Abstract: A method of hybrid lane modeling, including, receiving a roadway image, extracting a set of lane points from the roadway image, fitting a polynomial line to the set of lane points, determining a fitted error of the fitted polynomial line, outputting the polynomial line if the fitted error is less than a predetermined threshold, selecting a set of clean lane points from the set of lane points if the fitted error is greater than the predetermined threshold and interpolating a cubic spline line to the set of clean lane points.

Abstract: The present application relates to a pregabalin sustained release composition, comprising: (a) an active ingredient; (b) a matrix-forming agent; (c) a swelling agent; (d) a gelling agent; and optionally a filler. The pregabalin sustained release composition provided in the present application can rapidly swell in volume when exposed to aqueous medium until exceeding the dimeter of human gastric pyloric (13 mm). It thereby prolongs the gastric emptying time to increase the retention time of pregabalin in the stomach and enhances absorption of pregabalin in the small intestine and ascending colon. Moreover, the pregabalin sustained release composition provided herein achieves a sustained release for 24 h, which allows QD (once a day) administration, reduces administration number, and improves patient compliance.

Abstract: The present invention relates to the field of biomedicine, particularly to double-stranded RNA molecules targeting CKIP-1 and uses thereof, particularly to use of the double-stranded RNA molecules for the treatment of inflammatory diseases such as arthritis, particularly rheumatoid arthritis.

Abstract: A P2X3 and/or P2X2/3 receptor antagonist of formula (I), a pharmaceutical composition comprising the same, and a use thereof in preparing a drug for preventing or treating a disease mediated by the P2X3 and/or P2X2/3 receptor antagonist.

Abstract: The present application provides a method for detecting temperature of thermal chamber comprising: conducting a thermal treatment at a predicted temperature to a selected silicon wafer within a thermal chamber, wherein the predicted temperature comprises plural temperature points set in order; obtaining a haze value corresponding to the predicted temperature; obtaining a linear relationship I between the temperature and the haze; polishing and washing the silicon wafer; conducting a thermal treatment at a predicted temperature to the polished silicon wafer within the thermal chamber; obtaining a linear relationship II between the temperature and the haze; calculating a difference of the haze at same temperature point between the two thermal treatments, and obtaining an actual temperature difference of the thermal chamber based on the difference of the haze.

Abstract: The present application provides a method for detecting temperature of thermal chamber comprising: conducting a thermal treatment at a predicted temperature to a selected silicon wafer within a thermal chamber, wherein the predicted temperature comprises plural temperature points set in order; obtaining a haze value corresponding to the predicted temperature; obtaining a linear relationship I between the temperature and the haze; polishing and washing the silicon wafer; conducting a thermal treatment at a predicted temperature to the polished silicon wafer within the thermal chamber; obtaining a linear relationship II between the temperature and the haze; calculating a difference of the haze at same temperature point between the two thermal treatments, and obtaining an actual temperature difference of the thermal chamber based on the difference of the haze.

Abstract: A preparation method of a granular adsorbent is provided, including the following: adding a pyrrole monomer to an acidic solution, and adding an oxidant as an initiator to allow a polymerization reaction of the pyrrole monomer to produce polypyrrole (PPy), where an adsorption material powder is added to a reaction system before, during, or immediately after the polymerization reaction, and a resulting mixture is thoroughly stirred; after the polymerization reaction is completed, filtering a resulting reaction system to obtain a filter cake, which is the granular adsorbent; or subjecting the resulting reaction system to centrifugal sedimentation to obtain the monolithic adsorbent. In the present disclosure, the pyrrole monomer is subjected to a polymerization reaction to generate PPy; before being tightly stacked, network structures of PPy wrap the adsorption material powder; and the granular adsorbent is formed through sedimentation and stacking.

Abstract: A vulcanizing agent is added during the processing of a polymer, and can form a crosslinking structure network in the polymer, thereby improving the mechanical properties of the material. Furthermore, the crosslinking agent can also de-crosslink the polymer material at a high temperature, and after being cooled, same can be crosslinked again to produce a network structure, thus endowing the polymer material with thermoplasticity for repeated processing.

Abstract: The invention provides a method for positioning a wafer and a semiconductor manufacturing apparatus, which are applied to thin film processes. The method includes: Step S1: Obtain the state distribution of the first surface of the first wafer after the thin film process is performed on the first wafer, wherein the first surface is the surface opposite to a surface that the thin film formed thereon in the thin film process; Step S2: Determine whether the first wafer is located at the ideal positioning center according to the state distribution of the first surface, when the first wafer is not located at the ideal positioning center, according to the state distribution of the first surface adjusts the positioning position of the second wafer to be subjected to the thin film process, so that the second wafer is positioned at the ideal positioning center during the thin film process.

