Abstract: A multiple silicon trenches forming method and an etching mask structure, the method comprises: step S11, providing a MEMS sealing cap silicon substrate (100); step S12, forming n stacked mask layers (101, 102, 103) on the MEMS sealing cap silicon substrate (100), after forming each mask layer, photolithographing and etching the mask layer and all other mask layers beneath the same to form a plurality of etching windows (D1, D2, D3); step S13, etching the MEMS sealing cap silicon substrate by using the current uppermost mask layer and a layer of mask material beneath the same as a mask; step S14, removing the current uppermost mask layer; step S15, repeating the step S13 and the step S14 until all the n mask layers are removed.

Abstract: A multiple silicon trenches forming method and an etching mask structure, the method comprises: step S11, providing a MEMS sealing cap silicon substrate (100); step S12, forming n stacked mask layers (101, 102, 103) on the MEMS sealing cap silicon substrate (100), after forming each mask layer, photolithographing and etching the mask layer and all other mask layers beneath the same to form a plurality of etching windows (D1, D2, D3); step S13, etching the MEMS sealing cap silicon substrate by using the current uppermost mask layer and a layer of mask material beneath the same as a mask; step S14, removing the current uppermost mask layer; step S15, repeating the step S13 and the step S14 until all the n mask layers are removed.

Abstract: A structural reinforcement for an article including a carrier (10) that includes: (i) a mass of polymeric material (12) having an outer surface; and (ii) at least one fibrous composite insert (14) or overlay (980) having an outer surface and including at least one elongated fiber arrangement (e.g., having a plurality of ordered fibers). The fibrous insert (14) or overlay (960) is envisioned to adjoin the mass of the polymeric material in a predetermined location for carrying a predetermined load that is subjected upon the predetermined location (thereby effectively providing localized reinforcement to that predetermined location). The fibrous insert (14) or overlay (960) and the mass of polymeric material (12) are of compatible materials, structures or both, for allowing the fibrous insert or overlay to be at least partially joined to the mass of the polymeric material. Disposed upon at least a portion of the carrier (10) may be a mass of activatable material (128).

Abstract: A structural reinforcement for a vehicle comprising: a) a carrier having a base wall from which a plurality of projections extend, the plurality of projections including at least one first projection and at least one second projection and the at least one first projection having a height greater than a height of the at least one second projection; b) an activatable material which is heat activatable and affixed to the carrier, configured to secure the carrier in a cavity of the vehicle; wherein in event of an impact, the at least one first projection and second projection are configured to deform toward the base wall and/or in a direction of an impact load in response to the impact load; and the at least one first projection is configured to receive the impact load and deform before the at least one second projection receives the impact load and deforms.

Abstract: A structural reinforcement for a vehicle comprising: a) a carrier having a base wall from which a plurality of projections extend, the plurality of projections including at least one first projection and at least one second projection and the at least one first projection having a height greater than a height of the at least one second projection; b) an activatable material which is heat activatable and affixed to the carrier, configured to secure the carrier in a cavity of the vehicle; wherein in event of an impact, the at least one first projection and second projection are configured to deform toward the base wall and/or in a direction of an impact load in response to the impact load; and the at least one first projection is configured to receive the impact load and deform before the at least one second projection receives the impact load and deforms.

Abstract: A multiple silicon trenches forming method and an etching mask structure, the method comprises: step S11, providing a MEMS sealing cap silicon substrate (100); step S12, forming n stacked mask layers (101, 102, 103) on the MEMS sealing cap silicon substrate (100), after forming each mask layer, photolithographing and etching the mask layer and all other mask layers beneath the same to form a plurality of etching windows (D1, D2, D3); step S13, etching the MEMS sealing cap silicon substrate by using the current uppermost mask layer and a layer of mask material beneath the same as a mask; step S14, removing the current uppermost mask layer; step S15, repeating the step S13 and the step S14 until all the n mask layers are removed.

Abstract: The present invention discloses a multi-frame synchronization method, the method comprises: for each received sub-frame, a receiver determining a probability that the received sub-frame is each of sub-frames in a multi-frame, a sub-frame with maximum probability being a state of the currently received sub-frame after N sub-frames are received. The present invention further discloses a receiving apparatus for multi-frame synchronization comprising a calculation module; wherein the calculation module is configured to calculate a probability that a received sub-frame is each of sub-frames in a multi-frame, and determine a state of the currently received sub-frame based on a sub-frame with maximum probability after N sub-frames are received. The present invention effectively achieves a position for multi-frame synchronization and low calculation complexity.

Abstract: The invention provides a method and an apparatus for estimating frequency deviation, the method comprising: after receiving a sub-frame, transforming a downlink synchronized code of the sub-frame to a frequency domain, and performing a correlation operation between the transformed downlink synchronized code and a local frequency domain synchronized code to obtain a conjugate downlink synchronized code sequence; judging a location of a maximum value in the conjugate downlink synchronized code sequence, and calculating a frequency deviation value according to the location of the maximum value. The estimating method provided in the invention can realize a stable work with no need of a precise sampling value location, an accurate timing synchronization, or even obtaining the information for the multi-path distribution and locations.

Abstract: The disclosure discloses a fine frequency offset estimation method and apparatus. The method comprises: calculating a first accumulated estimation value corresponding to a first multiframe state according to a phase relevant value of a subframe and a phase of a subframe in the first multiframe state; calculating a second accumulated estimation value corresponding to a second multiframe state according to the phase relevant value of the subframe and a phase of a subframe in the second multiframe state; determining that a decision result of a multiframe state is the first multiframe state or the second multiframe state according to the first accumulated estimation value and the second accumulated estimation value; and performing a fine frequency offset estimation according to the decision result of the multiframe state. The apparatus disclosed in the disclosure is less coupled with other modules, has excellent performance in various environments, and realizes the unbiased estimation of timing offset.

Abstract: The present invention discloses a multi-frame synchronization method, the method comprises: for each received sub-frame, a receiver determining a probability that the received sub-frame is each of sub-frames in a multi-frame, a sub-frame with maximum probability being a state of the currently received sub-frame after N sub-frames are received. The present invention further discloses a receiving apparatus for multi-frame synchronization comprising a calculation module; wherein the calculation module is configured to calculate a probability that a received sub-frame is each of sub-frames in a multi-frame, and determine a state of the currently received sub-frame based on a sub-frame with maximum probability after N sub-frames are received. The present invention effectively achieves a position for multi-frame synchronization and low calculation complexity.

Abstract: The invention provides a method and an apparatus for estimating frequency deviation, the method comprising: after receiving a sub-frame, transforming a downlink synchronized code of the sub-frame to a frequency domain, and performing a correlation operation between the transformed downlink synchronized code and a local frequency domain synchronized code to obtain a conjugate downlink synchronized code sequence; judging a location of a maximum value in the conjugate downlink synchronized code sequence, and calculating a frequency deviation value according to the location of the maximum value. The estimating method provided in the invention can realize a stable work with no need of a precise sampling value location, an accurate timing synchronization, or even obtaining the information for the multi-path distribution and locations.