Abstract: To include reading design data of a plurality of patterns formed on a sample and characteristic information indicating characteristics of each of the patterns from a storage device, the characteristic information being additionally written in the design data, dividing a pattern formed region of the sample on which the patterns are formed, into a plurality of regions where the characteristics are different from each other on a basis of the characteristic information, calculating parameter information according to the characteristics with respect to each of the regions, where the parameter information is provided for generating a reference image from the design data to be used in an inspection of the patterns, and generating the reference image from the design data on a basis of the calculated parameter information.

Abstract: A pattern inspection apparatus includes a data processing circuitry to input detection data based on a secondary electron from a substrate for each irradiation unit region, where n1×m1 irradiation unit regions in irradiation unit regions configure one of n2×m2 image reference regions configuring an inspection measurement image, to calculate, for each of the n2×m2 image reference regions, a statistic value acquired from the detection data of all the n1×m1 irradiation unit regions in one of the n2×m2 image reference regions, and to define the statistic value as image reference data for the image reference region, and a comparison processing circuitry to receive transmission of the image reference data for each image reference region, and to compare, using a reference image corresponding to the inspection measurement image composed of the n2×m2 image reference regions, the measurement image with the reference image for each image reference region.