Patents by Inventor Ljubov Sergeevna Sizova

Ljubov Sergeevna Sizova has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive polymeric material and electrophotometric material prepared by reacting secondary aromatic amine with vinyl alkylether or vinyl acetate in the presence of strong acid and Hg (II) or Pb (IV) catalyst
    Patent number: 4095032
    Abstract: A photosensitive polymeric material having photoelectric properties based on poly-N-vinylamines, which actually comprise poly-N-vinyldiphenylamine, its derivatives, and also copolymers of N-vinyldiphenylamine with N-vinylamines, poly-N-vinylphenothiazine and poly-N-vinylphenoxazine.The polymers are applied onto an electroconductive substrate to give an electrophotographic material.Said polymers are prepared by a method consisting in the interaction between secondary aromatic and heterocyclic amines or their mixtures with simple vinyl ethers in the presence of strong acids or with vinyl acetate in the presence of salts of mercury (II) or lead (IV), a strong acid and water.
    Type: Grant
    Filed: January 31, 1975
    Date of Patent: June 13, 1978
    Inventors: Ekaterina Egorovna Sirotkina, Vadim Petrovich Lopatinsky, Viktor Dmitrievich Filimonov, Rita Moiseevna Kogan, Vyacheslav Dmitrievich Pirogov, Sofya Ivanovna Kudinova, Ljubov Sergeevna Sizova, Svetlana Stepanovna Reznikova, Georgy Nikolaevich Ivanov, Nina Alexandrovna Tsekhanovskaya, Jonas-Donatos Bronyaus Sidaravichus, Larisa Vasilievna Randina, Svetlana Leonidovna Bocharova, Galina Petrovna Gulyaeva, Raisa Ivanovna Bondarenko, Galina Ivanovna Rybalko, Yanina Antono Adomanite
  • Photosensitive polymeric material and electrophotometric material and methods of manufacturing same
    Patent number: 4038468
    Abstract: A photosensitive polymeric material having photoelectric properties based on poly-N-vinylanines, which actually comprise poly-N-vinyldiphenylamine, its derivatives, and also copolymers of N-vinyldiphenylamine with N-vinylamines, poly-N-vinylphenothiazine and poly-N-vinylphenoxazine. The polymers are applied onto electroconductive substrate to give an electrophotographic material. Said polymers are prepared by a method consisting in the interaction between secondary aromatic and heterocyclic amines or their mixtures with simple vinyl ethers in the presence of strong acids or with vinylacetate in the presence of salts of mercury (II) or lead (IV), strong acid and water.
    Type: Grant
    Filed: August 6, 1975
    Date of Patent: July 26, 1977
    Inventors: Ekaterina Egorovna Sirotkina, Vadim Petrovich Lopatinsky, Viktor Dmitrievich Filimonov, Rita Moiseevna Kogan, Vyacheslav Dmitrievich Pirogov, Sofya Ivanovna Kudinova, Ljubov Sergeevna Sizova, Svetlana Stepanovna Reznikova, Georgy Nikolaevich Ivanov, Nina Alexandrovna Tsekhanovskaya, Jonas-Donatos Bronyaus Sidaravichus, Larisa Vasilievna Randina, Svetlana Leonidovna Bocharova, Galina Petrovna Gulyaeva, Raisa Ivanovna Bondarenko, Galina Ivanovna Rybalko, Yanina Antono Adomanite
  • Photosensitive polymeric material and electrophotometric material and methods of manufacturing same
    Patent number: 4007317
    Abstract: A photosensitive polymeric material having photoelectric properties based on poly-N-vinylamines, which actually comprise poly-N-vinyldiphenylamine, its derivatives, and also copolymers of N-vinyldiphenylamine with N-vinylamines, poly-N-vinylphenothiazine and poly-N-vinylphenoxazine. The polymers are applied onto a electroconductive substrate to give an electrophotographic material. Said polymers are prepared by a method consisting in the interaction between secondary aromatic and heterocyclic amines or their mixtures with simple vinyl ethers in the presence of strong acids or with vinylacetate in the presence of salts of mercury (II) or lead (IV), strong acid and water.
