Patents by Inventor Liwen Lu

Liwen Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11411151
    Abstract: A light emitting panel and a display device are provided. The light emitting panel includes a carrier substrate, and multiple connection electrodes, multiple first electrode leads and multiple second electrode leads that are arranged on the carrier substrate. Each connection electrode includes a first sub-connection electrode and a second sub-connection electrode isolated from each other. The connection electrodes are divided into a first connection electrode group to an N-th connection electrode group. An i-th connection electrode group includes connection electrodes. N is an integer greater than or equal to 2, and i is a positive integer less than or equal to N. First sub-connection electrodes in the i-th connection electrode group are electrically connected with a same first electrode lead, and second sub-connection electrodes in the i-th connection electrode group are respectively connected with different second electrode leads.
    Type: Grant
    Filed: November 9, 2020
    Date of Patent: August 9, 2022
    Assignee: SHANGHAI TIANMA MICRO-ELECTRONICS CO., LTD.
    Inventors: Xiaoping Sun, Lihua Wang, Conghua Ma, Liwen Lu
  • Publication number: 20210057624
    Abstract: A light emitting panel and a display device are provided. The light emitting panel includes a carrier substrate, and multiple connection electrodes, multiple first electrode leads and multiple second electrode leads that are arranged on the carrier substrate. Each connection electrode includes a first sub-connection electrode and a second sub-connection electrode isolated from each other. The connection electrodes are divided into a first connection electrode group to an N-th connection electrode group. An i-th connection electrode group includes connection electrodes. N is an integer greater than or equal to 2, and i is a positive integer less than or equal to N. First sub-connection electrodes in the i-th connection electrode group are electrically connected with a same first electrode lead, and second sub-connection electrodes in the i-th connection electrode group are respectively connected with different second electrode leads.
    Type: Application
    Filed: November 9, 2020
    Publication date: February 25, 2021
    Inventors: Xiaoping SUN, Lihua WANG, Conghua MA, Liwen LU
  • Patent number: 9275918
    Abstract: A statistical process control method for monitoring and controlling semiconductor manufacturing processing operations is provided. For a chosen processing operation, multiple measurement sites are used to generate data of a measurable characteristic that is impacted by and associated with the processing operation. The data from the sites is compared over time and one or more outlier sites are identified. The outlier sites are the sites at which the data values are most divergent from the rest of the data. Algorithms are used to mathematically compare the outlier sites to the other sites to produce a comparative index. The comparative index is monitored graphically or otherwise to identify changes in the processing operation, and corrective actions are taken.
    Type: Grant
    Filed: June 1, 2015
    Date of Patent: March 1, 2016
    Assignee: WAFERTECH, LLC
    Inventors: Liwen Lu, Shih-Tzung Chang
  • Publication number: 20150262894
    Abstract: A statistical process control method for monitoring and controlling semiconductor manufacturing processing operations is provided. For a chosen processing operation, multiple measurement sites are used to generate data of a measurable characteristic that is impacted by and associated with the processing operation. The data from the sites is compared over time and one or more outlier sites are identified. The outlier sites are the sites at which the data values are most divergent from the rest of the data. Algorithms are used to mathematically compare the outlier sites to the other sites to produce a comparative index. The comparative index is monitored graphically or otherwise to identify changes in the processing operation, and corrective actions are taken.
    Type: Application
    Filed: June 1, 2015
    Publication date: September 17, 2015
    Inventors: Liwen LU, Shih-Tzung CHANG
  • Patent number: 9064788
    Abstract: A statistical process control method for monitoring and controlling semiconductor manufacturing processing operations is provided. For a chosen processing operation, multiple measurement sites are used to generate data of a measurable characteristic that is impacted by and associated with the processing operation. The data from the sites is compared over time and one or more outlier sites are identified. The outlier sites are the sites at which the data values are most divergent from the rest of the data. Algorithms are used to mathematically compare the outlier sites to the other sites to produce a comparative index. The comparative index is monitored graphically or otherwise to identify changes in the processing operation, and corrective actions are taken.
    Type: Grant
    Filed: February 19, 2014
    Date of Patent: June 23, 2015
    Assignee: WAFERTECH, LLC
    Inventors: Liwen Lu, Shih-Tzung Chang