating sidewall, the rotating sidewall being configured to rotate or swing with respect to the spraying spout of the infusion channel.

Abstract: The disclosure provides in some embodiments a method for fabricating a photoresist pattern, a color filter and a method for fabricating the same, and a display device. The method for fabricating a photoresist pattern includes coating negative photoresist on a base substrate to form a first photoresist layer, coating positive photoresist on the first photoresist layer to form a second photoresist layer, conducting a first exposure process on first regions of the second photoresist layer, conducting a first developing process to remove the positive photoresist within the first regions of the second photoresist layer and the negative photoresist within second regions of the first photoresist layer, so as to obtain a first photoresist pattern and a second photoresist pattern, conducting a second exposure process on the first photoresist pattern and the second photoresist pattern, and conducting a second developing process to remove the first photoresist pattern.

Abstract: A spraying device, which includes a spraying mechanism and a rotating mechanism is disclosed. The rotating mechanism includes a rotating sidewall, which sidewall is provided with multiple sets of spraying holes arranged along the circumference of the rotating sidewall. Each set of spraying holes includes a plurality of spraying holes, and the spraying holes of at least two adjacent sets of spraying holes are arranged in a staggered arrangement. The spraying mechanism includes an infusion channel, the sidewall of which is provided with a spraying spout. The infusion channel extends along the inside of the rotating sidewall, the rotating sidewall being configured to rotate or swing with respect to the spraying spout of the infusion channel.

Abstract: A bubble removing system and a bubble removing method are provided. The bubble removing system comprises a main bubble removing apparatus which comprises a first enclosed container, a first fluid lead-in pipe, a first fluid lead-out pipe, and a bubble collecting member. The cross section of the inner cavity of the first enclosed container is circular, and the first enclosed container is used for accommodating a fluid substance. The first fluid lead-in pipe passes through a sidewall of the first enclosed container, is tangent to the inner cavity wall of the first enclosed container, and is disposed at the upper part of the first enclosed container. The first fluid lead-out pipe passes through the sidewall of the first enclosed container and is disposed at the lower part of the first enclosed container.

Abstract: The disclosure provides in some embodiments a method for fabricating a photoresist pattern, a color filter and a method for fabricating the same, and a display device. The method for fabricating a photoresist pattern includes coating negative photoresist on a base substrate to form a first photoresist layer, coating positive photoresist on the first photoresist layer to form a second photoresist layer, conducting a first exposure process on first regions of the second photoresist layer, conducting a first developing process to remove the positive photoresist within the first regions of the second photoresist layer and the negative photoresist within second regions of the first photoresist layer, so as to obtain a first photoresist pattern and a second photoresist pattern, conducting a second exposure process on the first photoresist pattern and the second photoresist pattern, and conducting a second developing process to remove the first photoresist pattern.