    Type: Grant
    Filed: August 6, 1975
    Date of Patent: February 8, 1977
    Inventors: Ekaterina Egorovna Sirotkina, Vadim Petrovich Lopatinsky, Viktor Dmitrievich Filimonov, Rita Moiseevna Kogan, Vyacheslav Dmitrievich Pirogov, Sofya Ivanovna Kudinova, Ljubov Sergeevna Sizova, Svetlana Stepanovna Reznikova, Georgy Nikolaevich Ivanov, Nina Alexandrovna Tsekhanovskaya, Jonas-Donatos Bronyaus Sidaravichus, Larisa Vasilievna Randina, Svetlana Lepnidovna Bocharova, Galina Petrovna Gulyaeva, Raisa Ivanovna Bondarenko, Galina Ivanovna Rybalko, Yanina Antono Adomanite
  • Photosensitive polymeric materials comprising poly-N-vinylphenoxazine and poly-N-vinylphenothiazine
    Patent number: 3986873
    Abstract: A photosensitive polymeric material having photoelectric properties based on poly-N-vinylamines, which actually comprise poly-N-vinyldiphenylamine, its derivatives, and also copolymers of N-vinyldiphenylamine with N-vinylamines, poly-N-vinylphenothiazine and poly-N-vinylphenoxazine.The polymers are applied onto an electroconductive substrate to give an electrophotographic material.Said polymers are prepared by a method consisting in the interaction between secondary aromatic and heterocyclic amines or their mixtures with simple vinyl ethers in the presence of strong acids or with vinyl acetate in the presence of salts of mercury (II) or lead (IV), a strong acid and water.
    Type: Grant
    Filed: January 31, 1975
    Date of Patent: October 19, 1976
    Inventors: Ekaterina Egorovna Sirotkina, Vadim Petrovich Lopatinsky, Viktor Dmitrievich Filimonov, Rita Moiseevna Kogan, Vyacheslav Dmitrievich Pirogov, Sofya Ivanovna Kudinova, Ljubov Sergeevna Sizova, Svetlana Stepanovna Reznikova, Georgy Nikolaevich Ivanov, Nina Alexandrovna Tsekhanovskaya, Jonas-Donatos Bronyaus Sidaravichus, Larisa Vasilievna Randina, Svetlana Leonidovna Bocharova, Galina Petrovna Gulyaeva, Raisa Ivanovna Bondarenko, Galina Ivanovna Rybalko, Yanina Antono Adomanite
  • Method for preparing poly-N-alkenylamines
    Patent number: 3987011
    Abstract: A method for preparing poly-N-alkenylamines having the following formula (I) ##EQU1## WHERE A is a tertiary aromatic or heterocyclic amine, connected to a carbon atom through nitrogen, R and R' are similar or different hydrogen or lower alkyl, and n is the degree of polymerization, consisting in that the secondary aromatic or heterocyclic amines or their derivatives, for example, diphenylamine, carbazole, phenthiazine, phenoxazine, 3-chloro- and 3,6-dichlorocarbazole are treated with aldehydes having the formula (II) RR'CH-CH=O, where R and R.sup.1 are the substances specified above, or their polymers capable of depolymerizing in an acid medium, in the presence of acid catalysts, in organic solvents. The said polymers are prepared by a single-step process without the separation of any intermediate products; the products prepared possess photosensitive properties and can be used, for example, in electrophotography and related processes.
    Type: Grant
    Filed: December 16, 1974
    Date of Patent: October 19, 1976
    Inventors: Ekaterina Egorovna Sirotkina, Viktor Dmitrievich Filimonov, Ljubov Sergeevna Sizova, Nina Alexandrovna Tsekhanovskaya