Patents by Inventor Lodewijk Alexander Schijvenaars

Lodewijk Alexander Schijvenaars has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PELLICLE FRAME FOR EUV LITHOGRAPHY
    Publication number: 20230259019
    Abstract: A pellicle frame includes: a first portion; and a plurality of second portions. The first portion is for connection to a border of a pellicle. The first portion includes a hollow and generally rectangular body. The plurality of second portions are for connection to a patterning device. The first portion and the plurality of second portions are all formed from a first material. Each of the second portions is connected to the first portion by a spring portion formed from the first material. Such a pellicle frame is advantageous since the first portion, the plurality of second portions and the spring portions are all formed from a same material.
    Type: Application
    Filed: March 25, 2021
    Publication date: August 17, 2023
    Inventors: Kristof CUSTERS, Ron Geeraard Catharina DE BRUIJN, Matthias KRUIZINGA, Lodewijk Alexander SCHIJVENAARS
  • Lithographic apparatus and sensor calibration method
    Patent number: 7999912
    Abstract: A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.
    Type: Grant
    Filed: May 8, 2007
    Date of Patent: August 16, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Emiel Jozef Melanie Eussen, Stefan Gertrud Marie Hendriks, Erik Roelof Loopstra, Jacob Willem Vink, Ruud Antonius Catharina Maria Beerens, Lodewijk Alexander Schijvenaars, Tom Van Zutphen
  • Lithographic apparatus and sensor calibration method
    Publication number: 20080278702
    Abstract: A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.
    Type: Application
    Filed: May 8, 2007
    Publication date: November 13, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Emiel Jozef Melanie Eussen, Stefan Gertrud Marie Hendriks, Erik Roelof Loopstra, Jacob Willem Vink, Ruud Antonius Catharina Maria Beerens, Lodewijk Alexander Schijvenaars, Tom Van Zutphen