Abstract: A method of hybrid lane modeling, including, receiving a roadway image, extracting a set of lane points from the roadway image, fitting a polynomial line to the set of lane points, determining a fitted error of the fitted polynomial line, outputting the polynomial line if the fitted error is less than a predetermined threshold, selecting a set of clean lane points from the set of lane points if the fitted error is greater than the predetermined threshold and interpolating a cubic spline line to the set of clean lane points.

Abstract: The present application provides a method for detecting temperature of thermal chamber comprising: conducting a thermal treatment at a predicted temperature to a selected silicon wafer within a thermal chamber, wherein the predicted temperature comprises plural temperature points set in order; obtaining a haze value corresponding to the predicted temperature; obtaining a linear relationship I between the temperature and the haze; polishing and washing the silicon wafer; conducting a thermal treatment at a predicted temperature to the polished silicon wafer within the thermal chamber; obtaining a linear relationship II between the temperature and the haze; calculating a difference of the haze at same temperature point between the two thermal treatments, and obtaining an actual temperature difference of the thermal chamber based on the difference of the haze.

Abstract: The invention provides a method for positioning a wafer and a semiconductor manufacturing apparatus, which are applied to thin film processes. The method includes: Step S1: Obtain the state distribution of the first surface of the first wafer after the thin film process is performed on the first wafer, wherein the first surface is the surface opposite to a surface that the thin film formed thereon in the thin film process; Step S2: Determine whether the first wafer is located at the ideal positioning center according to the state distribution of the first surface, when the first wafer is not located at the ideal positioning center, according to the state distribution of the first surface adjusts the positioning position of the second wafer to be subjected to the thin film process, so that the second wafer is positioned at the ideal positioning center during the thin film process.

Abstract: Provided are a liquid-phase hydroisomerization system and a process therefor and use thereof. The system comprises a gas-liquid mixer (3), a hydroisomerization reactor (4) and a fractionating column (6). An oil product and hydrogen are mixed as a liquid hydrogen-oil mixture, and are introduced into the hydroisomerization reactor for a hydroisomerization reaction, and after being fractionated, a target product is led out. A supplemental hydrogen-dissolving inner member is provided at least between a group of two adjacent catalyst bed layers in order to supplement hydrogen to the reactants. The process cancels a circulating hydrogen compressor, has a simple process flow, and can be applied to the production of a lubricant base oil by the hydroisomerization of a lubricant raw material or the production of a low freezing point diesel by the hydroisomerization of and the reduction in the freezing point of a diesel raw material.

Abstract: Provided are a liquid-phase hydroisomerization system and a process therefor and use thereof. The system comprises a gas-liquid mixer (3), a hydroisomerization reactor (4) and a fractionating column (6). An oil product and hydrogen are mixed as a liquid hydrogen-oil mixture, and are introduced into the hydroisomerization reactor for a hydroisomerization reaction, and after being fractionated, a target product is led out. A supplemental hydrogen-dissolving inner member is provided at least between a group of two adjacent catalyst bed layers in order to supplement hydrogen to the reactants. The process cancels a circulating hydrogen compressor, has a simple process flow, and can be applied to the production of a lubricant base oil by the hydroisomerization of a lubricant raw material or the production of a low freezing point diesel by the hydroisomerization of and the reduction in the freezing point of a diesel raw material.

Abstract: A method, apparatus, and machine readable storage medium is disclosed for tracking a usage window for a Quota Control Policy for controlling a subscriber account on a network node for a current time period based short-term usage characteristics namely on data traffic usage during a sliding window of preceding time periods.

Abstract: A method, apparatus, and machine readable storage medium is disclosed for Quota Control Policy for controlling a subscriber account on a network node for a current time period based short-term usage characteristics namely on data traffic usage during a sliding window of preceding time periods. This policy is independent of a standard metering limit for a billing period.

Abstract: Provided are a distillate oil hydrogenation deacidification catalyst containing a molecular sieve, preparation and use thereof. In this catalyst, the weight of the catalyst, on the basis of 100%, is 1-5% magnesium calculated as an oxide, 1-20% alumino-phosphate molecular sieve and/or aluminosilicate molecular sieve; 1-10% Co and/or Ni; 5-30% Mo and/or W, and the balance is aluminium oxide. The catalyst is prepared through forming, dipping and baking. The catalyst is very active in hydrogenation deacidification, and also in hydrodesulfurization and hydrodenitrogenation.